Achieve superior accuracy and unmatched zero stability in ultra-low-flow gas and liquid measurement and control with the Quantim® Coriolis mass flow controllers and meters from Brooks Instrument. Brooks has taken the lead in driving improvements in Coriolis flow technology: Our patented Coriolis sensor design measures low flows independent of fluid type or process variables. The result: unsurpassed performance - the most accurate, stable, repeatable and reproducible mass flow measurement and control, even under changing conditions.

Features

• True mass flow measurement
• Accurate density measurement
• 100% of fluid flows through low-mass sensor tube (no bypass)
• Proprietary optical sensing technique enables accuracy at extreme low flows
• Measures both liquids and gases over a wide flow range
• Coplanar valve delivers super-fast response times
• Smallest, lowest-flow Coriolis meter and controller available on the market
• Measures and outputs two of four parameters: mass flow, volumetric flow, temperature, density
• Independent diagnostic/service port and user display
• Variety of material options, enclosure types and area classifications available

Benefits

• Advanced sensor and tube technology enable accuracy at extreme low flows
• Process chemistry and/or process conditions can be altered without the need to change or recalibrate the measurement system
• Multivariable outputs improve and simplify process monitoring and diagnostics, increasing yields and reducing cost of ownership
• Integrated sensor, valve and PID control in one package simplifies purchase, installation and startup
• Reaches set point in <2 seconds reducing wasted material
• Compact size enables easy integration into intricate process systems
• No internal moving parts minimizes maintenance

Applications

• Vacuum processes
• Catalyst research
• Liquid precursor delivery to vaporizers
• Precision coating
• High accuracy filling stations
• Metering pump feedback/control loop

Multiple gases in one device equals maximum process flexibility and productivity. The GF40 Series elastomer sealed mass flow controllers and meters with Brooks Instrument’s exclusive MultiFlo™ technology provide the perfect choice for systems, processes and facilities that use a variety of gases, change gas types frequently or need to re-range while preserving gas measurement and control accuracy. It enables a new level of process flexibility combined with unprecedented flow measurement and control performance.

Features

• Programmable multi-gas/multi-range capabilities
• Brooks® MultiFlo™ gas database contains thousands of native gas runs to establish correction functions
• Sub-1 second flow response time and accuracy of 1% set point for demanding applications
• Well suited for a variety of gases
• Fast response, Hastelloy sensor
• Easily accessible diagnostic service port is independent of tool communication
• Multi-protocol communication options include DeviceNet™, EtherCAT®, Profibus® and RS-485 analog interface

Benefits

• MultiFlo™ technology enables new gas calibrations and full-scale ranges without removing the MFC from the gas line, maximizing process uptime
• MultiFlo™ programming is simple and user-friendly; new gas can be selected in under 60 seconds
• OEMs and large end users can greatly reduce the number of gas and range-specific controllers they inventory
• Excellent process gas accuracy backed by superior metrology systems and calibration based on global standards
• Corrosion-resistant sensor provides unmatched long-term stability ensuring maximum yield and throughput
• User-accessible service port simplifies troubleshooting and diagnostic tasks
• Variety of elastomer seals provide cost performance flexibility across range of applications
• Multi-protocol communication interface supports integration into existing systems

Applications

• Solar cell chemical vapor deposition systems
• Life sciences bioreactors
• Vacuum processes
• Nanotechnology/MEMS fabrication
• Plasma, glass and web coating systems
• Excellent option for manifold/gas delivery systems

The faster your thermal mass flow controllers and meters respond, the more efficient and productive your processes can be. That’s the key advantage of the 4800 Series controllers and meters: An advanced MEMS-based thermal sensor, combined with a proprietary PID algorithm to optimize control valve response, makes it possible for select 4800 Series controllers to quickly match actual mass flow to any changes in set point. The optional Local Operator Interface (LOI) provides a convenient user interface to view, control, and configure the devices eliminating the need for remote secondary electronics.

Features

• Flow response time (settling time) <0.75 seconds
• Innovative MEMS sensor and proprietary PID algorithm
• Compact size is less than half the size of typical thermal MFCs: 1” x 3” x 4” (25 mm x 76 mm x 101 mm)
• Optional Local Operator Interface (LOI) simplifies set-up and operation; free LabVIEW VI download for monitoring and zeroing the device
• Digital capability via RS-232

Benefits

• Well suited for wide range of common, non-corrosive gases
• Fast response time ensures rapid steps during process recipe changes
• Excellent for OEMs: Compact size eases integration into tight machine spaces and speeds installation
• Optional Local Operator Interface (LOI) is a turnkey solution for local indication, set point control and device configuration; eliminates need for remote secondary electronics
• Variety of communication options makes it easy to align with user requirements

Applications

• Heat treating, cutting/welding and other thermal processes
• Solar/thin film physical vapor deposition (PVD) systems
• Analytical devices to measure and control reagent, calibration and sample gas flows

Every product line has a workhorse — our 5850E and 5850i Series thermal mass flow controllers fit the bill. Actively in use for decades in thousands of applications worldwide, they utilize a unique, extremely stable flow sensor to provide the reliable, accurate and repeatable measurement and control that today’s demanding industrial manufacturing processes require.

Features

• Long-term zero stability of <0.2% full scale per year
• Fast flow response to command changes with negligible overshoot/undershoot
• Wide range of flow ratings - from 3 sccm up to 1000 slpm
• High pressure rating - up to 1,500 psi
• Removable flow sensor
• Insensitive to mounting attitude
• Mechanically and electrically compatible with other mass flow controllers
• Electrically activated valve override
• Corrosion-resistant valve

Benefits

• Proven long-term stability and accuracy across broad process and application range
• Excellent return on investment due to reliable performance
• Removable flow sensor eliminates need for continuous monitoring and readjustment of gas pressures
• Easily installed and serviced due to analog only input/outputs

Applications

• Chemical and petrochemical catalyst research and pilot processes
• Laboratory and analytical systems
• Life sciences bioreactors
• Solar

Imagine choosing just one mass flow controller platform to handle fourteen different pressure or flow rates going into a single process. All while delivering the exact same, ultra-precise and repeatable output on the other side. That’s the advanced simplicity you get with the SLA5800 Series mass flow controllers and meters.

The SLA5800 Series features the high accuracy, high zero stability and high repeatability you expect from the industry leader in mass flow measurement and control technology. Engineered with advanced, configurable multi-gas/multi-range capabilities, they offer a better zero drift specification compared to competitive products and have been proven to maintain factory calibration and accuracy longer.

Features

• Long-term zero stability of <0.2% full scale per year
• Excellent accuracy
• Wide range of flow ratings - from 0.003 up to 2500 lpm
• Highest pressure ratings - up to 1500 psi/100 bar (optional: 4500 psi/310 bar)
• Programmable multi-gas/multi-range capabilities
• Independent & easily accessible diagnostic/service port
• Broad array of communication options including DeviceNet®, Profibus® and RS-485 plus analog interfaces
• Modular design is easy-to-service at the factory or in the field

Benefits

• Long-term sensor stability reduces maintenance and periodic recalibration requirements, reducing total cost of ownership
• Proprietary Brooks Instrument thermal sensing technology delivers superior signal to noise performance for improved accuracy at low set points
• Choose one device platform for different gases and flow ranges
• Storage and pre-programming of up to six gas calibrations lets users easily switch between different gases and ranges on a single device, and reduces inventory
• User-accessible service port simplifies installation, troubleshooting and diagnostic tasks without disturbing flow controller operation
• Durable, robust metal top lid prevents damage during installation
• Multi-protocol communication interface simplifies integration into existing systems
• Superior metrology and primary calibration systems based on global standards ensure accuracy

Applications

• Chemical and petrochemical catalyst research and pilot processes
• Laboratory and analytical systems
• Fuel cell technology
• Life sciences bioreactors

Whether it’s dust, moisture, temperature extremes or wash-down requirements, the SLAMf Series elastomer sealed thermal mass flow controllers and meters deliver the precise accuracy and long-term stability of our proven SLA5800 family of meters and controllers. A specially engineered NEMA4X/IP66 enclosure protects our advanced digital electronics and ensures stable, accurate measurement and control of your process-critical gas and liquid mass flows.

Features

• NEMA4X / IP66 rated hardened enclosure
• Wide range of flow ratings - from 0.003 up to 2500 lpm
• Suitable for a broad range of temperature and pressure conditions
• Industry-leading thermal flow measurement sensor technology delivers excellent accuracy
• Programmable multi-gas/multi-range capabilities
• Advanced self-test routines and an independent diagnostic service port lets users troubleshoot or change flow conditions without removing the MFC from service
• Broad array of communication options including DeviceNet®, Profibus® and RS-485 plus analog interfaces

Benefits

• Hardened device housing ensures process accuracy and control in harsh conditions
• Proprietary thermal sensing technology delivers superior signal to noise ratio at low set points
• Long-term sensor stability reduces maintenance and periodic recalibration requirements
• Choose one device, program up to six different gas calibrations
• User-accessible service port simplifies installation, troubleshooting and diagnostic tasks
• Excellent accuracy backed by superior metrology systems and calibration based on global standards
• Multi-protocol communication interface simplifies integration into existing systems

Applications

• Chemical and petrochemical pilot plants
• Life sciences bioreactors
• Blanketing in food processing

Offering state of the art performance in high temperature gas measurement and control, the 5850EMH Series high temperature metal sealed mass flow controller from Brooks Instrument combines the outstanding leak integrity of metal seals with a variety of options allowing maximum application flexibility. The heart of the 5850EMH Series is the highly stable sensor which provides an electrical output signal linear with flow rate. This signal is used for indicating, recording and/or control purposes without the need for an auto-zero circuit.

Features

• High leak integrity (less than 10-11 Pa.m3/s (10-10 atm.cc/s) He)
• Wide flow range (0.003 – 100 slpm)
• High-purity VAR 316L Stainless Steel
• Particulate-free
• Helium leak check ports
• Normally closed valve (normally open valve optional)
• Electrically-activated valve override
• Low command flow cutoff
• TTL compatible “valve off” function

Benefits

• Stable, proven product platform
• High flow capability up to 100 lpm (N₂ equivalent)
• All-metal flow path enhances gas purity and reduces leaks
• Easily installed and serviced with analog only input/outputs

Applications

• Optical Fiber Manufacturing – MCVD, OVD, AVD
• Water Vapor Flow Control

Engineered for the challenging conditions associated with high temperature delivery of condensable precursors and dopants, the 9861 Series high temperature thermal mass flow controllers and meters from Brooks Instrument feature a high purity, high leak integrity metal flow path ensuring compatibility with all process gases and vapors. The patented IsoSensor™ is a high stability flow sensor compatible with the elevated environmental temperatures found in heated gas lines and baking systems. The ultra-low drift performance of the IsoSensor™ reduces the need for frequent re-zeroing and recalibration typical in high temperature applications.

Supply or discharge pressures may vary. But with flow controllers from Brooks Instrument, the differential pressure across the integral manual flow regulating valve remains constant. An internal diaphragm-actuated control valve receives incoming pressure on one side and outlet pressure with spring action on the other. This design balances pressure variations to maintain a fixed differential pressure across the valve that ensures constant flow. The result is precise flow control for many gas and liquid-service applications. Can be used as a stand alone flow controller or integrally mounted to a flow meter to save space and improve installation.

Features

• Accurately adjusts and maintains gas and liquid flows
• Model FC 8744 - low flows with variable downstream pressures
• Series FC 8800 – with variable upstream pressures
• Series FC 8900 - with variable downstream pressures
• Flow Ranges
• Air: Up to 2130 scfh / 56,000 ln/h
• Water: Up to 480 gph / 1820 l/h
• Pressure Ratings: Up to 1000 psig / 69 bar
• Controller body made from 316 stainless steel, brass or aluminum (FC 8744 only)
• Controller diaphragm made from Buna-N, Teflon® or Viton® fluoroelastomers
• Needles made from 316 stainless steel for cartridge valve, NRS valve or high-flow needle valve

Benefits

• Integral mounting to flow meter saves space and improves installation
• High-resolution valves provide precise flow control for many applications
• Choice of different diaphragm and O-ring materials ensures process immunity and flexibility
• Available in a range of sizes and front or rear mounting options to easily meet installation requirements

Applications

• Pharmaceutical production
• Oil and gas pumping and refining processes
• Fuel cell research
• Chemical manufacturing
• Analytical instrumentation
• Water treatment and distribution systems

5850EM Series metal sealed mass flow controllers measure and control high-pressure gas flows in ultra-clean environments with a proven stability built on the performance of the widely used 5850E & i Series MFCs. Its metal sealed construction and electro-polished wetted surfaces ensure outstanding flow integrity and help improve overall process efficiency by eliminating the need for continuous monitoring and readjustment of gas pressures to provide a stable gas flow.

Features

• Long-term zero stability of <0.2% full scale per year
• <3 seconds settling time to command changes with negligible overshoot/undershoot
• Wide flow range – from 3 sccm up to 30,000 slpm
• High pressure rating - up to 1,500 psi
• Optional enhanced process internal finish - 5µ inch Ra avg
• Removable flow sensor
• Insensitive to mounting attitude
• Mechanically and electrically compatible with other mass flow controllers
• TTL compatible "valve off" and purge function

Benefits

• All-metal flow path enhances gas purity and reduces leaks
• Proven long-term stability and accuracy across broad process and application range
• Excellent return on investment due to reliable performance
• Removable flow sensor eliminates need for continuous monitoring and readjustment of gas pressures
• Easily installed and serviced with analog only input/outputs

Applications

• Fiber Optic
• LED / MOCVD
• Semiconductor
• Solar

Fast responding, repeatable delivery of process gases with high and ultra-high levels of purity—that’s the performance the GF100 series of metal sealed mass flow controllers and meters provides. Designed for semiconductor, MOCVD and other gas flow control applications, the GF100 series exceeds the semiconductor industry standard for reliability, ensuring repeatable, highly stable performance over time. Standard MultiFlo^TM technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy.

The result: increased process flexibility and efficiency combined with the industry’s highest levels of process gas purity to help maximize yields and productivity.

Features

• Long-term zero stability of <±0.5% full scale per year
• Settling times: 700 ms - <1 second
• Full-scale flow rates up to 300 slpm
• All-metal seal flow path: option for 4µ or 10µ inch Ra surface finish
• Corrosion-resistant Hastelloy® T-Rise sensor improves measurement reproducibility at elevated temperatures
• MultiFlo^TM gas and range programmability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
• Local display
• Optional SDS gas delivery
• DeviceNet^TM, RS-485 L-Protocol and analog interfaces

Benefits

• High-performance components marathon tested to seven times semiconductor industry standards for reliability
• All metal, corrosion resistant flow path with reduced surface area and unswept volumes ensures faster dry-down during purge steps
• With MultiFlo^TM, new process gases and/or ranges can be set in under 60 seconds – no more removing and calibrating MFCs
• Highly configurable platform enables drop-in replacement and upgrade of most brands of metal sealed MFCs, including the former Celerity, Mykrolis, Tylan and UNIT brands
• GF120 Safe Delivery System (SDS®) is Brooks’ state-of-the-art low pressure drop mass flow controller for the delivery of sub atmospheric safe delivery system (SDS) gases used in Implant and Etch processes
• Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting

Applications

• Semiconductor etch tools
• Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD)
• Physical vapor deposition (PVD) systems
• Epitaxial process systems

Ultra-fast response times and the highest level of purity – the GF125 Series are second generation multi-variable, pressure transient insensitive (PTI), metal sealed mass flow controllers and meters. First to bring PTI mass flow control technology to market, GF125 minimizes process gas flow variation due to pressure and temperature fluctuations. Standard MultiFlo™ technology enables one MFC to support thousands of gas types and range combinations without removing it from the gas line or compromising on accuracy.

The result: reduced size and cost of gas panels, by eliminating the need for point of use pressure regulators, pressure transducers, and associated hardware, combined with the industry’s best PTI performance to maximize yields and productivity.

Features

• Long-term zero stability of <±0.5% full scale per year
• Ultra-fast settling times: 300 ms - <700 ms
• Full-scale flow rates up to 300 slpm
• Ultra-high purity flow path - 4µ inch Ra surface finish
• SEMI F20 compliant wetted materials
• Corrosion-resistant Hastelloy® T-Rise sensor with high speed ARM processor
• Fast acting, diaphragm-free valve assembly is unaffected by differential pressure and tested for over seven million cycles without any failures
• MultiFlo^TM technology offers unparalleled flexibility—one device can be programmed for thousands of different gas and flow range configurations without removing the MFC from the gas line or compromising accuracy
• Local display indicates flow, temperature, pressure and network address for easy troubleshooting of gas supply and isolation valve issues
• Optional High Accuracy configuration
• DeviceNet^TM, RS-485 L-Protocol and analog interfaces

Benefits

• By combining Brooks' patented flow sensor technology with a fast acting diaphragm free valve assembly, the GF125 Series delivers up to 3 times faster response and settling time compared to other mass flow controllers
• Optimized wetted flow path for improved dry-down
• With MultiFlo^TM, MFC full scale flow range can be re-scaled down typically by a factor of 3:1 with no impact on accuracy, turndown or leak by specifications, for optimum process and inventory flexibility
• A full gas database delivers the widest process gas coverage
• Pressure Transient Insensitivity (PTI) capability overcomes limitations of conventional MFCs that react strongly to small inlet pressure fluctuations. The result is stable performance and predictable accuracy.
• GF125 High Accuracy (HA) with superior low setpoint accuracy makes it possible to replace two (a high and low flow) mass flow controllers with one, providing immediate cost savings while freeing up a gas line for greater gas panel flexibility.
• Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting

Key Applications

• Semiconductor
• MOCVD
• Gas flow control applications that require a high purity all-metal flow path

Keep critical flow processes on-target and maximize throughput with the GF135 Advanced Diagnostics Pressure Transient Insensitive (PTI) mass flow controller. The world’s first “smart” mass flow controller is a true game changer: It performs integral rate-of-decay flow measurement without stopping the flow of process gas. It allows semiconductor manufacturers to verify process gas accuracy, check valve leak-by and monitor sensor stability in real time without removing the flow controller from the gas line.

Combined with an all-metal wetted flow path, ultra-fast settling times and industry-leading process gas accuracy, the GF135 PTI MFC has the potential to transform the productivity and throughput rates for a wide range of deposition processes.

Features

• Long-term zero stability of <±0.5% full scale per year
• Ultra-fast settling times: <300 ms - <400 ms
• Full-scale flow rates: 3 sccm to 5 slm
• Ultra-high purity flow path - 4µ inch Ra surface finish
• Embedded real-time flow error detection and trending using Rate of Decay (ROD) techniques
• Enhanced process gas accuracy - up to three times improvement - through advanced gas modeling optimized through actual gas testing
• Third generation pressure transient insensitivity (PTI) technology
• High visibility, electronically rotatable LCD display provides local indication of flow, temperature, pressure and network address
• DeviceNet™, RS-485 and analog interfaces

Benefits

• Real-time flow error detection enables faster adjustments to flow deviations and supports wafer yield improvement
• Sensor stability tracking improves system uptime by supporting predictive maintenance
• Valve leak-by tracking helps minimize first wafer effects
• Enhanced process gas accuracy meets process gas chemistry control challenges at 10 nm
• Market leading flow settling time reduces non-productive flow stabilization steps, supporting advanced 3D device processing
• Enhance pressure insensitivity delivers superior process gas control for enhanced etch and deposition control
• Corrosion-resistant Hastelloy® sensor provides unmatched long-term sensor stability ensuring maximum yield and throughput
• Drop-in replacement for surface-mount and VCR MFCs is an easy upgrade for critical gas lines on existing systems

Applications

• Semiconductor advanced etch tools

For many industrial and semiconductor processes, both performance and cost efficiency are crucial. The GF80 Series metal sealed mass flow controllers and meters deliver both: Engineered using the same fast response sensor and patented 4^th generation MultiFlo™ technology as our best-selling GF100 series, it’s the right choice for operations that need high performance at a value price point. Moving to a metal sealed MFC brings the full benefit of MultiFlo^TM multi-gas/multi-range capability since there are no limitations in gases that can be used, enhanced purity of the gas due to elimination of oxygen permeation through elastomers, and a reduction in maintenance since metal seals will last indefinitely.

Features

• Long-term zero stability of <±0.5% full scale per year
• <1 second settling times
• Full-scale flow rates up to 300 slpm
• All-metal seal flow path - 16µ inch Ra surface finish
• Corrosion-resistant Hastelloy® sensor can operate at lower temperatures for gases prone to thermal decomposition
• Programmable MultiFlo^TM capability—one device, thousands of gas types and range combinations without removing the MFC from the gas line or compromising accuracy
• Best-in-class temperature coefficient specification through active temperature compensation
• Embedded self-test routines and independent diagnostic/service port
• Slimline body with VCR fittings
• DeviceNet^TM, Profibus®, RS-485 and analog interfaces

Benefits

• Fast <1 second flow settling time eliminates wasted gas and process variability
• No elastomer seals that can have oxygen permeation, requiring replacement over time
• MultiFlo^TM simplifies and streamlines changing process gases — no more removing and calibrating MFCs
• New gases and/or ranges can be set in under 60 seconds
• Measurement accuracy not affected by temperature variations
• Convenient access to diagnostics port for maximum uptime
• Compact size eases integration into tight machine spaces; excellent choice for retrofits
• Multi-protocol communication interface simplifies integration into existing systems

Applications

• Cost efficient retrofit/upgrade of legacy MFCs in refurbished semiconductor process tools
• Reduce MFC inventory in six-inch/eight-inch semiconductor fabs
• MOCVD for LED and power device manufacturing
• Solar/thin film chemical vapor deposition (CVD) systems
• Analytical OEM equipment