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The Engineering Toolbar
The Ultimate Resource for Engineering and Technical Research. (Learn More) |
Using the Dimension X3D AFM in Advanced Photomask Metrology
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From Veeco Instruments
The photomask industry is being challenged as never before; "mask makers' holidays" are a thing of the past. New materials with smaller structures demand innovative ways to address the metrology and processing of photomasks. No single technology will meet all the needs of the customer semiconductor industry. Reduced process windows due to MEEF (mask error enhancement factor), 1° control of hard shifters, charging of attenuating thin films and photoresist, area control of OPC features, confirmation of complex simulations in printed features, and unprecedented levels of contamination control all add up to a requirement for a flexible, fast metrology solution that won't contaminate the masks during any phase of inspection. Products & Services
Imaging workstations are vision systems used for metrology or image analysis in laboratory and cleanroom settings.
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Overview
This chapter shows how layout is used to create integrated circuits. The chapter describes the manufacture of wafers and the processing steps of depositing, patterning, and etching...
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Quadtones Quick Mask mode
Quadtones
Menu: Image > Mode > Duotone
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Version: 6.0, 7.0, CS, CS2
See also: Duotone
Ouadtones, like Duotones and Tritones, are...
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Photo etching is a process used in the creation of integrated circuits, that combines photolithography with the etching process. Photolithography is used to form patterns on semiconductor substrates...
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Ram Peltinov
Mina Menaker
Applied Materials PDC
Israel
33.1 INTRODUCTION
One of the key drivers of the semiconductor industry is constant improvement, which is based on the ability to...
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3D Atomic Force Microscopy as an Alternative to X-SEM and TEM for Advanced Process Metrology double for each device node at 90nm Introduction and below, which means a significant As increasing demand...
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