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  • Improving tungsten CVD performance with in situ particle monitoring
    cold-wall reactors and one loadlock chamber. Each chamber independently deposits a blanket tungsten film on the wafer and then etches the wafer backside to remove excess tungsten. Two isolated gas lines deliver reactants through the chamber lid, and a perforated pumping plate distributes
  • New FEA Tools For Engineering Analysts
    automatically generates an analysis report that can be printed or distributed by intranet or Internet. The report for Algor's software includes detailed model data, graphics and multimedia files, and userspecified information that can be transmitted to a client or supervisor through any web browser
  • Dielectric Materials for Use in Radomes
    between two capacitor plates and measuring the resulting capacitance. This is then compared to the capacitance of the same plates with air or a vacuum between them. The resulting ratio is the dielectric constant of the material. Loss Tangent. Another important aspect of the permittivity is the loss

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