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Supplier: Evident Scientific
Description: wafer inspection microscopes that provide exceptional image resolution and clarity through a wide range of observation methods including brightfield, darkfield, differential interference contrast (DIC), near-IR (near-infrared) and DUV (deep ultraviolet). The motorized objective turret
- Grade: Benchtop
- Eyepiece Style: Binocular
- Microscope Type: Compound
- Features: Digital Display, Mechanical Stage
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Supplier: Edmund Optics Inc.
Description: glass correction through the means of a moving collar (centration of mirrors should be checked and adjusted if tube length is changed).Each objective is available with any of three coating options: Aluminum with a magnesium fluoride overcoat for the NUV-Visible, DUV Enhanced Aluminum for the
- Magnification: 15 X
- Numerical Aperture: 0.28 NA
- Working Distance: 24.5 mm
- Field of View: 1.2000000000000002 mm
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Supplier: Edmund Optics Inc.
Description: glass correction through the means of a moving collar (centration of mirrors should be checked and adjusted if tube length is changed).Each objective is available with any of three coating options: Aluminum with a magnesium fluoride overcoat for the NUV-Visible, DUV Enhanced Aluminum for the
- Magnification: 15 X
- Numerical Aperture: 0.5 NA
- Working Distance: 23.2 mm
- Field of View: 1.2000000000000002 mm
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Supplier: Edmund Optics Inc.
Description: a broad spectral range. The Schwarzschild-style objective exhibits near-diffraction limited performance over the full reflecting range of the chosen coating. By eliminating the problems of chromatic aberration and material absorption associated with standard microscope objectives, these
- Magnification: 15 X
- Numerical Aperture: 0.28 NA
- Working Distance: 23.75 mm
- Lens Type: Objective Lens
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Supplier: Edmund Optics Inc.
Description: a broad spectral range. The Schwarzschild-style objective exhibits near-diffraction limited performance over the full reflecting range of the chosen coating. By eliminating the problems of chromatic aberration and material absorption associated with standard microscope objectives, these
- Magnification: 15 X
- Numerical Aperture: 0.28 NA
- Working Distance: 23.75 mm
- Lens Type: Objective Lens
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Description: decontamination of air and surfaces, UV lights for dermatological diagnosis, slit lamps for ophthalmology, lights for surgical microscopes and lights for surgical navigation systems; – lights connected to surgical instruments, such as luminous retractors; – luminaires for emergency lighting,
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applications, the lenses offer customizable anti-reflection coatings and support a broad wavelength range from DUV to IR. Engineers benefit from precise alignment, superior clarity, and reliable performance, making these lenses ideal for imaging (read more)
Browse Aspheric Lenses Datasheets for CASTECH, Inc.
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Far- and Deep-Ultraviolet Spectroscopy
UV-DUV plasmonics will be an important future theme of photonics, as exemplified by DUV microscopes , lithography, sterilization, photocatalysis, and bio-sensing and analysis [88] (Chap. 8).
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A 193nm microscope for CD metrology for the 32nm node and beyond
A deep UV ( DUV ) microscope equipped with a 193 nm laser source and a high numerical aperture objective (0.9 NA) is currently developed at the Physikalisch-Technische Bundesanstalt (PTB).
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ZEDFA0303P01
Fig. 1 shows the resolving power of the DUV microscope on a 0.18 µm polysilicon gate.
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Femtopulse laser-based mask repair in the DUV wavelength regime
The optics for both the DUV microscope and laser are mechanically fixed on a vibration-damped platform.
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A 193nm optical CD metrology tool for the 32nm node
Keywords: CD metrology, line width, optical microscopy, DUV 193 nm, DUV microscope , 32 nm node, 45 nm node .
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Optical microscopy at sub-0.1-&mgr;m resolution for semiconductor applications
DUV microscopes operating at 248 nm wavelength already offer a feature size resolution down to 0.08 tm.
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Denaturing of single electrospun fibrinogen fibers studied by deep ultraviolet fluorescence microscopy
In this study, we constructed a DUV microscope on an inverted optical microscope equipped with a three-axis nanomanipulator.
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Characteristics of CD measurement equipment
As our results, CD result of dUV microscope is most suitable for 0.13 and 0.15 um lithography.
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CCD Image Sensors in Deep-Ultraviolet
31 3.2.5 DUV Microscope . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
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ZEDFA0201P10
As a result. the first DUV microscopes operating at 248 nm ha\e bccn launched to market It's quite a different challenge to design a DUV microscope and its optics compared to VIS microscopes.