-
Supplier: Deposition Sciences, Inc.
Description: EVAPORATION TECHNOLOGY In a typical evaporative coating chamber, one or more racks hold the substrate material to be coated. The first step in the process is to pump all the air out of the chamber to achieve a very high vacuum (10-6 Torr or better). A succession of coating
- Functional / Performance: Abrasion Resistant, Antireflective, Chemical Resistant, Dielectric, Reflective
- Industry: Aerospace, Automotive, Electronics, Government, Medical / Healthcare, Military Specification, OEM / Industrial, Other
- Material / Substrate Capabilities: Metal, Precious Metals, Specialty / Other
- Material Selection / Design Assistance: Yes
-
Supplier: Deposition Sciences, Inc.
Description: EVAPORATION TECHNOLOGY In a typical evaporative coating chamber, one or more racks hold the substrate material to be coated. The first step in the process is to pump all the air out of the chamber to achieve a very high vacuum (10-6 Torr or better). A succession of coating
- Additional Services / Processes: Material Selection / Design Assistance
- Coating Process: Thin Film Coating
- Functional / Performance: Abrasion Resistant, Antireflective, Chemical Resistant, Dielectric
- Industry Served: Aerospace, Automotive, Electronics, Government, Medical / Healthcare, Military Specification, OEM / Industrial, Other
-
Description: projects, as well as production quantity chambers that are built-to-print for equipment manufacturers. Semiconductor, thin-film deposition and compound semiconductor processing are common applications for our high-vacuum, O-ring sealed chambers that operate at pressures
- Chamber / Component Type: Load Lock Chamber
- Chamber Material: Stainless Steel
- Vacuum / Pressure Range: High Vacuum (< 10-3, >10-8 torr)
-
-
Supplier: Leybold USA Inc.
Description: UNIVEX 450 G Owing to its chamber dimensions, the UNIVEX 450 G is suited for all coating tasks requiring much space. Substrates, respectively substrate holders up to an overall diameter of over 400 mm can be processed. With a height of 650 mm, the vacuum chamber is also suited
- Applications & Materials Processed: Semiconductor Manufacturing, Photovoltaic / Solar, Medical, Nanomaterials
- Coating System Type: Batch System (Single Chamber / Multiple Wafers), Factory / Free Standing
- High Vacuum Pump Type: Turbomolecular
- Integral Process Controller: Yes
-
Supplier: Leybold USA Inc.
Description: UNIVEX 350 G The UNIVEX 350 G combines a compact design with plenty of chamber space. For many coating tasks the UNIVEX 350 G offers optimum space conditions and operator convenience as to process components and substrate processing. Substrates, respectively substrate holders up to an overall
- Applications & Materials Processed: Semiconductor Manufacturing, Photovoltaic / Solar, Medical, Nanomaterials
- Coating System Type: Batch System (Single Chamber / Multiple Wafers), Factory / Free Standing
- High Vacuum Pump Type: Turbomolecular
- Integral Process Controller: Yes
-
Supplier: Leybold USA Inc.
Description: UNIVEX 250 G The UNIVEX 250 G is a convenient and cost-effective solution for coating tasks requiring not much space. Substrates, respectively substrate holders up to an overall diameter of approximately 220 mm can be processed.
- Applications & Materials Processed: Semiconductor Manufacturing, Photovoltaic / Solar, Medical, Nanomaterials
- Coating System Type: Batch System (Single Chamber / Multiple Wafers), Factory / Free Standing
- High Vacuum Pump Type: Turbomolecular
- Integral Process Controller: Yes
-
Supplier: Leybold USA Inc.
Description: UNIVEX 400 The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates. In the vacuum chamber which is 420 mm wide, substrates
- Applications & Materials Processed: Semiconductor Manufacturing, Optical Coatings, Photovoltaic / Solar, MEMS
- Coating System Type: Batch System (Single Chamber / Multiple Wafers), Factory / Free Standing
- High Vacuum Pump Type: Turbomolecular
- Integral Process Controller: Yes
-
Description: lower than attainable with single stage pumps Ultimate Vacuum: 0.2 microns (McLeod Gauge) Positive pressure lubrication assures operation at any pressure up to atmospheric pressure No metal-to-metal contact in pumping chamber Unequalled durability, even in dirty applications
- Applications: General Purpose / Industrial, Semiconductor Manufacturing
- Configuration: Individual Vacuum Pump
- Gas Ballast: Yes
- Mechanical Pump Type: Rotary Piston
-
Supplier: Quorum Technologies
Description: deposition on a range of specimen types. The system is designed to sputter non-oxidising (noble) metals - eg gold (Au), gold/palladium (Au/Pd) and platinum (Pt) - and is fitted with three individual sputtering heads to ensure even sputtering deposition over a large diameter.
-
Supplier: Quorum Technologies
Description: sputtering deposition over a large diameter. Chromium (Cr) targets are fitted as standard. NB: For sputtering non-oxidising metals only, see the Q300R T Triple Target, Large Chamber, Rotary-Pumped Sputter Coater. For sequential sputtering of two different oxidising or
-
Supplier: Nikon Metrology
Description: to use with fully automated vacuum and sputtering. Insert your samples, turn the unit on and select the sputtering time. The chamber will evacuate and sputtering will begin automatically. When the unit is powered down, it vents to atmosphere. Thickness of the coating is influenced by
- Applications & Materials Processed: Research / Surface Analysis
- Coating System Type: Batch System (Single Chamber / Multiple Wafers), Laboratory / Benchtop
- Materials Processed (Deposit or Substrate): Metal
- Maximum Part Diameter / Width: 49.5 mm
-
Description: Viewport shutters are normally installed on a vacuum chamber CF flange behind a viewport. The shutter serves to shield the viewport surface and prevent the build-up of deposition materials. The shutter plate opens a full 90 degrees by rotating the supplied all metal
- Configuration: All Ports Same Type
- Fitting Connection / Port Type(s): Flange
- Flange and Fitting Seal / System: Conflat
- Materials of Construction: Steel - Stainless
-
Description: Viewport shutters are normally installed on a vacuum chamber CF flange behind a viewport. The shutter serves to shield the viewport surface and prevent the build-up of deposition materials. The shutter plate opens a full 90 degrees by rotating the supplied all metal
- Configuration: Multiple Port Type / Adapter
- Fitting Connection / Port Type(s): Flange
- Flange and Fitting Seal / System: Metal Seal (Wire / Copper Gasket), Elastomeric Face Seal / O-ring, ISO-KF / ISO-QF (Small Clamped, <2"), Conflat
- ISO Nominal Size: NW 10, NW 16, NW 25, NW 40, NW 50, NW 63, NW 80, NW 160
-
Supplier: Edwards Vacuum
Description: product chamber can be pumped by as many as two dedicated, high throughput 16 inch cryogenic pumps. The dual-cryo pump option makes it possible to pump this large chamber in 15 minutes from atmosphere to pressures in the range of 10E-7. During wafer exchanges, the source chamber
- Applications & Materials Processed: Research / Surface Analysis
- Gas Control Unit: Yes
- High Vacuum Pump Type: Cryogenic / Cryosorption
- Integral Process Controller: Yes
-
Supplier: Edwards Vacuum
Description: inch x38 inch x 28 inch box type product chamber is pumped by a high throughput 16 inch cyro pump. During wafer exchanges, the source chamber is maintained at high vacuum by the independent pumping of dedicated 10 inch cryo pump.
- Applications & Materials Processed: Research / Surface Analysis
- Gas Control Unit: Yes
- High Vacuum Pump Type: Cryogenic / Cryosorption
- Integral Process Controller: Yes
-
Supplier: Fredericks Company - Televac
Description: Cleanable Cold Cathode Sensor Range: (10-11 to 10-2 Torr) Robust Construction: All wetted materials are 304 stainless. Metal-sealed/cleanable subassembly can be maintained without breaking the primary vacuum interface UHV
- Additional Pressure Reading: Gauge
- Device Category: Sensor
- Operating Temperature: 32 to 122 F
-
Description: Nor-Cal Products offers a complete line of viewports for vacuum chambers with NW, ISO and CF flanges. CF flanged viewports are available with fully annealed 7056 glass or fused quartz. Special materials and coatings, such as sapphire and anti-reflective (AR) coating, are available on
- Configuration: All Ports Same Type
- Fitting Connection / Port Type(s): Flange
- Flange and Fitting Seal / System: Conflat
- Flange OD: 2.75 to 10 inch
-
Supplier: Plansee SE
Description: Thermal evaporation (resistance evaporation) is a coating method used as part of the PVD process (Physical Vapor Deposition). The material that is to form the subsequent layer is heated in a vacuum chamber until it evaporates. The vapor formed by the material
- Materials Processed: Molybdenum, Tungsten, Specialty / Other
-
Supplier: Deposition Sciences, Inc.
Description: DSI produces a wide variety of highly reliable, durable, and heat-resistant optical and electromagnetic coatings. Our exclusive technologies and custom deposition chambers offer coatings from the ultraviolet (UV) through the infrared longwave infrared (LWIR) spectral wavelengths. In
- Coating: Antireflection, Beamsplitter, Dielectric, Filter, Mirror, Other
- Regional Preference: North America, United States Only
- Substrate Materials: Glass, Other
- Substrate Fabrication: Yes
-
Supplier: Quorum Technologies
Description: K975X The K975X is a compact, bench-mounted, multiple application thermal evaporator for vacuum deposition of thin layers of carbon and metals. It is ideal for a wide range of techniques, including the production of carbon support films and replicas for TEM and
- Application: Other
- Process: Thermal
-
Supplier: Plansee SE
Description: Vapor Deposition). The material that is to form the subsequent layer is heated in a vacuum chamber until it evaporates. In the vacuum evaporation process resistant layers are produced, for example, from aluminum, silver, chromium, titanium nitride or silica. The result:
- Materials Processed: Molybdenum, Tungsten, Specialty / Other
Find Suppliers by Category Top
Featured Products Top
-
be extended to other product families. Delivering new levels of efficiency in semiconductor production – COBRA BC Premium Efficiency Ideal for load-lock chambers in semiconductor processing to prevent contamination Physical vapor deposition (PVD (read more)
Browse Vacuum Pumps and Vacuum Generators Datasheets for Busch Vacuum Solutions -
solvents are fully recovered. Consisting of a square or round vacuum chamber with customized fixed internal shelves; the wet material to be dried is loaded into pans or trays and manually placed on the shelves. The top part of each shelf is flat with a coil jacket on the underside to circulate (read more)
Browse Process Dryers Datasheets for Hebeler Process Solutions -
solvents are fully recovered. Consisting of a square or round vacuum chamber with customized fixed internal shelves; the wet material to be dried is loaded into pans or trays and manually placed on the shelves. The top part of each shelf is flat with a coil jacket on the underside to (read more)
Browse Process Dryers Datasheets for Hebeler Process Solutions -
chemicals and solvent reclamation of widely varying densities and viscosities. Depending upon the application vacuum drum dryers can be designed for batch operation, which requires the chamber to be returned to atmospheric pressure to remove the dried product, or continuous operation, which allows (read more)
Browse Powder Dryers Datasheets for Hebeler Process Solutions -
Vacuum Pan Dryers Vacuum Pan Dryers are highly versatile and can be configured to combine a number of process operations in one unit without removing and exposing the product to (read more)
Browse Process Dryers Datasheets for Hebeler Process Solutions -
of a tokamak is its doughnut-shaped vacuum chamber. Inside, under the influence of extreme heat and pressure, gaseous hydrogen fuel becomes a plasma—the very environment in which hydrogen atoms can be brought to fuse and yield energy. ITER will be the world's largest tokamak (read more)
Browse Vacuum Chambers and Components Datasheets for Technetics Group -
, fine chemicals and solvent reclamation of widely varying densities and viscosities. Depending upon the application vacuum drum dryers can be designed for batch operation, which requires the chamber to be returned to atmospheric pressure to remove the dried product, or continuous (read more)
Browse Process Dryers Datasheets for Hebeler Process Solutions -
Vacuum Pan Dryers Vacuum Pan Dryers are highly versatile and can be configured to combine a number of process operations in one unit without removing and exposing the product to atmosphere (read more)
Browse Process Dryers Datasheets for Hebeler Process Solutions -
any other way. A molten metal atomizer chamber Depending on the nature of the metal and the nozzle, the chamber could either be kept in a high vacuum or in a low-pressure atmosphere. Water is the most common jet material for low reactive metals that melt below 1600 °C. It also (read more)
Browse Specialty Ceramics Datasheets for Xiamen Innovacera Advanced Materials Co., Ltd. -
nitride is produced by chemical vapour deposition (CVD), depositing onto graphite at temperatures in excess of 1800°C. The use temperature of boron nitride ceramic crucible in a vacuum is 1800 degrees, and the use temperature under atmosphere protection is 2100 degrees. Nitrogen or argon (read more)
Browse Specialty Ceramics Datasheets for Xiamen Innovacera Advanced Materials Co., Ltd.