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Liqui-Cel® Membrane Contactors Improve Performance of Megasonic Cleaning
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From Membrana
The amount of dissolved gases present in water has a direct impact on cleaning efficiency in a megasonic cleaning bath. UltraPure Water (UPW) from the polishing loop is commonly used in the megasonic cleaning process. Depending on the process design of the system, there are typically two scenarios in the system setup. First, a system containing Liqui-Cel Contactors could be located in the polishing loop. Here the typical dissolved gas requirement is less than 1 ppb for O2 and around 3 ppm for N2. Second, a Nitrogen blanketed tank could be located in the polishing loop. The typical dissolved gas requirements in this scenario are less than 1 ppb for O2. Dissolved N2 would be saturated at ? 20 ppm because of the N2 pressure from the N2 blanket on top of the tank. Products & Services
Filtration media and elements are designed to remove suspended particles from a process stream. This product area includes bulk filter media, cartridges, housing-only products, and housing and filter assemblies.
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Learn more about Filtration Media and Elements
Specialty filtration and separation equipment includes specialized or proprietary products and accessories for filtration and separation.
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