Products/Services for Lithography Equipment Manufacturer
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Lithography Equipment - (64 companies)Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules... -
Commercial Printing Services - (2783 companies)Commercial printing services provide high volume printing, duplication and publication of magazines, newspapers, catalogs, brochures, graphics, drawings, images and other printed media. -
Semiconductor Equipment Repair Services - (43 companies)Other semiconductor equipment repair services repair, rebuild or refurbish die bonders; cleaning and washing equipment; dicing equipment; die separators; lithography systems; packaging equipment; wafer coating equipment; wafer bonding systems... -
Photolithography Services - (31 companies)Photolithography services create photomasks and use them to etch or engrave patterns on semiconductor substrates.
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Rapid Prototyping Services - (832 companies)Rapid prototyping automates the fabrication of a prototype part from a three-dimensional (3-D) CAD drawing. These physical models convey more complete information about the product earlier in the development cycle. -
Presses (metalworking) - (520 companies)Industrial presses (metalworking) use a ram to shear, punch, form or assemble metal or other material by means of cutting, shaping, or combination dies attached to slides. Examples include die cutting machines, forming and bending machines, punch presses, shop presses, sheet metal equipment, stamping presses, and wire forming machines.
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Metal Plates and Plate Stock - (707 companies)Metal plates and metal plate stock includes metals and alloys in the form of blanks, flats, bars, plates, and sheet stock. Metal and alloy plates and plate stock are used in a variety of applications such as raw material feed for machining or forming of parts, flooring or floor fabrication, and building and construction materials.
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Sinks (washbasins) - (204 companies)Sinks are washbasins which are used to for a variety of general washing activites. They have a manageable flow of water which is drained away from the basin.
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Computer-Aided Design (CAD) Services - (1430 companies)...and has visual appeal to clients. It is a service of CAD service providers. Lithography. Lithography is a 2D printing method that uses a stone or a metal plate with a smooth surface to produce a technical document like a map. It employs a simple...
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Autofocus Systems - (13 companies)...and/or determine the distance to the sample. The signal can be a laser, light, or sound. Applications. Both active and passive AF technologies are used in applications such as: microscope automation. digital cameras. telescopes. binoculars. lithography systems...
Product News
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3X Ceramic Parts Company Limited
SiC ceramic precision parts in lithography machine Silicon carbide ceramic precision parts: inject "soul" into the new generation of lithography machine. The key equipment of integrated circuit represented by lithography machine is the product of high integration of modern technology. Its design and manufacturing process can reflect the highest level in many related scientific fields, including material science and engineering, machining and so on. For the discipline of materials science and engineering, the key equipment of integrated circuit... (read more)Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for 3X Ceramic Parts Company Limited -
THK America, Inc.
Completely Non-Magnetic Products Cutting edge technology support by THK-NM1. MRI Scanner. Electron Microscope. NMR Spectrometer. Electron Beam Lithography System. Learn More (read more)Browse Roller Bearings Datasheets for THK America, Inc. -
Navitar, Inc.
Industrial Imaging Technologies Our integrated imaging solutions provide the eyes of automation for machine vision, metrology and robotic systems, advanced semiconductor and electronic inspection, semiconductor lithography, advanced life science equipment, autonomous vehicles, homeland security, entertainment, planetarium, military applications and AR/VR. (read more)Browse Image Analysis Software Datasheets for Navitar, Inc. -
Mitsui Chemicals America, Inc.
Mitsui Pellicle Mitsui Pellicle is a dust proof membrane applied to photomask in the lithography process of the semiconductor manufacturing process. Pellicle's membrane materials and membrane thickness are designed to optimize different light exposures and achieve excellent transmission rates. To ensure photomask, Mitsui Chemicals selects materials such as non-dust structures that eliminate particle generation and ensure cleanliness during long periods of light exposure. With its high level of cleanliness... (read more) -
Air Innovations, Inc.
Custom ECU for Semiconductor Process Equipment Semiconductor: Custom ECU for Semiconductor Process Equipment. The Challenge: Custom ECU for Semiconductor Application. One of the biggest challenges in using lithography in high-volume semiconductor fabrication is photomask defectivity. A global supplier to the semiconductor and photomask making industries asked Air Innovations to create an environmental control unit (ECU) that could service -- on demand -- any of its nanomachining mask repair tool systems. Extremely tight tolerance... (read more)Browse Environmental Control Systems Datasheets for Air Innovations, Inc. -
Tecnotion
ULV – G2 series The Vacuum ULV - G2 series is the medium-size series in the high-end vacuum-rated linear motor series. They are commonly used for applications demanding peak force or low heat output.Such as in lithography and inspection solutions. In longer strokes, ULV - G2 coils can be combined to save magnet material but still achieve high performance. (read more)Browse Linear Motors Datasheets for Tecnotion -
NBK America LLC
Semiconductor Manufacturing Equipment Screws NBK has a large variety of screws which have unique functions thereby making them suitable for Semiconductor Manufacturing Equipment. Examples inlcude: Vented, Low Outgas, Chemical Resistance, High Strength, Heat Resistance, Anti-Galling-Seizing, Non-Magnetic screws, etc. These can be used for Wafer cleaning machinery, Oxidation/diffusion equipment, Coater/developer, Semiconductor lithography equipment, Etching equipment, Ion implantation equipment, Film deposition equipment, Sputtering... (read more)Browse Screws Datasheets for NBK America LLC -
Zygo Corporation
ZMI ™ Displacement Measuring Interferometers ZYGO is the technology and application support leader in heterodyne displacement interferometry, offering complete solutions and support for your OEM metrology application. ZYGO's technologies and OEM products have been field proven over many years of use in leading-edge production facilities. Typical Applications. * Lithography tools: optical lithography steppers and scanners, e-beam & laser mask writers. * Metrology tools: Mask and wafer inspection and measurement tools, CD-SEMs... (read more)Browse Semiconductor Metrology Instruments Datasheets for Zygo Corporation -
Xiamen Unipretec Ceramic Technology Co., Ltd.
High-Precision Ceramic Wafer Chuck The Ceramic Wafer Chuck is essential in the semiconductor industry for holding wafers securely during high-precision processes like lithography, etching, deposition, and testing. With its exceptional thermal stability, chemical resistance, and flatness, this chuck ensures precise wafer positioning for optimal process control, reducing misalignment and contamination risks. Engineers rely on the Ceramic Wafer Chuck to maintain consistent wafer handling, improving production yields and ensuring... (read more)Browse Industrial Ceramic Materials Datasheets for Xiamen Unipretec Ceramic Technology Co., Ltd. -
Richardson RFPD
New 18W X-Band GaN-on-SiC MMIC Amplifier from UMS The CHA8612-QDB/20 is manufactured with a GaN-on-SiC process, 0.25 um gate length, via holes through the substrate, air bridges and electron beam gate lithography. FEATURES. High output power: 18 W. High PAE: 40%. Linear gain: 26 dB. DC bias: Vd=30 V @ IDQ=680 mA. MSL 3. APPLICATIONS. It is designed for a wide range of applications, from military to commercial radar and communication systems. (read more)Browse RF Amplifiers Datasheets for Richardson RFPD
Conduct Research
3D printing and additive manufacturing are gaining traction in prototyping and industrial manufacturing of complex parts. Typical 3D printers can produce feature sizes down to a few 10 microns. Significantly higher resolution is available with two photon polymerization and a new laser lithography...
As semiconductor geometries continue to shrink, advances in microelectronics are driving the development of powerful, smart, and sophisticated devices....
We demonstrate a new method for creating synthetic tissue that has the potential to capture the three-dimensional (3D) complexity of a multi-cellular organism with submicron precision....
Desktop nanoprinter based on a novel, highly scalable, and versatile photolithographic technology and XYZ piezo-driven nanopositioning stage finds applications in photonics, meta-materials, electronics, soft robotics, and biomedicine....
lithography options Japan's Nikon Corp. here today (May 23) said it is evaluating its tool options amid Intel Corp.'s decision to drop 157-nm lithography from its roadmap. Teradyne appoints company exec as president Teradyne Inc. today announced that company executive Michael A. Bradley has been...
(3G) mobile communications equipment as part of a proposed patent-licensing scheme. ASML urges industry effort on 157-nm lithography ASM Lithography NV (ASML) has called for an industry-wide effort to extend the use of optical lithography to the manufacture of integrated circuits using light...
lithography appear equally applicable to next-generation extreme ultraviolet lithography, which could greatly increase the extendibility of the technology, according to Kurt Ronse, director of the advanced lithography program at nanoelectronics research center IMEC. Updated: Speculation simmers over...
...immersion plans The major lithography vendors will decide by year-end whether to commit to building immersion 193-nm scanners, representatives of ASML, Canon, and Nikon said here at the second International Sematech Immersion Lithography Workshop. Amkor's outlook improves amid growing demand...
...upon Nikon's lithography-tool patents. Nikon's complaint requests an investigation by the ITC into the alleged unlawful importation into the United States of stepper and scanner machines by ASML of the Netherlands. Commentary & analysis of week's chip news, Dec. 17-21 Zygo lowers forecast for quarter...
Via's executives, employee charged with IP theft Link by link, China crafts its electronics industry Mark Ding named president of Semi China While immersion lithography is grabbing the headlines these days, there is another promising technology emerging on the horizon--nano-imprint lithography...
More Information
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http://dspace.mit.edu/bitstream/handle/1721.1/32171/33979449-MIT.pdf?sequence=2
Figure 3.3 outlines the 1993 worldwide market shares ofall optical lithography equipment manufacturers .
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Excimer Laser Technology
The capital lithography equipment manufacturers ASML (Netherlands), Canon and Nikon (both Japan) are developing full-field EUV exposure tools that are scheduled for introduction in 2006.
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RoboCup 2014: Robot World Cup XVIII
ASML, a lithography equip- ment manufacturer founded an MSL team “ASML Robo Team” in 2013.
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EUV Lithography
The R&D necessary to successfully demonstrate EUVL was projected to be very expensive, much greater than any of the individual lithography equipment man- ufacturers could afford.
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http://dspace.mit.edu/bitstream/handle/1721.1/42626/37519910-MIT.pdf?sequence=2
For example, the existence of strong software related equipment industry in the US contributed the technological strength of design intensive products, which US semiconductor industry focuses, while strong lithography equipment manufacturers gives an advantage to Japanese semiconductor industry, who is focusing on …
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Calibration of lithography simulator by using subresolution patterns
The initial set of exposure process parameters necessary for accurate simulation is usually available from the lithography equipment manufacturer .
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Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography
Lithography equipment manufacturers were already familiar with stress-induced birefringence in calcium fluoride and they were prepared to compensate it with relatively complex lens designs.
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Pellicles designed for high-performance lithographic processes
Pellicle manufacturers, lithography equipment manufacturers , and endusers should continue to examine the effects of pellicles on the process so that the necessary design changes and production improvements can be made to meet the evolving needs of the industry.
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Excimer laser as a total light source solution for DUV microlithography
Thus, all lithography equipment manufacturers have now switched to the design & development of scanner technology.
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Dose metrology for DUV lithographic tools
Lithography equipment manufacturers are under constant pressure to provide in situ measurements that prevent wafer processing from slipping from the established parameters.
