TABLE OF CONTENTS Fabricating smaller and smaller surface nanostructures is one of the important research directions in the nanomaterial field for their superior physical and chemical properties. Their preparation methods continue to increase. For example, traditional lithography techniques, including photolithography,1 , 2 X-ray lithography3 , 4 electronic beam lithography5 AFM lithography, 6 , 7 and STM lithography,8 usually have complex manipulation, high cost and low yield etc. Therefore, it is necessary to look for new methods, which can overcome the above-mentioned disadvantages. This is an important measure for promoting the production of nanomaterials on a large scale, and application of nanomaterials and nanodevices fabrication. The two-dimensional colloidal crystal method is one of the new methods.
The colloidal crystal is a special dispersed system with the particle diameters ranging from 50 nm to 100 m. Generally, we name the dispersed particles the "colloidal particles". They represent random thermal movement in the liquid medium. The feature of these colloid particles is the uniformity of the size, shape, composition and surface properties of the particles. In the preparation process, under the drive of the minimum free energy of particle interfaces, during the nucleation and growth process these amorphous particles tend often towards forming the sphere shape. Now, commonly used monodispersive colloidal particles are prepared by the inorganic oxide deposition method9 and the emulsion polymer method.10 , 11 For example, the monodispersive SiO 2 colloidal spheres can be prepared by the hydrolysis of Si(OC 2H 5) 4
