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LIGA, a German acronym for x-ray lithography (lithographie), electroplating (galvanoformung), and molding (abformung), is used to fabricate high aspect-ratio structures in micro-electromechanical systems (MEMS). LIGA combines photolithography, electroplating and molding process to obtain depth. Patterns are created in a substrate and then electroplated to create three-dimensional (3D) molds. These molds can be used as final products, or various materials can be cast or injected into them. LIGA is a type of high aspect ratio micromachining (HARM) that can be used with materials other than silicon (e.g., metal, plastic). There are three main types of LIGA processes: x-ray LIGA, UV LIGA, and silicon LIGA. The original LIGA technology, x-ray LIGA uses x-rays from a synchrotron. UV LIGA uses ultraviolet (UV) light, typically from a mercury lamp. Silicon LIGA uses deep reactive, ion-etched silicon. Products & Services
MEMS foundry services suppliers design and manufacture microelectromechanical devices on a contract basis, in prototype to production quantities.
MEMS processing equipment is used to create micro-electro-mechanical systems (MEMS) sensors and wafers.
X-ray diffraction instruments are used to measure crystal structure, grain size, texture and/or residual stress of materials and compounds through interaction of the X-ray beam with a sample.
Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules.
X-ray instruments and X-ray systems use penetrating X-rays or gamma radiation to capture images of the internal structure of a part or finished product.
Product Announcements
Topics of Interest
Solid-state or semiconductor X-ray diffraction detectors collect diffracted intensity from one angle at a time and are scanned through the angular range of interest. These detectors provide the energy...
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AP3 ultra-thin polymer windows are the highest performing x-ray windows available for low energy x-ray analysis. AP3 windows are ideal for applications that require high x-ray transmission of light...
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The resolution of Fresnel zone plate (FZP) as X-ray lens is determined by the width of outer-most zone, and the diameter of condenser lens is desirable to be large so that bright x-ray beam is...
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A breadboard setup constructed at MOXTEK, Inc., is capable of capturing both x-ray diffraction (XRD) and x-ray fluorescence (XRF) information simultaneously using a charge-coupled device (CCD) as the...
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As silicon LSI devices continue to be scaled down in sire, the patterning process of resists on Si wafers is becoming more critical. For Si LSI, a reliable lithographic technology is needed to define...
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