Compound Semiconductor Bulk Materials and Characterizations

Chapter 11: InAs

11.1 INTRODUCTION

InAs is a narrow bandgap semiconductor and is useful in very high speed electronic devices. It is also used as a substrate for infrared detectors and Hall devices and used assource material for multinary compound epitaxial growth.1

11.2 PHYSICAL PROPERTIES

The physical properties of InAs2 , 3 are summarized in Table 11.1. The melting point of InAs is 943 C, rather low compared with other III-V materials. The bandgap is as low as 0.356 eV and electron mobility is as high as 33,000 cm 2/V.sec so that it can be expected to be a good material for long wavelength photodetectors and high speed electronic devices. The phase diagram of InAs is as shown in Fig. 11.1.4 , 5 The decomposition pressure of InAs is as low as 0.33 atm. at the melting point.6 The thermoelectrical properties of InAs have been evaluated and found to be 210 310 ?V/K.7

Table 11.1: Physical Properties of InAs

Crystal Structure

zincblende

Lattice Constant

6.058

Density

5.667 g/ cm 3

Melting Point

943 C

Linear Expansion Coefficient

5.19 10 -6/ deg

Thermal Conductivity

0.26 W/cm K

Dielectric Constant

14.55

Refractive index

3.52

Bandgap at Room Temperature

0.356 eV

Intrinsic Carrier Concentration

1.25 10 15/ cm 3

Electron Mobility

33,000 cm 2/V sec

Hole Mobility

460 cm 2/V sec

Conductivity

0.2 ? cm


Figure 11.1: Phase diagram of InAs (from Ref. 4 with permission).

11.3 CRYSTAL GROWTH

11.3.1 Melt Growth

InAs is industrially grown by the Liquid Encapsulated...

UNLIMITED FREE
ACCESS
TO THE WORLD'S BEST IDEAS

SUBMIT
Already a GlobalSpec user? Log in.

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.

Customize Your GlobalSpec Experience

Category: Sapphire Materials and Components
Finish!
Privacy Policy

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.