Nitrides / TiN Thin Film Equipment Datasheets
from EBARA Technologies, Inc.
Gas Inlet Devices. Patent gas inlet devices minimize rate of restriction and automatic gas inlet plunger removes restrictions without process interruptions. Second Scrubbing Chamber. Five fine spray, high velocity nozzles ensures effective removal of impurities. First Scrubbing Chamber. Coarse... [See More]
- Materials Processed: Tungsten; Metal; Silicon; Polymer; Nitrides
- Process: Chemical Vapor Deposition
- Type: Free Standing System; Cluster Tool
- Applications: Semiconductors
from ULVAC Technologies, Inc.
The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH4 or TEOS. A high-frequency (27.12 MHz) power supply enables high-quality film deposition. [See More]
- Materials Processed: Oxides; Nitrides
- Process: Physical Vapor Deposition; RF_Sputter
- Type: Cluster Tool
- Applications: Flat Panel Display