Specification Guides
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Vacuum equipment is used for degassing, welding, and the manufacturing of thin films, semiconductors, optics and specialty materials.
Ion beam guns and electron beam guns produce beams of electrons, ions or other particles for use in chemical and surface analysis, particle physics, resin curing or semiconductor manufacturing.
Equipment utilized to deposit thin films or modify the composition of a surface; e.g., through ion implantation or a nitriding or carburizing diffusion process.
Vacuum cleaners are capable of picking up large quantities of material and/or liquids. They can be portable devices or part of a central vacuum system.
Vacuum gauges are devices for measuring vacuum or sub-atmospheric pressures.
Vacuum pumps provide sub-atmospheric pressure for a variety of industrial and scientific applications where a vacuum is required.
Vacuum sensors are devices for measuring vacuum or sub-atmospheric pressures.
Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.