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  • MICRO:Behind the Mask
    to system designers and manufacturers. Laser pattern generators are susceptible to the influence of airborne molecular contamination (AMC), which affects both chemically amplified resists (CARs) and laser optics. However, while semiconductor wafer lithographers have confronted similar challenges
  • Agfa Gains Top Security Clearance from U.S. Air Force Air Mobility Command
    The United States Air Force's Air Mobility Command (AMC) has certified the security of the Agfa IMPAX TM PACS (Picture Archiving and Communication System) version 4.5. The certification of Agfa's IMPAX solution is based on rigorous guidelines defined by the Defense Information Systems Agency
  • MICRO: Tool/Fab Automation
    Marc Veillerot, Adrien Danel, Sybil Quiais-Marthon, and Fran cois Tardif, CEA/LETI One of the main challenges facing microcontamination control in advanced fabs is airborne molecular contamination (AMC). Reported examples of the detrimental impact of AMC on IC devices include metal corrosion
  • MICRO:Facilities Technologies by Oleg P. Kishkovich p.61 (June '99)
    contamination (AMC) challenges before production problems arise. Citing examples of how real-time monitoring is being employed in production fabs, the article compares the different monitoring technologies, examines single-point investigative and multipoint process monitoring strategies, and describes

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