From Membrana GmbH
The amount of dissolved gases present in water has a direct impact on cleaning efficiency in a megasonic cleaning bath. UltraPure Water (UPW) from the polishing loop is commonly used in the megasonic cleaning process. Depending on the process design of the system, there are typically two scenarios in the system setup.
First, a system containing Liqui-Cel Contactors could be located in the polishing loop. Here the typical dissolved gas requirement is less than 1 ppb for O2 and around 3 ppm for N2. Second, a Nitrogen blanketed tank could be located in the polishing loop. The typical dissolved gas requirements in this scenario are less than 1 ppb for O2. Dissolved N2 would be saturated at ? 20 ppm because of the N2 pressure from the N2 blanket on top of the tank.
Products & Services
Clarifiers
Clarifiers and screens are used to remove solids from liquids through gravity settling or a mechanical screening process.
Filtration Equipment
Filtration equipment is used to filter, thicken or clarify a mixture of different elements.
Water Filters
Water Filters are used to filter water used as a life-sustaining beverage, food processing and for use in industrial processes.
Filter Media
Filter media is material that actively separates solids from a solution and/or binds select materials in a solution.
Filter Elements
Filter elements are used to remove impurities from liquids. They are used in water treatment systems and fluid processing applications.
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