Products/Services for Plasma Etch Matchbox
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Impedance Matching Networks - (23 companies)Impedance matching networks are electrical circuits which, when connected between two networks, match the output impedance of the source (the first network) to the input impedance of the load (the receiving or second network). The purpose of matching these two impedances is to minimize wave reflection and/or to maximize the transfer of power between the system and the load.Modes of OperationCoolingInput Voltage -
Etchers and Etching Machines - (64 companies)...machines include a wide range of equipment to provide a variety of services, including metal etching, glass etching, and stone etching; wet, plasma, and ion etching; polymer etching; and electropolishing. Etchers and etching machines use a combination...
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Plasma Generators - (12 companies)Etching of surfaces to create a systematically structured surface area by creating a phase change in the etched material and removing it. Plasma coating to protect surfaces or change their properties such as making a hydrophobic material wettable...
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Plasma Welding Equipment - (165 companies)Plasma welding equipment melt areas with an arc and then use a high-velocity, high-temperature ionized gas to make welds. Plasma welding machines melt areas with an arc and then use a high-velocity, high-temperature ionized gas to make welds... -
Plasma Cutting Equipment - (143 companies)Plasma cutting machines use a high-velocity, high-temperature ionized gas to make cuts in materials and parts. Plasma cutting machines cut materials and metals using a stream of high-velocity ionized gas, known as plasma, as a heat source...
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Plasma Power Supplies - (74 companies)Plasma power supplies are DC and RF devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating. Applications. Plasma power...
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Corona Treaters and Plasma Cleaners - (81 companies)Corona treaters and plasma cleaners generate and expose organic or polymer substrates to ionized gas to improve wettability of adhesives, paints, inks or other coatings. Corona treaters and plasma cleaners generate and expose organic or polymer...
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Lasers - (710 companies)Lasers are devices that produce intense beams of monochromatic, coherent radiation. The word "laser " is an acronym for Light Amplification by Stimulated Emission of Radiation.
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RF Generators - (91 companies)RF generators and high frequency power supplies provide the power required for plasma generation, induction heating, and radar or communications applications. RF Generators Information. RF generators provide power for thin film processing equipment...
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Thin Film Equipment - (310 companies)Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation. Thin film equipment is vacuum process equipment for the deposition or modification of thin films...
Product News
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MINTEQ® International Inc, Pyrogenics Group
Pyroid SN PG for Plasma Applications. with close tolerances. Pyrolytic Graphite is can be supplied with a high level of surface finish, flatness or a defined surface roughness. Typical Applications: Ion Implantation Grids. Wafer Trays. Electrodes for Plasma Etch. Boats. Crucibles. Susceptors. Brazing and glass-to-metal sealing jigs. Technical Papers. About Minteq. Minteq, the premier supplier of engineered refractory lining systems, manufactures monolithic refractories for the iron, steel, non-ferrous metals, minerals processing and glass... (read more) -
Linde Advanced Material Technologies
Plasma Spray Coatings Plasma-sprayed coatings, invented by Praxair Surface Technologies, are created by heating and accelerating powder material in a high-temperature plasma stream and projecting it against the surface. Standard production coatings include pure metals and metallic alloys such as nickel or ni-chrome and ceramics such as alumina, chromium oxide or alumina-titania, and cermets. Learn More (read more) -
Alluxa, Inc.
ADVANCED PLASMA DEPOSITION Advanced Plasma Deposition Improves Ultra Narrowband Optical Filters. A novel computer-controlled deposition system for multicavity filters improves their spectral precision and contrast. Narrowband filters are a critical technology for a variety of applications such as lidar (light detection and ranging), laser cleanup, chemical and gas sensing, instrumentation, and astronomy. The design principles are well known and relatively simple. All designs rely on stacked Fabry-P erot resonant cavities... (read more)Browse Optical Filters Datasheets for Alluxa, Inc. -
Precision Polymer Engineering Ltd.
Perlast® Helios seals best in class for plasma Precision Polymer Engineering (PPE) has released Perlast (R) Helios G7HA, an FFKM sealing material for semiconductor applications proven to deliver superior plasma resistance. Precision Polymer Engineering (PPE), manufacturer of high-performance sealing technology, has launched Perlast (R) Helios G7HA as a new material for the critical semiconductor market. In extensive testing, Perlast (R) Helios G7HA outperformed competitor materials in aggressive plasmas - including high concentrations... (read more)Browse O-rings Datasheets for Precision Polymer Engineering Ltd. -
Precision Polymer Engineering Ltd.
New FFKM Seal Material for Plasma Processes Perlast G65HP is a high performance, ultra-high purity perfluoroelastomer (FFKM) that offers excellent resistance to high concentration fluorine radical plasmas, plus general fluorine and chlorine based processes. Perlast (R) G65HP combines a fully fluorinated polymer backbone with a highly fluorinated cross-linking system to provide a material with exceptional resistance to high temperature and aggressive semiconductor processes. The fully organic structure of the material and extremely low... (read more) -
Precision Polymer Engineering Ltd.
New plasma resistant seal materials for semicon Precision Polymer Engineering (PPE) will be launching two new high performance sealing materials, Perlast (R) G65HP and Perlast (R) G67G, at SEMICON West 2017 this July. Both new Perlast (R) material grades are perfluoroelastomers which incorporate low levels of advanced nano-particle fillers. These materials have been formulated for minimal particle generation, and following comprehensive testing using different plasma chemistries and plasma sources, data shows the new materials perform better... (read more)Browse O-rings Datasheets for Precision Polymer Engineering Ltd. -
Camfil APC
Protect Operators from Toxic Plasma Cutting Fumes The Gold Series X-Flo (GSX) industrial dust collector is a powerful and cost-efficient system for capturing and containing the fumes generated by plasma cutting tables. The system is used in conjunction with a downdraft table to capture fumes at their source, reducing operator exposure to toxic fumes and helping shops meet permissible exposure limits (PELs). The GSX system helps facilities exceed OSHA indoor air quality standards. When equipped with a Camfil explosion vent, the system offers... (read more)Browse Dust Collectors and Dust Collector Filters Datasheets for Camfil APC -
Saint-Gobain Tape Solutions
Thermal, Plasma, Flame Spray Masking Tapes CHR (R) Pressure-Sensitive Adhesive Tapes - Thermal, Plasma, Flame Spray. Saint-Gobain Performance Plastics' CHR HV60 is a high-temperature heavy-duty pressure sensitive adhesive tape used for thermal spray masking. HV60 is manufactured by combining multiple layers of silicone rubber and fiberglass and is coated with an aggressive high temperature silicone adhesive. HV60 Pressure-Sensitive Tape Applications. HV60 is used as a high temperature masking tape in thermal spray and high velocity... (read more)Browse Industrial Tapes Datasheets for Saint-Gobain Tape Solutions -
Agilent Technologies - Vacuum Products
How Vacuum Enables Particles and Plasma Research Agilent Vacuum has been supporting scientific inquiry enabled by ultrahigh & extreme high vacuum for many decades. As the successor to Varian, which invented the ion getter pump that made UHV possible, Agilent remains committed to supporting physics exploration that expands knowledge of the physical world through continued innovation of vacuum technologies, products, and services. Read more here. (read more)Browse High Vacuum Pumps Datasheets for Agilent Technologies - Vacuum Products -
MINTEQ® International Inc, Pyrogenics Group
Pyrolytic Graphite for Ion Implantation Typical Applications: Ion Implantation Grids. Wafer Trays. Electrodes for Plasma Etch. Boats. Crucibles. Susceptors. Brazing and glass-to-metal sealing jigs. Semiconductor. Extremely Pure Pyroid (R) Pyrolytic Graphite for Ion Implantation. Global semiconductor manufacturers use ion implantation in most of their chip production processes. Ion implantation uses two or three closely spaced multiple-aperture electrodes to extract ions from a source and eject them in a collimated beam... (read more)
More Information
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New method for end-point detection in reactive ion etching of polysilicon
Simple circuit models, as suggested by several authors [13,14,15,16], of the plasma , matchbox , stray and coupled reactance's have been used to predict this observed phenomena. … substrate (variable capacitor), they do not however explain the constant bias voltage over the steady etching period.
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Process control of chrome dry etching by complete characterization of the RF power delivery
etch process. The advantage of the sensors is that they measure the feedback of the entire system including power loss in contacts, matchbox chamber and plasma .
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Benefits of APC at Infineon application examples from production fab Villach
High reflected power is mainly caused by generator or matchbox prob- lems. Solution: FDC developed key numbers e.g. ‘Std. dev. of W-power during plasma on” or “Range of load position of Matches during main etch step“, to track and minimize these problem continuously- see figures 9 and IO.
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Real-time plasma etch control by means of physical plasma parameters with SEERS
… are power losses on the cable between the generator output and the RF matchbox input, inside the … … a true measure for well known process conditions, due to, e.g., secondary plasmas and changing chamber … Etch rates, uniformity' s, and particle densities are usually measured on blank test wafers.
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Photocatalytic thin Films Prepared by Plasma Curing of Non‐Reactive Siloxane Dispersions Containing TiO 2 Particles
The plasma modified composite films from TiO2-PDMS suspensions were etched in a CF4 plasma at the pressure of 20 Pa, the flow rate of 15 sccm, and the RF forward power of 100 W. connected to the H¨uttinger RF 5000 plasma generator via a H¨uttinger matchbox PFM 10000.
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Innovative technology for contamination control in plasma processing
In somecases, high gas flow rate is sufficientto purge particles from the plasma , but this can have … … such as wafer clamp rings and the influence of a weakenedplasma on the etch or deposition process … … processes that arerapid enough to avoidprocess problems, but also allows enough time for matchbox tuning and avoids …
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Niobium oxide-barrier tunnel junction
To rf generator 13.56 MHz -I(00 Watt 1 67 Matchbox Diagram of the system used for the plasma etching of Nb fiims.
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Cambridge Journals Online - MRS Online Proceedings Library - Abstract - VHF Coaxial Helix Plasma Source for a-Si:H
Their favorable geometric construction suggests their utilization as plasma source for etching and deposition of a-Si:H at frequencies between 30 and 200 MHz - an additional, but still unusual application. Applying a suitable coupling factor allows operation at resonance without matchbox .
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Estimation and Control in Semiconductor Etch: Practice and Possibilities
The ANN is fed with forward and reflected RF power, matchbox capacitor positions, dc bias, wafer plate … … use of a poly- nomial ANN to predict the dc bias in an etch chamber [81] and … The control possibilities for a plasma etch tool are outlined in Fig. 2.
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Study on deposition of amorphous hydrogenate DLC films on germanium substrates by RF-PECVD
Maximum RF-energy absorption by the plasma is achieved by proper tuning of a matchbox . … by RF plasma enhanced chemical vapor deposition (PECVD) method, and the films were etched by the plasma …
