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From Edwards Vacuum
Low pressure nitriding applications typically involve the use of ammonia gas as the source of nitrogen. Careful consideration of material selection is needed for the vacuum pump system. In addition the process can generate significant quantities of hydrogen gas. Careful consideration of the dilution and removal of this explosive gas is needed for the vacuum pump system. In the plasma process there is the additional consideration of using nitrogen, argon and in particular water, which presents significant challenges to the safe and reliable operation of the vacuum pump system. This paper presents various solutions to these application challenges and provides guidance on how to select the right solution in low pressure and plasma nitriding. Products & Services
Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
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Learn more about Wafer and Thin Film Instrumentation
Vacuum valves are used when a vacuum must be maintained in a closed system.
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Learn more about Vacuum Valves
Specialty or proprietary products and accessories related to vacuum pumps, lines, and processing.
Learn more about Specialty Vacuum Equipment
Vacuum gauges are devices for measuring vacuum or sub-atmospheric pressures.
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Learn more about Vacuum Gauges and Instruments
Ion beam guns and electron beam guns produce beams of electrons, ions or other particles for use in chemical and surface analysis, particle physics, resin curing or semiconductor manufacturing.
Learn more about Ion Beam Guns and Electron Beam Guns
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Topics of Interest
Emerging applications, such as thin-film solar cell manufacturing in the solar industry and silicon/silicon germanium (Si/SiGe) epitaxy in the semiconductor industry, are using increasing levels of...
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3.3 HIGH/ULTRA-HIGH VACUUM PUMPS
It is now increasingly common to have high-vacuum systems based on turbomolecular pumps (TMPs), turbomolecular pumps + cryosurfaces, or cryopumps. Diffusion pumps...
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B
Back-diffusion
(vacuum technology) Flow of vapor in a direction opposite to that of the flow of gas being pumped. Occurs in the molecular flow range. Also called Backstreaming.
Back-end...
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The need to operate under vacuum is widespread throughout the chemical process industries (CPI). Distillation, drying, flash cooling, stripping, and evaporation are among the unit operations that...
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vacuum
A low-pressure gaseous environment whose pressure is lower than the ambient atmospheric pressure.
vacuum brake
A type of power-assisted vehicle brake. Its released position is...
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