Polycrystalline Alumina Slurry for Wafer Polishing

Product Announcement from Saint-Gobain Surface Conditioning Group

Polycrystalline Alumina Slurry for Wafer Polishing-Image

Saint-Gobain's 92400.20MIC12 Polycrystalline Alumina Slurry for C plane sapphire wafer polishing is a truly remarkable product. It replaces colloidal silica, SiO2, the traditional final polishing slurry used for many years on C plane sapphire wafers. This slurry can polish the sapphire wafers 2 - 3 times faster than colloidal SiO2, and it doesn't scratch the sapphire wafers, is much more easily cleaned from the wafers and the polishing machinery.

Product Benefits

  • High purity alpha A12O3 slurries
  • Readily available in commercial quantities
  • Provide fast MRR and controlled surface finish
  • Does not recrystallize like colloidal silica
  • Can be recycled to maximize life
  • Tightly controlled particle size distribution and oversized particles
  • ISO certified to always bring consistency
  • Ability to customize products for specialized applications
  • Easy to clean with commercially available alkaline cleaners
  • Knowledgeable application engineers for technical support