Vision systems for wafer and thin-film instrumentation include specialized optical instruments such as microscopes or imaging, CD resolution, defect detection and classification, surface roughness, thickness gaging, or other measurements. Vision systems consist of an integrated camera or image-capture device with processing, storage, analysis and control systems for automated inspection, metrology or image analysis end-use in laboratory or clean room settings. Typically, vision systems for wafer and thin-film instrumentation are stationary with high-magnification optics, as well as high-resolution imagers and precision sample stages or positioners. High resolution and precision positioning is required for the 2D or 3D measurement of semiconductor wafer and thin film surfaces.