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  • Particulate Removal from Process Furnace Exhaust (.pdf)
    This Ohio manufacturing company refurbishes Teflon coated baking trays by removing the teflon coating in a high temperature furnace. The process not only generates high levels of Hydrofluoric Acid but also particulates in the 5 micron size range.
  • TefTEC Filters Protect Stored Citrus Juice (.pdf)
    A Florida based citrus juice processing plant needed to use vent filters to prevent bacteria, mold spores, particulate matter and water from entering the juice storage tanks. Ingress of these contaminants could cause spoilage of the juice. The customer had decided to use PTFE membrane filters due
  • Ventilation for Acceptable Indoor Air Quaility
    was appointed to provide guidance on actions that should be taken to reduce the health and safety risks of occupants in buildings that might be subjected to extraordinary incidents, whether caused by war, terrorism, accident or natural disaster. The guidelines suggest that buildings incorporate particulate
  • MICRO: Surface Conditioning/Chemistries - Song (January 2001)
    in photoresist removal after dry etching or ion implantation. Most photoresist removal procedures consist of a combination of plasma-induced dry ashing and wet chemical treatments. Problems associated with the dry ashing process include incomplete resist removal and undesired by-products caused
  • Evaluating the performance of dual PTFE filter assemblies in hot-acid etch baths
    Recirculating hot-acid baths are widely used in the semiconductor industry for wet-etching, stripping, and cleaning silicon wafers. To meet the stringent cleanliness requirements of the industry, particulate contamination generated during processing is removed from the baths by recirculating
  • MICRO: Ultrapure Gas Delivery - Gotlinsky (July 2000)
    films, which have become increasingly thinner with each process generation. Filtration is a standard practice for maintaining the particulate cleanliness of process gases. In the case of anhydrous silane, particles are expunged by classical methods, ensuring removal of those particles generated
  • MICRO:Top 40 - Page 2 (Nov '00)
    , the 304 spin processor 300-mm platform complies fully with SEMI 300-mm automation and communications standards. Seen as a replacement for batch wet-bench applications, the spin processor performs backside film removal preceding advanced lithography operations and provides silicon stress relief
  • Medical Device Link .
    , sloshing or swirling, and ultrasonic extraction. In many cases, particle removal is accomplished by a simple spray wash. After the part has been cleaned, solvent or aqueous solution is sprayed from a high-pressure nozzle onto the surfaces of a part. The effluent is captured in a clean container

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