Drift Velocity Limitation in GaN HEMT Channels
ARVYDAS MATULIONIS [1]
Semiconductor Physics Institute, A. Go tauto 11, Vilnius 01108 Lithuania
Overview
Additional friction due to Pauli constraint, channel self-heating, alloy scattering, and hot phonons is reconsidered.
Keywords: Two-dimensional channels, GaN, AlGaN, drift velocity; hot electrons; hot phonons.
[1]matulionis@pfi.lt
1. Introduction
An undoped GaN high-electron-mobility transistor (HEMT) with a two-dimensional electron gas (2DEG) channel is a promising high-power active device 1. Transistor unity-gain cut-off frequency exceeds 150 GHz for short-gate devices2 ,3. A linear dependence of the inverse cut-off frequency on the gate length yields an effective electron drift velocity. The extracted velocity ranges from 1 10 7 cm/s to 1.75 10 7 cm/s 1 ,2 ,3 ,4 ,5. The drift velocity decreases as the electron density increases5. Several times higher values follow from time-of-flight experiments on GaN p-i-n diodes6. Thus, drifting electrons suffer additional friction in biased HEMT channels. The following effects can be of importance at a high electron density: (i) 2DEG degeneracy, (ii) channel self-heating at a high density of current and a high bias, (iii) alloy scattering caused by an overlap of electron envelope function with that of random alloy potential, (iv) accumulation of non-equilibrium optical phonons (termed hot phonons). Our goal is to discuss recent advances in understanding of electron drift velocity limitation in nominally undoped 2DEG channels for high-power GaN HEMTs.
2. Pauli Constraint
Scattering events into occupied states are forbidden in a degenerate 2DEG channel. As a result, the electron drift velocity tends to increase.