Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 200 provides 200 watts of power output in a lightweight 15 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 1000 provides 1000 watts of power output in a lightweight 35 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 1250 provides 1250 watts of power output in a lightweight 35 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 300 provides 300 watts of power output in a lightweight 15 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 50 provides 50 watts of power output in a lightweight 15 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 500 provides 500 watts of power output in a lightweight 15 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 5000 provides 5000 watts of power output in a compact 95 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CB product family are available in power ranges from 50 to 5000 Watts with standard fixed frequencies from 13.56 MHz to 60 MHz. The CB 600 provides 600 watts of power output in a lightweight 15 lb unit. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CB series is based on Comdel's proven RF amplifier technology.
Applications:
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Small, lightweight packaging
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Simplify Operations and Reduce Costs Without Sacrificing Performance

Performance:
The CDX 1000 dual frequency RF generator comes in a 1200 watt design. The high frequency (HF) section of the CDX provides 600 watts of power, with optional frequencies from 2 to 60 MHz. The low frequency (LF) section delivers 600 watts, with optional fixed or variable frequencies ranging from 20 kHz to 13.56 MHz.
Applications:
This solid-state generator is ideal for plasma applications including bias, etch, deposition and ashing in semiconductor processing, as well as solar cell and photovoltaic applications.

Features:

• Compact packaging reduces space, service (electrical and plumbing), and spare inventory requirements
• Complies to CE-Mark standards and is ETL Marked and SEMI F47 compliant
• Protection circuits safeguard the amplifiers from over-voltage, over-current and over-power operating conditions
• Gain-control circuitry stabilizes output power against line and load variations, and limits power during high VSWR conditions

Simplify Operations and Reduce Costs Without Sacrificing Performance

Performance:
The CDX 2000 dual frequency RF generator comes in a 2000 watt design. The high frequency (HF) section of the CDX provides 1000 watts of power, with optional frequencies from 2 to 60 MHz. The low frequency (LF) section delivers 1000 watts, with optional fixed or variable frequencies ranging from 20 kHz to 13.56 MHz.
Applications:
This solid-state generator is ideal for plasma applications including bias, etch, deposition and ashing in semiconductor processing, as well as solar cell and photovoltaic applications.

Features:

• Compact packaging reduces space, service (electrical and plumbing), and spare inventory requirements
• Complies to CE-Mark standards and is ETL Marked and SEMI F47 compliant
• Protection circuits safeguard the amplifiers from over-voltage, over-current and over-power operating conditions
• Gain-control circuitry stabilizes output power against line and load variations, and limits power during high VSWR conditions

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band. The CLB 12K provides 12000 watts of power. The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CLB series is based on Comdel's proven RF amplifier technology.
Applications:
The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Small, lightweight packaging
• Standard power ranges: 2500, 3000, 5000, 6000, 12,000 Watts
• Any single frequency from 20 kHz to 2 MHz, varying +/-10%
• Phase lock tuning or software algorithm
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band. The CLB 2500 provides 2500 watts of power. The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CLB series is based on Comdel's proven RF amplifier technology.
Applications:
The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Small, lightweight packaging
• Standard power ranges: 2500, 3000, 5000, 6000, 12,000 Watts
• Any single frequency from 20 kHz to 2 MHz, varying +/-10%
• Phase lock tuning or software algorithm
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band. The CLB 3000 provides 3000 watts of power. The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CLB series is based on Comdel's proven RF amplifier technology.
Applications:
The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Small, lightweight packaging
• Standard power ranges: 2500, 3000, 5000, 6000, 12,000 Watts
• Any single frequency from 20 kHz to 2 MHz, varying +/-10%
• Phase lock tuning or software algorithm
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band. The CLB 5000 provides 5000 watts of power. The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CLB series is based on Comdel's proven RF amplifier technology.
Applications:
The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Small, lightweight packaging
• Standard power ranges: 2500, 3000, 5000, 6000, 12,000 Watts
• Any single frequency from 20 kHz to 2 MHz, varying +/-10%
• Phase lock tuning or software algorithm
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Comdel's Superior Design and Reliability in a Small, Lightweight Package

Performance:
RF generators from the CLB product family are available in power ranges from 2500 to 12,000 Watts at a single frequency in the 20 kHz to 2 MHz band. The CLB 6000 provides 6000 watts of power. The Turbotune Technology within the unit allows frequency tuning by automatically varying its output frequency +/-10% around its nominal frequency. The solid-state design provides precise and repeatable power control, ultra-stable output and low cost of ownership. The design of the CLB series is based on Comdel's proven RF amplifier technology.
Applications:
The CLB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Small, lightweight packaging
• Standard power ranges: 2500, 3000, 5000, 6000, 12,000 Watts
• Any single frequency from 20 kHz to 2 MHz, varying +/-10%
• Phase lock tuning or software algorithm
• Designed to meet ETL and SEMI F47 directives
• Forward or Delivered power mode regulation

Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications

Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The full- rack models operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Output power leveled on delivered power
• No preventative maintenance required, maximum generator uptime
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Fast auto-tune circuitry on full-rack models

Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications

Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 1000 provides 1000 watts of power. The half-rack supplies operate at any fixed frequency from 20 to 50 kHz. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Output power leveled on delivered power
• No preventative maintenance required, maximum generator uptime
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions

Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications

Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 500 provides 500 watts of power. The full- rack models operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Output power leveled on delivered power
• No preventative maintenance required, maximum generator uptime
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Fast auto-tune circuitry on full-rack models

Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications

Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 500 provides 500 watts of power. The half-rack supplies operate at any fixed frequency from 20 to 50 kHz. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Output power leveled on delivered power
• No preventative maintenance required, maximum generator uptime
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions

Stable, Reliable, Low Frequency Power for Industrial Heating and Plasma Processing Applications

Performance:
The CLF series generators provide stable process power up to 5 kW. The CLF 5000 provides 5000 watts of power. The full- rack models can operate at any fixed frequency from 20 to 450 kHz or auto-tuned up to +/- 15% bandwidth. In many applications, the combination of auto-tune and excess power headroom will allow delivery of power to changing reactive loads without the need for mechanically tuned matching networks.
Applications:
The CLF series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Output power leveled on delivered power
• No preventative maintenance required, maximum generator uptime
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Fast auto-tune circuitry on full-rack models
• CLF 5000 CE Marked and SEMI F47 compliant

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 1000 provides 1000 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Control circuitry ensures consistency during high VSWR conditions
• Unique power monitoring measures delivered power into any impedance load
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 10000 provides 10,000 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Control circuitry ensures consistency during high VSWR conditions
• Unique power monitoring measures delivered power into any impedance load
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 1250 provides 1250 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Control circuitry ensures consistency during high VSWR conditions
• Unique power monitoring measures delivered power into any impedance load
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 2500 provides 2500 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Control circuitry ensures consistency during high VSWR conditions
• Unique power monitoring measures delivered power into any impedance load
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 5000 provides 5000 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Control circuitry ensures consistency during high VSWR conditions
• Unique power monitoring measures delivered power into any impedance load
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CLX series low frequency RF power supplies are available in power ranges from 600 to 10,000 Watts with fixed frequencies from 20 kHz to 2 MHz, and frequency agile capability up to 10% bandwidth. The CLX 600 provides 600 watts of power. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CLX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Reliable amplifier design with millions of trouble-free hours driving plasma systems worldwide
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Control circuitry ensures consistency during high VSWR conditions
• Unique power monitoring measures delivered power into any impedance load
• Active front panel with full controls and programmable microprocessor

Solid, Reliable Engineering that Improves Process Results

Performance:
With millions of hours in the field, Comdel’s CPS series generators have proven their ability to withstand erratic loads. Patented S-Technology provides optimized amplifier performance for ultra-stable output by reducing power gain changes due to plasma impedance fluctuations. S-Technology helps eliminate headaches from transmission line length, mismatch conditions and process reliability issues.
Applications:
The CPS series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Solid state for long life and low maintenance
• Class “C” linear design assures stability
• ETL Marked and SEMI F47 compliant
• Control circuitry ensures consistency during high VSWR conditions
• Output transistors are beta-matched to assure reliability
• Broadband, low “Q” circuits inhibit “squeeging” and self-resonant oscillations

Solid, Reliable Engineering that Improves Process Results

Performance:
With millions of hours in the field, Comdel’s CPS series generators have proven their ability to withstand erratic loads. Patented S-Technology provides optimized amplifier performance for ultra-stable output by reducing power gain changes due to plasma impedance fluctuations. S-Technology helps eliminate headaches from transmission line length, mismatch conditions and process reliability issues.
Applications:
The CPS series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

• Solid state for long life and low maintenance
• Class “C” linear design assures stability
• ETL Marked and SEMI F47 compliant
• Control circuitry ensures consistency during high VSWR conditions
• Output transistors are beta-matched to assure reliability
• Broadband, low “Q” circuits inhibit “squeeging” and self-resonant oscillations

Performance:
Comdel CV series power supplies offer stable VHF power at frequencies from 30 to 80 MHz. The CV 1000 delivers 1000 watts of power. Configured within Comdel's standard control and monitoring package, the CV series offers exceptional ease of operation. RS-232 and analog controls are provided as standard; DeviceNet is optional. Synthesizer-driven, frequency agile configurations are also available on all CV series models.
Applications:
These VHF solid-state generators are ideal for use in VHF plasma systems, solar photovoltaic applications, CW and pulsed laser systems, and small geometry induction heating applications.

Features:

• Active front panel with full controls and programmable microprocessor
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Rugged class “B” FET amplifier
• Standard RS-232 and analog/digital control
• Pulse capable
• External frequency input

Performance:
Comdel CV series power supplies offer stable VHF power at frequencies from 30 to 80 MHz. The CV 2000 delivers 2000 watts of power. Configured within Comdel's standard control and monitoring package, the CV series offers exceptional ease of operation. RS-232 and analog controls are provided as standard; DeviceNet is optional. Synthesizer-driven, frequency agile configurations are also available on all CV series models.
Applications:
These VHF solid-state generators are ideal for use in VHF plasma systems, solar photovoltaic applications, CW and pulsed laser systems, and small geometry induction heating applications.

Features:

• Active front panel with full controls and programmable microprocessor
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Rugged class “B” FET amplifier
• Standard RS-232 and analog/digital control
• Pulse capable
• External frequency input

Performance:
Comdel CV series power supplies offer stable VHF power at frequencies from 30 to 80 MHz. The CV 4000 delivers 4000 watts of power. Configured within Comdel's standard control and monitoring package, the CV series offers exceptional ease of operation. RS-232 and analog controls are provided as standard; DeviceNet is optional. Synthesizer-driven, frequency agile configurations are also available on all CV series models.
Applications:
These VHF solid-state generators are ideal for use in VHF plasma systems, solar photovoltaic applications, CW and pulsed laser systems, and small geometry induction heating applications.

Features:

• Active front panel with full controls and programmable microprocessor
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Rugged class “B” FET amplifier
• Standard RS-232 and analog/digital control
• Pulse capable
• External frequency input

Performance:
Comdel CV series power supplies offer stable VHF power at frequencies from 30 to 80 MHz. The CV 500 delivers 500 watts of power. Configured within Comdel's standard control and monitoring package, the CV series offers exceptional ease of operation. RS-232 and analog controls are provided as standard; DeviceNet is optional. Synthesizer-driven, frequency agile configurations are also available on all CV series models.
Applications:
These VHF solid-state generators are ideal for use in VHF plasma systems, solar photovoltaic applications, CW and pulsed laser systems, and small geometry induction heating applications.

Features:

• Active front panel with full controls and programmable microprocessor
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Rugged class “B” FET amplifier
• Standard RS-232 and analog/digital control
• Pulse capable
• External frequency input

Performance:
Comdel CV series power supplies offer stable VHF power at frequencies from 30 to 80 MHz. The CV 8000 delivers 8000 watts of power. Configured within Comdel's standard control and monitoring package, the CV series offers exceptional ease of operation. RS-232 and analog controls are provided as standard; DeviceNet is optional. Synthesizer-driven, frequency agile configurations are also available on all CV series models.
Applications:
These VHF solid-state generators are ideal for use in VHF plasma systems, solar photovoltaic applications, CW and pulsed laser systems, and small geometry induction heating applications.

Features:

• Active front panel with full controls and programmable microprocessor
• Protection circuits safeguard amplifiers from over-voltage, over-current and over-power operating conditions
• Rugged class “B” FET amplifier
• Standard RS-232 and analog/digital control
• Pulse capable
• External frequency input

High Power Range of the CX Series Family of Products

Performance:
The CX high frequency series is available in power ranges of 5000 and 10,000 Watts with fixed frequencies from 2 to 30 MHz, and frequency agile capability up to 10% bandwidth. The CX series provides precise, repeatable power control with ultra-stable output. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Standard RS-232 and analog/digital control
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Standard fixed frequencies: 2 MHz,
  3.39 MHz, 13.56 MHz, 27.12 MHz
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Standard fixed frequencies: 2 MHz,
  3.39 MHz, 13.56 MHz, 27.12 MHz
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Standard fixed frequencies: 2 MHz,
  3.39 MHz, 13.56 MHz, 27.12 MHz
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control

High Power Range of the CX Series Family of Products

Performance:
The CX high frequency series is available in power ranges of 5000 and 10,000 Watts with fixed frequencies from 2 to 30 MHz, and frequency agile capability up to 10% bandwidth. The CX series provides precise, repeatable power control with ultra-stable output. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Standard RS-232 and analog/digital control
• Active front panel with full controls and programmable microprocessor

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Standard fixed frequencies: 2 MHz,
  3.39 MHz, 13.56 MHz, 27.12 MHz
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

• Standard fixed frequencies: 2 MHz,
  3.39 MHz, 13.56 MHz, 27.12 MHz
• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety and SEMI F47 compliant
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control

Performance:
Part of our customized product line, this reliable, unique RF power supply can function effectively in a very small space while still delivering robust, reliable power. Its footprint is 4” x 4” x 12” and it is can be pulsed between multiple levels to 100 kHz. Custom interfaces are available.
Applications:
This compact generator is designed to work inside an aircraft and supply RF power to lasers. It requires an input of 58amps at 48V DC. It is reliable at striking and delivering power into complex plasma loads.

Features:

• High VSWR and dissipation protection to ensure reliability
• Multi-setpoint pulse capability
• Pulse frequencies to 100 kHz

Options:

• Models available to 110 MHz
• Customized interfaces available

The CXV600S Virtual-Quad series RF generator is the ideal solution for applications requiring RF power to be delivered into one of four different locations. With four complete user interfaces, the Virtual-Quad appears as four separate RF generators to the system controller. This allows for significant cost savings for applications requiring multiple, non-simultaneous RF generation. Equipment space requirements are also greatly reduced, as the Virtual-Quad requires only 5.25"H x 19"W of rack area. Based on the CX600S, the Virtual-Quad provides robust and very stable RF power from Comdel's patented S Technology.

Features:

• Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
• ETL Marked for product safety
• Local control via encoder and softkey inputs
• Standard RS-232 and analog/digital control
• Active front panel with full controls and programmable microprocessor
• Control circuitry ensures consistency during high VSWR conditions

Reliable DC Power in a Compact, Lightweight Design

Performance:
The high-quality design of Comdel's XDC 1000 assures ultra reliability, while the small size fits easily into your system. What's more, with the XDC's flexible options and controls, you don't need to purchase a new power supply every time you make a change in your system. Current and voltage control capabilities are standard with each supply.
Applications:
Comdel's XDC is the ideal supply for reactive PVD sputtering, DC Bias and hard-coating applications.

Features:

• Compact, lightweight, 3 1/2" rack-mount DC generator
• Accurate output control by voltage or current
• Self-limiting circuitry that eliminates short-circuit failures
• Low stored energy that reduces arc damage
• Front Panel, continuously variable control of output voltage and current
• Calculated MTBF: 30,000 hrs. minimum