-
Supplier: Precision Surfacing Solutions
Description: 4” - 12” Wafer Diameter Capacity. Process up to two (2) wafers simultaneously or choose insitu pad conditioning. Compact, space-efficient systems. True CMP processing without a CMP system price. Can be used on Semiconductor, Compound
- Applications / Materials Abraded: Plastics / Composites, Semiconductors / Electronics
- Automation: Automatic / Indexing, PLC
- Mounting: Floor Mounted / Stationary (Machine Tools)
- Spindle Orientation / Options: Vertical
-
Supplier: Precision Surfacing Solutions
Description: 4” - 12” Wafer Diameter Capacity. Process up to two (2) wafers simultaneously or choose insitu pad conditioning. Compact, space-efficient systems. True CMP processing without a CMP system price. Can be used on Semiconductor, Compound
- Applications / Materials Abraded: Plastics / Composites, Semiconductors / Electronics
- Automation: Automatic / Indexing, PLC
- Mounting: Floor Mounted / Stationary (Machine Tools)
- Spindle Orientation / Options: Vertical
-
Supplier: Trafag Inc.
Description: stability even in harsh environments. The most compact design and the proven high-performance electronics with CiA-certified, comprehensive CANopen-functionalit y makes the CMP 8270 best-in-class pressure transmitter. Applications Engine Manufacturing Railways Machine Tools
- Electrical Output: Analog Voltage, Other
- Media: Liquid, Gas
- Operating Temperature: -58 to 275 F
- Pressure Reading: Gauge
-
-
Supplier: VAST STOCK CO., LIMITED
Description: Hand Tools CMP-6T INSERTION MACHINE
-
Supplier: Sonel Test
Description: The Sonel CMP-3kR is an innovative AC current clamp meter which combines technically advanced solutions The handy digital AC clamps meter with a recorder is a professional tool for measuring AC current up to 3000 A. Unlike competitive instruments, the CMP-3kR is equipped
- Measurement Type: AC
-
Supplier: Sonel Test
Description: detect possible short circuits at a glance and thus prevent damage to machinery and equipment. It is a proven tool for monitoring the operation of machines used in industry, for example. In addition, the presented meter model is used, among other things, for checking control loops as
- Display: Digital Meter, Other
- Testing Method: Manual
Find Suppliers by Category Top
Conduct Research Top
-
EETimes.com | Electronics Industry News for EEs & Engineering Managers
Magma panelists explore whether DFM is the real deal After much bravado, EDA vendors like Magma Design Automation and Mentor Graphics are starting to deliver viable "DFM " tools or DFM-savvy tools. But will they be able to shield IC designers from having to deal with problems that occur
More Information Top
Indicates content that may require registration and/or purchase.
-
Chemical-mechanical planarization
CMP machine tools can b e operated and maintained by typical line personnel.
-
http://dspace.mit.edu/bitstream/handle/1721.1/89285/46310295-MIT.pdf?sequence=2
As a predecessor of a production CMP tool , this machine must take into account .
-
http://dspace.mit.edu/bitstream/handle/1721.1/29907/51550156-MIT.pdf?sequence=2
The term CMP tool refers to the machine used for the CMP process.
-
http://dspace.mit.edu/bitstream/handle/1721.1/45403/317411253-MIT.pdf?sequence=2
The CMP tool refers to the machine used for the CMP process.
-
The Nanomanufacturing Programme at the National
Science Foundation
Examples of such interface directions include machining with nanocoated tools and CMP with nanoparticles; forming of ductile ceramics made of nanocrystals; moulding of nanocomposite rubbers and reinforced polymers; composing of nanostructured magnets, paint, inks etc; sintering of filters and catalysts for chemical …
-
From Semicon West: Photoacoustic Techniques Make Waves in Integrated Metrology
According to George Collins, Rudolph's director of marketing, the new integrated MetaPULSE unit, tradenamed i-MP, is compact enough to be bolted onto a production tool such as a CMP or electroplating machine .
-
Process Performance Prediction for Chemical Mechanical Planarization (CMP) by Integration of Nonlinear Bayesian Analysis and Statistical Modeling
[17] U. Phatak, S. Bukkapatnam, Z. Kong, N. Chandrasekaran, S. Varghese, and R. Komanduri, “Sensor based modeling of slurry chemistry effects on MRR in copper CMP ,” Int. J. Machine Tools Manufacture, vol.
-
http://dspace.mit.edu/bitstream/handle/1721.1/16792/50172257-MIT.pdf?sequence=2
For our CMP tools , the differential force settings on the machine are .
-
Effect of pad’s surface deformation and oscillation on monocrystalline silicon wafer surface quality
Shin, Y. J., Lee, E. S., and Kang, J. H., “Identification of the Mechanical Aspects of Material Removal Mechanisms in CMP ,” Journal of the Korean Society of Machine Tool Engineers, Vol. 9, No. 5, pp. 7-12, 2000.
-
Advances in Abrasive Technology XV
Mechanisms in CMP ", Journal of the Korean society of machine tool engineering 2000;10 .