The Optical MicroGauge Thickness measurement system C11011 series is a film thickness measurement system utilizing laser interferometry. Allows for high speed measurement at 60 Hz, so it can also be used inline measurement in factories. Combine with the optional mapping system to allow for prototype thickness distribution measurement. It can be used in a wide variety of applications, from monitoring manufacturing processes to quality control.

The Multipoint NanoGauge Thickness measurement system C11295 is a film thickness measurement system utilizing spectral interferometry. It is designed to measure film thickness as part of the semiconductor manufacturing process, as well as for quality control of the APC and films that are mounted on semiconductor manufacturing equipment. Allows multichannel measurement in real time, which provides simultaneous multichannel measurement and multipoint measurement on film surfaces. At the same time it can also measure reflectivity (transmittance), object color, and their changes over time.

The Optical NanoGauge Thickness measurement system C12562 is a compact, space-saving, non-contact film thickness measurement system designed to easily install in equipment where needed. In the semiconductor industry, measuring silicon thickness is essential due to the spread of through-silicon via technology; and in the film production industry, adhesion layer films are being made ever thinner to meet product specifications. So these industries now require even higher accuracy in thickness measurements ranging from 1 μm to 300 μm. The C12562 allows making accurate measurements across a wide thickness range from 500 nm to 300 μm that include the thin film coating and film substrate thickness as well as the total thickness. The C12562 also offers rapid measurements up to 100 Hz making it ideal for measurements on high-speed production lines.

The Optical NanoGauge Thickness measurement system C13027 is a non-contact film thickness measurement system utilizing spectral interferometry. The C13027 not only supports PLC connections but is also designed more compact than our other models for easy installation into equipment. Our Optical Gauge series is capable of measuring the thickness of extremely thin films down to 10 nm as well as covering a wide range of film thickness from 10 nm up to 100 μm. The Optical Gauge series also makes rapid measurements up to 200 Hz and so is ideal for measurements on high-speed production lines.

The Optical NanoGauge Thickness measurement system C15151-01 is a non-contact film thickness measurement system utilizing spectral interferometry. The high-power, highly stable white light source enables precise measurement of film thicknesses, even of super-thin films. Also, the light source has a lifetime of 10 000 hours, making it suitable for in-line operation.