Molybdenum Sputtering Targets

Featured Product from Plansee SE


As sharp as you can get. Molybdenum sputtering targets.

Molybdenum coatings are the crucial components of the thin-film transistors used in TFT-LCD screens. These provide instantaneous control of the individual image dots (pixels) and consequently ensure particularly sharp image quality.

In the magnetron sputtering method tiny metal particles are vaporized from the sputtering targets and are then deposited as a thin film on the glass substrate. In this fast, economical coating process, all the materials must meet the highest quality criteria. You can rely on our molybdenum sputtering targets:

There's none cleaner.

No targets are cleaner than ours. The most important benefits: your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process.

Because: Metallic and gaseous impurities in the sputtering target are reproduced almost 1:1 in the sputtered functional layer and result in particle formation during the PVD process (arcing effect). We guarantee that our molybdenum targets have a purity of at least 99.97 %. The average purity of our targets lies at an unbeatable 99.99 %. The typical oxygen content is 6 ppm. This value is a fraction of that achieved by our competitors. In this way, we help ensure that every pixel in the TFT-LCD display functions perfectly.

Maximum density.

Thanks to the special forming processes we use, PLANSEE's molybdenum sputtering targets have a density of almost 100 %. You benefit from a faster process due to higher sputtering speeds. The denser the molybdenum target is, the better the conductivity of the created layer.

Homogeneous microstructure.

The flexibility of our production process allows for adjustment of the microstructure of our coating material to achieve just the effect you want. If the grains of the sputtering target are uniformly aligned, you benefit from constant erosion rates and homogeneous layers.

You want the perfect coating? We create it.

In the PVD process, everything must fit together perfectly. Only if all the process parameters are fully harmonized it is possible to create the coating that precisely meets your requirements. In our PVD application laboratory, we perform sputtering in near-real life conditions. Here, our team of developers creates coatings and conducts in-depth analyses based on your specifications. Thanks to this collaboration with you and a wide range of development institutes, we can minimize the time to market required for the development of new coating materials.

And naturally, our application laboratory is also available to you for your target and coating tests. We will coat test substrates using the RF, DC or pulsed DC sputtering methods in line with your specifications. The best proof of our expertise is us! We coat many of our products such as semiconductor base plates and x-ray targets in-house using the PVD, CVD, APS and VPS coating processes.