Spectral Analysis System for Thin-Film Filters
Featured Product from Alluxa, Inc.
Introducing a Novel Spectral Analysis System for Measuring High-Performance Thin-Film Optical Filters
HELIX™ Spectral Analysis System accurately measures the highest-performance optical filters.
The HELIX Spectral Analysis System has redefined measurement capabilities of high performance thin-film optical filters. HELIX is an instrument designed and developed by Alluxa Engineering staff to address the limitations of most commercially available spectrophotometers. The system's capabilities are four-fold: it is able to track filter edges to OD7 (-70 dB), evaluate blocking to OD9 (-90 dB), resolve edges as steep as 0.4% relative to edge wavelength from 90% transmission to OD7, and resolve passbands that are as narrow as 0.1 nm at full width half maximum (FWHM)
An increased demand for high-performance optical filters with edge transitions steeper than 0.5% of edge wavelength from 90% transmission to OD6 (-60 dB), wide-range blocking beyond OD6, and ultra-narrow filters with sub-nanometer bandwidths has driven recent advancements in thin-film design and coating technologies. However, measuring the true spectral performance of these filters is particularly challenging due to the inherent limitations of standard spectrophotometers and other grating-based measurement systems. These limitations render the instrument incapable of resolving ultra-steep edges or very narrow passbands, resulting in measured transmission spectra that depict inaccurate bandwidths and rounded peaks of ultra-narrow filters, smeared and rounded edges, and noise floors that range between OD2 (-20 dB) and OD7. This can be frustrating for technologists who require measured data that demonstrates the true performance of optical filters prior to the qualification phase of system development. Also for coating manufacturers, who are tasked with making filters that meet the demanding requirements even though performance is virtually impossible to measure in most cases.
For this reason, many thin-film manufacturers have started utilizing tunable lasers, custom-built spectrophotometers, and other advanced methods to obtain more accurate measurements. Unfortunately, many of these solutions can be cost prohibitive, sensitive to misalignment, or have a limited wavelength range, and so are not ideal for use in a high-volume manufacturing scenario. Fortunately, Alluxa has developed the HELIX Spectral Analysis System, a custom solution that is capable of measuring blocking to OD9 (Figure 1), tracing edges to OD7, and accurately resolving both sub-nanometer passbands and edge transitions that are as steep as 0.4% of edge wavelength from 90% transmission to OD7.
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Our technology enables the routine production of optical filters with performance and price characteristics that were previously impossible. These informative white papers help our customers and partners maximize the advantage they gain by using our filters.
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Alluxa is an ISO 9001:2015 certified, ITAR registered manufacturer of high-performance optical filters and thin-film coatings. Alluxa has rapidly grown from a small startup to a world leader in precision thin films. Our engineering team has been instrumental in achieving this growth by refining our advanced SIRRUS™ Plasma Deposition process, designing and building our coating equipment, and dedicating a large amount of resources to research and development. Meanwhile, our leadership team has been reinvesting in the business and creating a progressive company culture that benefits both our customers and our people.
