In-situ / System Mounted Ion Milling Systems

IG20 5 KeV Argon or Oxygen Ion Source for UHV Surface Analysis -- IG20
from Hiden Analytical

Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling [See More]

  • Mounting / Loading: In-process, in-situ or system mounted
  • Measurements: Defects, dimples or film residues; Area mapping (optional feature); DepthProfiling
  • Applications: Wafer; CVD / PVD
IG5C 5KeV Caesium Ion Source for UHV Surface Analysis -- IG5C
from Hiden Analytical

Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package. [See More]

  • Mounting / Loading: In-process, in-situ or system mounted
  • Measurements: Defects, dimples or film residues; Area mapping (optional feature); DepthProfiling
  • Applications: Wafer; CVD / PVD