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  • A Close-up Look at White-Speck Neps in Cotton
    labor-intensive agitators and wringers in 1922. As washing technology has advanced, so have the tools of textile science. Take microscopes as a case in point. The scanning electron microscope (SEM) was developed in 1942 and has been commercially available since the early 1960s. It uses electrons to scan
  • MICRO:Product Technology News (Sept '99)
    The SEMVision cX scanning electron microscope automatically reviews and classifies wafer defects in advanced semiconductor production lines. The system can examine up to 500 defects per hour and offers color multiple-perspective SEM imaging for enhanced topography and material information about
  • MICRO: Defect Analysis and Metrology - Ge (Feb 2000)
    of this technique. Two high-resolution defect review techniques, scanning electron microscopy (SEM) and atomic force microscopy (AFM), can be used to characterize deep submicron defects. While SEM provides information on lateral defect size and shape, it does not provide quantitative height information

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