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Application of X-ray Mask Fabrication Technologies to High Resolution, Large Diameter Ta Fresnel Zone Plates

From JEOL USA, Inc.
 

 
The resolution of Fresnel zone plate (FZP) as X-ray lens is determined by the width of outer-most zone, and the diameter of condenser lens is desirable to be large so that bright x-ray beam is available in x-ray optical systems. As the diameter of FZPs with nm resolution reported so far is small, typically less than 0.2mm, FZPs cannot be used as effective condenser lens. We have applied NTT X-ray mask fabrication technologies for SOR lithography') to die fabrication of high resolution and large diameter FZP using Ta as X-ray absorber, and obtained 50 nm resolution, 1 mm diameter FZP on thin SiN membrane. New process treating electron-beam (EB) exposure data of numerous numbers of large diameter rings in a nm line & space configuration is also described.
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