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Better Process Protection with Automated Gas Monitoring/ Purification

From Matheson Tri-Gas, Inc.
 

 
The presence of moisture, oxygen, and other impurities in a process gas stream is highly undesirable. These impurities decrease yields because they form haze and oxides in films, cause dislocation defects by reacting to form particles [1], and increase the corrosiveness of some gases [2, 3]. Impurities in process tools can be a result of poor gas quality, gas distribution leaks, virtual leaks (a trapped contaminant that outgases over time), inadequate purge procedures, and inadvertent system breaches. Process gas purification - whether at the source, in the gas manifold, or at the point of use - is a critical part of preventing impurities from reaching process tools [4]. A smart purifier with the capability to close gas line valves in the event of an impurity intrusion that would exceed a process specification or the purifier's recommended range of operation has been developed by Matheson Tri-Gas. Inputs for the control logic include changes in the purifier bed temperature as well as external signals from on-line analyzers that monitor the concentration of key impurities in the inlet gas stream.

Products & Services
Gas pressure regulators reduce the pressure of a gas, as it passes through a cylinder or process line, to another piece of equipment. Regulators are not flow control devices. They are used to control delivery pressure only. Search by Specification | Learn more about Gas Pressure Regulators
Gas cabinets and distribution systems consist of vaporizers, gas cabinets, gas manifolds, mass flow controllers, valves, pressure sensors and associated interconnect tubing configured to deliver bulk and specialty gases to process equipment. Search by Specification | Learn more about Gas Cabinets and Distribution Systems

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Topics of Interest
Point-of-use, high-performance gas purifier system designed to provide superior contaminant reduction and utilizes removable purifier cartridges to produce 99.9999% purity. The basic system consists... (Read More)
Trace levels of organic contaminants that can be present in process gases due to intrinsic impurities or component out gassing are potentially incorporated into semiconductor devices during film... (Read More)
Source gas and point-of-use (POU) purification of process gases is necessary to meet the stringent demands of the semiconductor industry. Gas purity levels are tested in the cylinder at the production... (Read More)
Ultra-high purity ammonia delivered to the point of use is critical for growth of gallium nitride semiconductors. Recent studies have demonstrated that the origin, properties, and fluctuations of... (Read More)
"Purification of CNTs generally refers to the separation of CNTs from other entities, such as carbon nanoparticles, amorphous carbon, residual catalyst, and other unwanted species. The classical... (Read More)
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