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From hitachi-hta.com
Process evaluation of semiconductor devices requires cross-sectional observations using SEMs for optimizing exposures and/or etching conditions. For this purpose wafers need to be fractured for evaluation.
Failure analysis of semiconductor devices, on the other hand, requires evaluation of inner structures of specific points of interest. This is usually accomplished using FIB (focused ion beam system). Prepared cross-sections of the wafer are examined using SEMs. Associated with higher integration and density, the need for evaluation in nanometer levels has rapidly increased recently. We have used an FIB-SEM compatible specimen holder for thinning the specimen and evaluating it using thee S-5200 in STEM mode for evaluation of semiconductor devices. We report on details.
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Semiconductor metrology instruments are designed for wafer and thin film in-line inspection after semiconductor processing. They include capacitance gages, C-V systems, electron beam probes, ellipsometers, interferometers, I-V system, magnetometers, optical systems, profilometers, reflectometers, resistance probes, RHEED systems, and X-ray diffractometers.
Electron microscopes use a focused beam of electrons instead of light to "image" the specimen and gain information as to its structure and composition.
Specialty or proprietary equipment and accessories related to laboratory sample preparation.
Optical and light microscopes use the visible or near-visible portion of the electromagnetic spectrum to magnify images of objects.
Digital and video microscopes are instruments that use digital technology to magnify images of objects. They include built-in cameras and a series of high-powered lenses that provide superior image quality and resolution.
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Topics of Interest
Field emission SEMs have been extensively used for process evaluation, particle analysis, and CD-measurement in the semiconductor industry. Associated with higher integration and density, however, new...
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A low voltage STEM technique using a scanning electron microscope (SEM) allows high contrast images owing to high electron scattering and making visible subtle changes of densities and compositions in...
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Compound materials have been used in various fields of science and industry. For evaluation of these materials, SEMs and FIB systems have been playing major roles. The SEM and FIB system allow...
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A specimen preparation technique using FIB/TEM systems permits an excellent specimen preparation for transmission electron microscopy allowing 0.1 um or thinner specimens. This technique makes it...
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FIB (Focused Ion Beam) systems allow fine milling of site-specific areas. These systems have been extensively used for TEM specimen preparation and development and/or failure analysis of semiconductor...
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