Semiconductor - Cleaning: NIR Spectroscopy to Monitor Cleaning Solutions in Semiconductor Wafer Manufacturing Process

In a competitive semiconductor industry, where high volume and maximum efficiency mean everything, an emerging technology commonly used in the chemical and refining industries may be a suitable processing aid. Process Near Infrared (NIR) spectroscopy generates rapid, real-time data that is reliable and easily interpreted. Engineers, scientists or operators may use this information to fine tune a process, resulting in more efficient use of materials while still maintaining high product yields. Some unique Process NIR features include real-time analysis, in situ or non-invasive sampling possibilities, and multi-point capability. The sample loop consists of specialized fiberoptic cable and a sampling interface allowing for remote placement of the analyzer. This provides a convenient alternative when consideration must be given to the processing environment, i.e. clean rooms, or to operator safety during analyzer system servicing.