MSP's Direct Liquid Injection Vapor Solutions

Featured Product from TSI Incorporated

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Better Vaporization – More Process Options

Vaporizers are used in gas phase processes to transition a liquid into a gas for thin film deposition or other processes that require a vapor (metal etch, doped epitaxial growth, etc). Vaporizers are widely used in:

  • CVD (Chemical Vapor Deposition)
  • PECVD (Plasma-Enhanced Chemical Vapor Deposition)
  • MOCVD (Metal-Organic Chemical Vapor Deposition)
  • ALD (Atomic Layer Deposition)

Wider Process Window. Improved Film Quality. Less Maintenance.

MSP’s Turbo-Vaporizers™ use a droplet vaporization, direct liquid injection technique. Our vaporizers use advanced technology in aerosol science and thermo-dynamics to create a more refined solution to vaporizing liquids.

In thin film applications, our Turbo-Vaporizers’ stable and uniform vapor leads to a higher quality thin film and higher wafer yields with less down time. MSP’s Vaporizers provide faster response time, high precision flow control, and are able to operate at high temperatures.

Features and Benefits:

  • Extremely stable concentration output
  • Low temperature vaporization/reduced risk of thermal decomposition
  • Longer Mean Time Between Repair (MTBR)
  • Ability to vaporize difficult precursors
  • Direct liquid injection - vapor on demand
  • Higher vapor concentration potential

Applications include:

  • Semiconductor Microelectronics
  • LEDs Optoelectronics
  • Protective Coatings
  • Nanoparticle Synthesis
  • Energy Production/Storage
  • Powder/Fiber Processing
  • Solar Photovoltaic
  • Medical Device
  • Bio Assays