Kayaku Advanced Materials’ Design Fabrication Services provides semiconductor, MEMS, and microelectronics engineers with in-house wafer processing, photolithography, thin-film processing, inspection, metrology, reliability testing, and material characterization capabilities to support process development and device fabrication. (read more)

Low Dk/Df Photo-dielectric (read more)

Low Stress Dielectric Photoresist (read more)

Negative-tone Temporary Resist (read more)

Positive-tone temporary photoresist. (read more)

UniLOR N is a negative tone, chemically amplified co polymer resist designed for single and bi-layer lift off processes. (read more)

PMMA (polymethyl methacrylate) is a highly versatile polymer resist widely used in both imaging and non‑imaging microelectronic applications. (read more)

PMGI and LOR resists are advanced underlayer materials engineered for high-yield metal lift-off processing in demanding microfabrication applications. (read more)

PermiNex^® 1000 and 2000 are epoxy‑based, photo‑imageable bonding resists engineered for high‑precision adhesive layers in advanced device packaging. (read more)

KMPR^® 1000 is a high‑contrast, epoxy‑based i‑line photoresist designed for easy processing and reliable patterning. (read more)

The SU‑8 XFT series is a high‑contrast, epoxy‑based photoresist engineered for micromachining and advanced microelectronic applications requiring ultra‑thick, chemically and thermally stable structures. (read more)

• SU‑8 TF 6000 is a high‑contrast, chemically amplified, negative‑tone epoxy photoresist designed for high‑resolution, thin, permanent microstructures.

SU-8 3000CF Dry Film Resist (DFR) Series is a negative-tone, permanent epoxy dry film designed for fabricating chemically and thermally stable microstructures. (read more)

SU‑8 3000 is a high‑contrast, epoxy‑based photoresist engineered for micromachining and advanced microelectronic fabrication. (read more)

SU‑8 is a high‑performance, epoxy‑based photoresist engineered for advanced micromachining and microelectronic fabrication. Designed for applications requiring thick, chemically robust, and thermally stable structures, SU‑8 delivers exceptional image quality and durability. (read more)