ITO pattern etching is a dry etching, non-contact single step, direct writing, maskless and ablative process. We have done a lot of cases with different materials coated on different substrates, the typical one is ITO patterning. With the different absorption rates of laser, we could remove some material and no hurt to the substrate. The strength of this process is that it could etch 20/20um patterns which makes it possible to design the whole pattern very small and tight, and CAD input helps the designers have a fast prototyping and demonstration. Recently we have succeed in making a 2um line width pattern for a world-famous company in laboratory. In addtion, double sides coating and patterning of different design is also possible.

Our Capabilities:

Custom designed ITO (Ag, Au or other conductive material) coated on glass or PET film

Coating thickness: 10nm~10um

Coatings:ITO, FTO, CNB, CNT, a-Si, nano-Ag, Graphene, Ag, Al, Au, SiO2 ,etc

Subsrtate: Glass, ceramics, PET, plastic, some metal substrates

Patern min line width: 2~10um (R&D),  recommend above 20um(production)

Any custom shape/patterns in CAD drawing

Max dimension:1000*2000mm