MEI, LLC

Improve Performance & Yield, Lower Costs with IDX Control Automation

MEI's proprietary IDX Automation Software for our wet process systems and chemical delivery systes is able to streamline processes and provide unparalleled ease of use while maintaining uptime and reliability.

MEI's Advanced Process Controls provide the necessary stability of process conditions through closed loop monitoring/control using software recording for all key process variables. The result is a system capable of advanced cleaning and process monitoring capabilities required for critical process steps.

The MEI Evolution series semiconductor and MEMs wet benches are in-line, configurable, automated, modular, linear batch immersion wet process systems made for high throughput at a low cost. They are designed for dry in and dry out batch wafer processing of multiple lots of wafers from 100mm to 300mm.
Custom configurations combine SECS/GEM interface capabilities, multi step processing, cascade or quick dump rinsing with optional chemical injections,
maringoni drying and linear robotic transfer capabilities into a system that is tailored for your specific process needs. Ultrasonic and Megasonic tanks and baths are available.

The MEI Advancer series wet processing system is a highly configurable, semi-automated modular, front to back, side mount robotic wet bench, suitable for a wide variety of etch, strip and clean steps for semiconductor processing. Additional applications include wet processing for solar cells, IC devices, medical device, MEMS manufacturing and parts cleaning. The Advancer wet benches and wet process stations are bulk chemical ready and incorporate chemical spiking, software programmable "in-tank" blending of chemistries with quick dump rinse tanks. Configurability, up-time, yield, maintainability, and throughput are the hallmarks of an MEI wet processing system.