Products/Services for Sputtering Matchbox
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Impedance Matching Networks - (25 companies)Impedance matching networks are electrical circuits which, when connected between two networks, match the output impedance of the source (the first network) to the input impedance of the load (the receiving or second network). The purpose of matching these two impedances is to minimize wave reflection and/or to maximize the transfer of power between the system and the load.Modes of OperationCoolingInput Voltage -
Boxes and Crates - (271 companies)Boxes and crates are rigid, typically square or rectangular containers that may include a cover. They are used for all types of handling and storage applications.
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Magnetrons - (21 companies)Magnetrons are high-powered vacuum tubes used to generate microwave signals. Products include cavity magnetrons and sputtering magnetrons. Magnetrons are high-powered vacuum tubes used to generate microwave signals. There are many types of products... -
Thin Film Materials - (209 companies)Thin film materials are high purity materials and chemicals such as precursor gases, sputtering targets, or evaporation filaments used to form or modify thin film deposits and substrates. How to Select Thin Film Materials. What Are Thin Film... -
Plasma Power Supplies - (73 companies)Plasma power supplies are DC and RF devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating. Applications. Plasma power... -
Thin Film Sources - (72 companies)...on a pre-existing surface. Magnetrons are a self-excited oscillator used as a radar transmitter tube. Magnetron sputtering is the most widely used process for vacuum thin film deposition. A magnetron tube is most commonly used in microwave ovens. A thin film...
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Thin Film Equipment - (311 companies)...vacuum deposition systems designed for low-volume experimental or analytical applications. Sputter coaters for SEM or TEM preparation would fall into this category. Features. There are several technology choices available for thin film equipment...
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IC Interconnect Components - (527 companies)IC interconnect components interface or connect a microelectronic semiconductor chip to a board or larger scale device.
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Thin Film Coating Services - (221 companies)...with an energy source then forms a thin film coating. Physical vapor deposition (PVD) also uses an energy source, but for glow discharge processes such as evaporation and sputtering. With PVD, coating materials are condensed and deposited onto a surface...
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RF Generators - (92 companies)RF generators and high frequency power supplies provide the power required for plasma generation, induction heating, and radar or communications applications.
Product News
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Holykell Technology Company Limited
Sputter Thin Film Pressure Sensor for Hydraulics Thin film hydraulic pressure sensor sputtered thin film pressure transducer unit offers an unbeatable price/performance ratio in a small package size. It features all-stainless steel wetted parts, and hermetically sealed enclosures without O-rings. Advantages. Compared to traditional pressure sensors, sputtered thin film sensors offer significant advantages in hydraulic monitoring systems. Firstly, they utilize advanced sputtered thin film technology, resulting in higher repeatability... (read more)Browse Pressure Sensors Datasheets for Holykell Technology Company Limited -
Agilent Technologies - Vacuum Products
New FRG-705/707 Full Range Gauge See the latest addition to the Agilent active gauges family - the new FRG-705/707: full-range Pirani inverted magnetron gauges. These gauges combine Pirani and inverted magnetron technologies to deliver accurate measurement from atmosphere down to 7.6 x 10-10 Torr, all in a single, ultra-compact design. With an ultralow magnetic stray field, dual ionization chamber for longer life, and no filament to burn out, they are ideal for high-vacuum pressure monitoring, evaporation and sputtering... (read more) -
3X Ceramic Parts Company Limited
Silicon Carbide ICP Etching Disk Silicon carbide carrier disk, silicon carbide etching disk, ICP etching disk. Silicon carbide tray for LED etching (SiC tray) 600mm is a special accessory for deep silicon etching (ICP etching machine). Wafer carrier, also known as wafer carrier and silicon wafer carrier, is called pocket wafer in English. It is widely used in CVD and vacuum sputtering of semiconductors. We can provide customers with customized wafer carriers of silicon and silicon carbide materials to meet customers' different... (read more)Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for 3X Ceramic Parts Company Limited -
FX PCB Co., Ltd.
Thick Film Ceramic PCB Thick film is the thickness of the conductor layer of the Ceramic PCB. Generally speaking, the thickness should be over 10um(micrometers) at least, ranging between 10- 13um. It is thicker than the sputtering technology used in thin film ceramic PCB, but the thickness is still thinner than DBC ceramic PCB or FR4 boards. Using the thick film technology, Ceramic PCBs are manufactured through printing and a high-temperature sintering process, which can allow the resistor, capacitor, conductor... (read more)Browse Printed Circuit Substrate Materials (PCB / PWB) Datasheets for FX PCB Co., Ltd. -
Cryo H&I Co.,Ltd.
Cryopump Applications. Semiconductors & Displays: Sputtering, Ion Implantation, OLED/LCD. Precision Coating: Optical and thin-film deposition. Space Simulation: Aerospace testing and advanced R &D. Contact Us. Website: www.cryohi.com. Email: cryohi@cryohi.com... (read more)Browse Cryogenic Pumps Datasheets for Cryo H&I Co.,Ltd. -
Xiamen Unipretec Ceramic Technology Co., Ltd.
Ceramic Substrate electronics applications. 99.6% Alumina Substrate. The standard for thin-film substrates is 99.6% alumina, which is frequently utilized for sputtering, evaporation, and chemical vapor deposition of metals to create circuits. The material is smoother and has fewer surface flaws thanks to the high purity of 99.6% alumina and the smaller grain size, resulting in a surface roughness of Ra0.1-0.3um. 99.6% alumina provides excellent electrical insulation, low thermal conductivity, great mechanical... (read more)Browse Industrial Ceramic Materials Datasheets for Xiamen Unipretec Ceramic Technology Co., Ltd. -
JEOL USA, Inc.
Revolutionize TEM Specimens from Frozen Samples The CRYO-FIB-SEM system incorporates a liquid nitrogen cooling stage and a cryocooled specimen transfer mechanism for frozen specimens, making it possible to prepare TEM specimens such as biopolymers. The specimen transfer mechanism has a built-in sputter coating function. Therefore, this CRYO-FIB-SEM system alone can perform a series of processes to create TEM specimens from frozen specimens including conductivity coating, protective film forming, and FIB processing. In addition, by using... (read more)Browse Electron Microscopes Datasheets for JEOL USA, Inc. -
MPF Products, INC.
E-Beam/Crystal Sensor Feedthroughs for your Thermal Evaporation process, or you can choose from a variety of multipins for your Electron Beam Guns or Magnetron Sputtering applications. We also offer standard coaxial feedthroughs that support the needed signal information for your Crystal Sensor Holders and Crystal Sensing Devices to ensure your coating thicknesses are being deposited correctly. We understand your equipment has to be optimized to handle deposition of metal and dielectrics on optical media, architectural glass. medical... (read more)Browse Feedthroughs Datasheets for MPF Products, INC. -
Shenzhen Great Precision Ceramic CO., LTD.
Aluminum Nitride Sheet: High Thermal Conductivity direct copper plating method), thin film sputtering method, DBC (direct copper plating method), AMB (active copper brazing method), thick film printing, etc.;. The minimum thickness can reach 0.1 mm. Specification... (read more)Browse Industrial Ceramic Materials Datasheets for Shenzhen Great Precision Ceramic CO., LTD. -
Zygo Corporation
Glass & Ceramic Machining machined components may be left uncoated, or we can apply precision optical coatings to enhance the transmission or reflection of light at the surface of an optic, or improve wear resistance. Coatings are created with a variety of materials (including oxides, metals, nitride, and rare earth materials) deposited on the optical surface in our in-house coating facility, using specialized methods (electron beam, sputtering, etc.) and state-of-the-art equipment. The exact combination of material... (read more)
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A new hybrid method for H2S-sensitive devices using WO3-based film and ACF interconnect
… the same apparatus as used before [20, 21], the WO3 film application was carried out under 50% O2 in argon at a total pressure of 70 mTorr in a magnetron sputtering source (A-320 AJA … … F Hutinger) with a matchbox (PFM- 750).
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Long-term aging of Ag/a-C:H:O nanocomposite coatings in air and in aqueous environment
The Ag sputtering target (intrinsic purity of 99.9 vol%) was connected to an RF power generator (13.56 MHz, Cesar 133, Advanced Energy, USA) through a matchbox .
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Thin-film cadmium telluride photovoltaic cells. Final subcontract report, 1 November 1992--1 January 1994
matchbox . During the sputter deposition, the rf matching network is adjusted for a reflected power of less than …
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High-efficiency thin-film cadmium telluride photovoltaic cells. Annual subcontract report, January 20, 1995--January 19, 1996
In the process, we replaced in the original matchbox an inductanceelementwhich was quite lossy. … done using the old matching network, we measured the power coupled into the sputtering guns with old …
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Applications of ZnO in Cu(In,Ga)Se2 solar cells
The high cost of RF-generators and matchboxes and wavelength interferences at large cathodes motivate for alternatives. The way for scalable high deposition rate processes is sputtering at mid frequencies (MF) or with DC.
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Dual frequency capacitive plasmas in Fe and Ni sputter applications: correlation of discharge properties on thin film properties
The voltages were measured at the matchbox output positions using a standard calibrated voltage–current probe VI-Probe … … below 70 VRMS, so as to prevent damage to the RFEA due to sputter erosion of the …
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Integration of a carbon nanotube based electrode in silicon microtechnology to fabricate
electrochemical transducers
A pure graphite target (99.995%, 5 cm in diameter) was sputtered in pure argon at 0 … The RF electrical power applied to the magnetron source through a matchbox was 150 W.
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Investigating antennas as ignition aid for automotive HID lamps
… of the upper side of the substrate holder and a photograph of a sputtered Ti antenna on … A matchbox between generator and plasma ensures impedance matching to transfer as much power as possible from …
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Formation of crystalline γ-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering
… power the electrode with a sinusoidal signal of 71 MHz, matched by a matchbox from Aurion (see … … 56 MHz adjust the bias potential at the target and thereby the energy of the sputtering ions. .
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Comparison of ion energies and fluxes at the substrate during magnetron sputtering of ZnO : Al for dc and rf discharges
For the studies a 2-in. planar circular magnetron sputter source (Thin Film Consulting) was equipped with … … 56 MHz (Dressler, Caesar 136) or 27.12 MHz (Dressler, Caesar 276) with an appropriate automatic matchbox .
