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Aerosol Nanoparticle Monitoring to 10 nm: Using NanoAir10 to Tell the Full Story of Particle Contamination in Ultra Clean Environments

Semiconductor manufacturing uses smaller and smaller particles. Traditional monitoring is too slow. NanoAir uses a new real-time technology that can detect tiny particles (down to 10 nm) to improve production processes and to validate the cleanliness of gases used in chip making.

Date: June 6, 2024
Time: 11 AM EDT (8 AM PDT / 5:00 PM CEST)
Duration: 1 hour
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As the semiconductor manufacturing industry drives technological advancement, the critical particle size continues becoming smaller. It requires supporting solutions for contamination monitoring that keep up with these advances. Wafers pass through many process tools during manufacturing, rendering conventional metrology techniques too slow to react to real time events, thus requiring real-time monitoring at the wafer's surface (where it matters).

With improved technology, particle events down to 10 nm can be quickly and precisely detected, improving wafer handling and development techniques. Complete tool coverage can now be achieved using a single particle counter in combination with a multipoint manifold accessory specifically designed for nanoparticle transport. This technology can also be adapted to validate and control cleanliness of bulk gases being supplied in the industry.

Key Takeaways

  • Explore how to monitor inert bulk gases down to 10 nm
  • Learn the benefits of sampling down to 10 nm to see particle excursions that would have been missed with a standard 100 nm optical particle counter
  • Leverage real-time particle data to troubleshoot problems and improve overall tool cleanliness using the first ever SmartManifold for nanoparticle transport
  • Discover the new NanoAir10 condensation particle counter by Particle Measuring Systems, purpose built for ultra-low maintenance, revolutionary small form factor, and best zero count rate on the market at 10 nm with no false count subtraction


Benton Hutchinson, Product Line Manager, Particle Measuring Systems

Hutchinson’s role in the Electronics Division, covers the aerosol, compressed gas, and airborne molecular contamination (AMC) products at Particle Measuring Systems. Before that, he was an Applications Engineer focusing on the AMC and aerosol products globally. He serves as a subject matter expert for both AMC and aerosol particles, specializing in their handling and mitigation in cleanroom environments. Hutchinson holds a Bachelors and Masters degree in Chemical Engineering.

Lexi Lake, Applications Engineer, Particle Measuring Systems

Lake serves as subject matter expert for aerosol, gas, and AMC contamination control and monitoring. Prior to this, she was an Aerobiology Engineer working in Aerosol Science Research and Development validating the Aerobiology Testing Lab and designing new aerosol and microbial contamination monitoring products. Before joining Particle Measuring Systems, Lake designed and ran research experiments related to respiratory and airborne diseases and therapies. She holds a Master of Science in Microbiology and Bachelor of Science in Biology.