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Direct-Current Plasma (DCP)
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Direct-current plasma (DCP) is an excitation source for atomic emission and optical emission spectrometers. DCP is created by an electrical discharge between two electrodes. A plasma support gas is necessary, and argon (Ar) is common. Samples can be deposited on one of the electrodes, or - if conducting - can make up one electrode. Insulating solid samples are placed near the discharge so that ionized gas atoms sputter the sample into the gas phase, where the analyte atoms are excited. With direct-current plasma (DCP) this sputtering process is often referred to as glow-discharge excitation. Products & Services
Atomic emission and optical emission spectrometers determine analyte concentration via a quantitative measurement of the optical emission from excited atoms.
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Learn more about Atomic Emission and Optical Emission Spectrometers
Gas chromatography detectors (GC detectors) identify solutes as they exit the chromatographic column. A chromatogram is generated plotting the signal versus time.
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Learn more about GC Detectors
Plasma treatment equipment and corona treatment equipment generates and exposes organic or polymer substrates to ionized gas to improve wettability of adhesives, paints, inks or other coatings.
Learn more about Plasma and Corona Treatment Equipment
Plasma cutting machines and plasma welding machines melt an areas with an arc and then use a high-velocity, high-temperature ionized gas to make cuts and fuse materials.
Learn more about Plasma Cutting and Welding Machines
Thin film coating services apply very thin layers of specialized materials to part surfaces. They perform processes such chemical vapor deposition (CVD), physical vapor deposition (PVD), ion implantation, electrochemical deposition (ECD), plasma etching, rapid thermal processing (RTP), and titanium nitride coating.
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Learn more about Thin Film Coating Services
Product Announcements
Topics of Interest
Spark and arc excitation sources use a current pulse (spark) or a continuous electrical discharge (arc) between two electrodes to vaporize and excite analyte atoms. The electrodes are either metal or...
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Microwave-induced plasma consists of a quartz tube surrounded by a microwave wave guide or cavity. Microwaves produced from a magnetron (a microwave generator) fill the wave guide or cavity and cause...
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Inductively coupled plasma (ICP) is a very high temperature (7000° - 8000° K) excitation source that efficiently desolvates, vaporizes, excites, and ionizes atoms. Molecular interferences are greatly...
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I and M impounding reservoir, i. lake
I and M
Inspection and maintenance.
IAWQ
International Association of Water Quality, which is now included in the International Water Association...
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Masuhiro Kogoma
8.1 Introduction
Because a high quality process is possible, the surface modification and polymer deposition in low temperature plasma are very useful for the high technology...
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