Sites:
Home > Technical Library > Manufacturing and Process Equipment > Vacuum Equipment > Vacuum Systems for ALD (.pdf)

Vacuum Systems for ALD

From Edwards Vacuum

Atomic layer deposition (ALD) processes require vacuum conditions both for proper deposition and adequate purging of precursors from the chamber. Since the ALD process is surface driven, the high percentages of unreacted precursors that exit process chambers will tend to deposit inside vacuum pumps, which can result in pump failures after <100 wafers. Because of inherently different reaction mechanisms, vacuum systems for CVD do not work for ALD. Therefore, new and sophisticated hardware is needed, including reactive gas injection and pumps dedicated to each different precursor.

Read the Whole Article
Products & Services
Wafer and Thin Film Instrumentation
Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
Vacuum Valves
Vacuum valves are used when a vacuum must be maintained in a closed system.
Vacuum Gauges and Instruments
Vacuum gauges are devices for measuring vacuum or sub-atmospheric pressures.
Ion Beam Guns and Electron Beam Guns
Ion beam guns and electron beam guns produce beams of electrons, ions or other particles for use in chemical and surface analysis, particle physics, resin curing or semiconductor manufacturing.
Vacuum Viewports and Access Doors
Vacuum viewports and access doors are components for viewing, accessing or transferring samples or process devices in a vacuum chamber or system.
Product Announcements
Arkalon Chemical Technologies, LLC - Custom Fabricated Stainless Steel Bubblers
For chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors, Arkalon Chemical Technologies, LLC offers electro-polished stainless steel bubblers. (read more)
LOT Vacuum America - Vacuum Performance-Harshest Etch/CVD Environment
LOT Vacuum's proven Dry Screw Vacuun Pump Design provides the shortest vacuum path for any pump in its class. (read more)
LOT Vacuum America - HD120 Dry Screw Vacuum Pump Save on Trade-In
Trade-In any brand or make for the Toughest Pumps on the Planet™. For world class utility savings, choose the GD, HD, or LD Series and reduce operation cost by 25% to 50% compared to hook and... (read more)
LOT Vacuum America - LOT Vacuum DD 255 Series Dry Screw Vacuum Pumps
The Toughest Pumps on the Planet™ LOT Vacuum Dura Dry 255 Series Dry Screw Pumps are application proven on all Semiconductor processes. The DD255 series is well suited for all FPD, 450mm, 300mm,... (read more)
Topics of Interest

The rapid atomic layer deposition (RAD) process module from Genus boosts ALD deposition rates to ~100 Å/min, more than five times that of conventional ALD . The new ALD chamber on the StrataGem...

Titanium dioxide (TiO2) thin films are possible candidates for microelectronic and optic applications. Ti (OCH(CH2)2) is an important ALD precursor, not only for TiO2, but also for SrTiO3. The oxygen...

With ASML's entry into the market and recent moves by Genus, atomic layer deposition appears poised to enter the bright future predicted for the technology. In early April the European lithography...

Vacuum coatings processes use a vacuum (sub-atmospheric pressure) environment and an atomic or molecular condensable vapor source to deposit thin films and coatings. The vacuum environment is used not...

Jon Owyang and Larry Bartholomew The drive toward sub-100-nm feature sizes places extreme performance demands on semiconductor manufacturing processes and equipment. Chemistry and hardware challenges...