Materials Science in Microelectronics: The Relationships Between Thin Film Processing and Structure, Volume 1, Second Edition

We have not endeavored to provide an encyclopedic review of epitaxy in this chapter. Indeed, we have not discussed other modes of epitaxy, such as solid phase epitaxy. Further, we have not discussed the effect of hyperthermal beams during deposition on the production of an epitaxial film. A discussion of both these topics is deferred until Chapter VII. However, we have attempted to discuss the significant aspects of epitaxy produced by deposition from the vapor phase that are of interest to the materials scientist and, in particular, the resulting defect structure. Further, we have attempted to describe the factors that affect the production of epitaxy when there is large misfit between epilayer and substrate. Since this is a science in development undoubtedly there will be future discoveries that will answer many of the questions that arise in the present chapter.