MICRO: Prod Tech News

Designed to repair photolithography mask defects at the 65-nm node, the Accura XT+ DualBeam mask-repair system combines a focused ion beam (FIB) column and an environmental scanning electron microscope (ESEM) in a single system. The tool can accommodate current photomasks and be extended to next-generation technologies, including low-energy E-beam proximity projection lithography/stencil, extreme ultraviolet reflective, nanoimprint, chromeless phase lithography, and absorber stack masks. The system contains the VisIONary FIB column, which provides a small spot size and accurate beam placement for both imaging and repair. Patented environmental SEM technology enables E-beam repair and high-resolution E-beam imaging. The system also features an optical microscope for mask navigation and global alignment. The Cal=Trak SL-500 primary standard gas-flow calibrator is a fast, mercury-free, and easy-to-use instrument that offers standardized accuracy of ±0.4% in a portable, low-maintenance unit. The instrument's dimensionally based primary accuracy is superior to pressure-based secondary methods. The field-rugged system is used in the manufacture, inspection, validation, and recalibration of mass-flow controllers, flowmeters, and many other varieties of flow equipment in the 5-std cm /min to 50 std L/min range. Its broad turndown ratio allows three interchangeable flow cells to cover this range, minimizing initial investment and maintenance costs. The unit's modular nature enables users to begin with one flow cell and add others as resources allow. The calibration device provides primary NIST traceability, is manufactured under strict ISO 17025 certification, and is CE approved. The single-wafer VIISta 810XE ion implanter