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Supplier: Evident Scientific
Description: The AL120 wafer handler series transfers both silicon and compound semiconductor wafers from the cassette to the microscope stage with enhanced capabilities and flexibility, while maintaining an ergonomic design. Accommodates Multiple Wafer Sizes The ability to accommodate
- Application: Semiconductor Inspection
- Digital Display: Yes
- Eyepiece Style: Binocular
- Grade: Benchtop
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Supplier: Edmund Optics Inc.
Description: for the NUV-Visible, DUV Enhanced Aluminum for the DUV-NUV and Gold for the IR. Free from the problems of chromatic aberration and material absorption associated with standard microscope objectives, these components are ideal for applications requiring high throughput and
- Field of View: 1.2 mm
- Lens Type: Objective Lens
- Magnification: 15 X
- Numerical Aperture: 0.2800 NA
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Supplier: Edmund Optics Inc.
Description: for the NUV-Visible, DUV Enhanced Aluminum for the DUV-NUV and Gold for the IR. Free from the problems of chromatic aberration and material absorption associated with standard microscope objectives, these components are ideal for applications requiring high throughput and
- Field of View: 1.2 mm
- Lens Type: Objective Lens
- Magnification: 15 X
- Numerical Aperture: 0.5000 NA
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Supplier: Edmund Optics Inc.
Description: with standard microscope objectives, these components are ideal for applications requiring high throughput and excellent resolution in the UV or IR, including FTIR spectroscopy, ellipsometry, photolithography, and semiconductor inspection.The objectives feature an infinite conjugate design
- Lens Type: Objective Lens
- Magnification: 15 X
- Numerical Aperture: 0.2800 NA
- Working Distance: 23.75 mm
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Supplier: Edmund Optics Inc.
Description: with standard microscope objectives, these components are ideal for applications requiring high throughput and excellent resolution in the UV or IR, including FTIR spectroscopy, ellipsometry, photolithography, and semiconductor inspection.The objectives feature an infinite conjugate design
- Lens Type: Objective Lens
- Magnification: 15 X
- Numerical Aperture: 0.2800 NA
- Working Distance: 23.75 mm
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Description: different conditions of use such as light sources intended solely for decontamination of air and surfaces, UV lights for dermatological diagnosis, slit lamps for ophthalmology, lights for surgical microscopes and lights for surgical navigation systems; – lights connected to surgical
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challenging; but if you need those optics coated, many vendors do not have chambers that can handle large optics. ZYGO is a fully-integrated optics provider, offering thin film coatings capability with chambers as large as 72”. The company’s coating capability ranges from the DUV 248nm (read more)
Browse Optical and Light Microscopes Datasheets for Zygo Corporation -
applications, the lenses offer customizable anti-reflection coatings and support a broad wavelength range from DUV to IR. Engineers benefit from precise alignment, superior clarity, and reliable performance, making these lenses ideal for imaging (read more)
Browse Aspheric Lenses Datasheets for CASTECH, Inc.
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Far- and Deep-Ultraviolet Spectroscopy
UV-DUV plasmonics will be an important future theme of photonics, as exemplified by DUV microscopes , lithography, sterilization, photocatalysis, and bio-sensing and analysis [88] (Chap. 8).
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A 193nm microscope for CD metrology for the 32nm node and beyond
A deep UV ( DUV ) microscope equipped with a 193 nm laser source and a high numerical aperture objective (0.9 NA) is currently developed at the Physikalisch-Technische Bundesanstalt (PTB).
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ZEDFA0303P01
Fig. 1 shows the resolving power of the DUV microscope on a 0.18 µm polysilicon gate.
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Femtopulse laser-based mask repair in the DUV wavelength regime
The optics for both the DUV microscope and laser are mechanically fixed on a vibration-damped platform.
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A 193nm optical CD metrology tool for the 32nm node
Keywords: CD metrology, line width, optical microscopy, DUV 193 nm, DUV microscope , 32 nm node, 45 nm node .
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Optical microscopy at sub-0.1-&mgr;m resolution for semiconductor applications
DUV microscopes operating at 248 nm wavelength already offer a feature size resolution down to 0.08 tm.
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Denaturing of single electrospun fibrinogen fibers studied by deep ultraviolet fluorescence microscopy
In this study, we constructed a DUV microscope on an inverted optical microscope equipped with a three-axis nanomanipulator.
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Characteristics of CD measurement equipment
As our results, CD result of dUV microscope is most suitable for 0.13 and 0.15 um lithography.
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CCD Image Sensors in Deep-Ultraviolet
31 3.2.5 DUV Microscope . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
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ZEDFA0201P10
As a result. the first DUV microscopes operating at 248 nm ha\e bccn launched to market It's quite a different challenge to design a DUV microscope and its optics compared to VIS microscopes.