Products/Services for Lithography Equipment Manufacturer
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Lithography Equipment - (65 companies)Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules... -
Commercial Printing Services - (2759 companies)Commercial printing services provide high volume printing, duplication and publication of magazines, newspapers, catalogs, brochures, graphics, drawings, images and other printed media. -
Semiconductor Equipment Repair Services - (43 companies)Other semiconductor equipment repair services repair, rebuild or refurbish die bonders; cleaning and washing equipment; dicing equipment; die separators; lithography systems; packaging equipment; wafer coating equipment; wafer bonding systems... -
Photolithography Services - (31 companies)Photolithography services create photomasks and use them to etch or engrave patterns on semiconductor substrates.
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Rapid Prototyping Services - (841 companies)Rapid prototyping automates the fabrication of a prototype part from a three-dimensional (3-D) CAD drawing. These physical models convey more complete information about the product earlier in the development cycle. -
Presses (metalworking) - (519 companies)Industrial presses (metalworking) use a ram to shear, punch, form or assemble metal or other material by means of cutting, shaping, or combination dies attached to slides. Examples include die cutting machines, forming and bending machines, punch presses, shop presses, sheet metal equipment, stamping presses, and wire forming machines.
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Metal Plates and Plate Stock - (716 companies)Metal plates and metal plate stock includes metals and alloys in the form of blanks, flats, bars, plates, and sheet stock. Metal and alloy plates and plate stock are used in a variety of applications such as raw material feed for machining or forming of parts, flooring or floor fabrication, and building and construction materials.
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Sinks (washbasins) - (205 companies)Sinks are washbasins which are used to for a variety of general washing activites. They have a manageable flow of water which is drained away from the basin.
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Computer-Aided Design (CAD) Services - (1429 companies)...and has visual appeal to clients. It is a service of CAD service providers. Lithography. Lithography is a 2D printing method that uses a stone or a metal plate with a smooth surface to produce a technical document like a map. It employs a simple...
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Autofocus Systems - (13 companies)...and/or determine the distance to the sample. The signal can be a laser, light, or sound. Applications. Both active and passive AF technologies are used in applications such as: microscope automation. digital cameras. telescopes. binoculars. lithography systems...
Product News
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Conax Technologies
Fiber Optic Feedthrough for Lithography Tool Conax Technologies designs and manufactures a full line of fiber optic cable seals for use in the semiconductor industry. These feedthroughs are used any time a fiber optic cable needs to pass through a pressure-differential boundary or an area requiring isolation to minimize particle contamination. In a typical application, a laser is introduced into a photolithography tool used for interferometry measurements. Interferometers are used to accurately control stage movement for the proper... (read more) -
THK America, Inc.
Completely Non-Magnetic Products Cutting edge technology support by THK-NM1. MRI Scanner. Electron Microscope. NMR Spectrometer. Electron Beam Lithography System. Learn More (read more)Browse Roller Bearings Datasheets for THK America, Inc. -
Mitsui Chemicals America, Inc.
Mitsui Pellicle Mitsui Pellicle is a dust proof membrane applied to photomask in the lithography process of the semiconductor manufacturing process. Pellicle's membrane materials and membrane thickness are designed to optimize different light exposures and achieve excellent transmission rates. To ensure photomask, Mitsui Chemicals selects materials such as non-dust structures that eliminate particle generation and ensure cleanliness during long periods of light exposure. With its high level of cleanliness... (read more) -
Air Innovations LLC
Custom ECU for Semiconductor Process Equipment Semiconductor: Custom ECU for Semiconductor Process Equipment. The Challenge: Custom ECU for Semiconductor Application. One of the biggest challenges in using lithography in high-volume semiconductor fabrication is photomask defectivity. A global supplier to the semiconductor and photomask making industries asked Air Innovations to create an environmental control unit (ECU) that could service -- on demand -- any of its nanomachining mask repair tool systems. Extremely tight tolerance... (read more)Browse Environmental Control Systems Datasheets for Air Innovations LLC -
Tecnotion
ULV – G2 series The Vacuum ULV - G2 series is the medium-size series in the high-end vacuum-rated linear motor series. They are commonly used for applications demanding peak force or low heat output.Such as in lithography and inspection solutions. In longer strokes, ULV - G2 coils can be combined to save magnet material but still achieve high performance. (read more)Browse Linear Motors Datasheets for Tecnotion -
Avantier Inc.
Microlens Arrays (MLAs) Microlens Arrays. Custom Design Capabilities. Tailored pitch, curvature, focal length, and fill factor. Optimized for UV, visible, and near-infrared wavelengths. Configurations available in spherical, aspherical, cylindrical, or hybrid designs. Advanced Manufacturing. Semiconductor lithography, laser micromachining, and precision glass molding. Tight tolerances for surface accuracy, thickness, and centering. Optional AR coatings for maximum transmission. Premium Materials. UV-grade fused silica, BK7... (read more)Browse Optical Lenses Datasheets for Avantier Inc. -
Changchun Yutai Optics Co., Ltd.
UV Bandpass Filters What types of UV bandpass filters are available from Yutai Optics?. (1) Narrowband UV BPF. FWHM: usually 2-20nm (e.g. 254 +-5nm, 365 +-2nm). Blocking(OD): optical density in other UV bands and visible regions up to OD4-OD6 (i.e., transmittance <0.01%-0.0001%). Applications: UV fluorescence detection (e.g. DNA analysis). UV lithography (e.g. 365nm i-line lithography). Ozone monitoring (254nm Hg lamp detection). (2) Broadband UV BPF. FWHM: usually 30-100nm (e.g. 280-400nm). Blocking(OD): visible... (read more)Browse Optical Filters Datasheets for Changchun Yutai Optics Co., Ltd. -
Fountyl Technologies Pte. Ltd.
1600mm Ultra-Precision SiC Guide Rail In semiconductor photolithography systems, motion accuracy directly determines wafer exposure quality. Silicon carbide ceramic guide rails are critical structural components within ultra-precision motion platforms, enabling nanometer-level positioning under high-speed dynamic conditions. With over 20 years of expertise in semiconductor ceramics, these ultra-precision SiC guides are engineered for advanced lithography and wafer handling systems. Nanometer-Level Motion Performance. Designed... (read more)Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for Fountyl Technologies Pte. Ltd. -
Fountyl Technologies Pte. Ltd.
Porous Ceramic Chucks for Wafer Adsorption including high-vacuum and high-temperature chambers). This makes it an ideal upgrade for advanced metrology, coating, and laser dicing equipment. Typical Applications: Semiconductor wafer processing: Used in lithography, track systems, spin coaters, and plasma etching equipment. Metrology & inspection: Ideal for wafer defect inspection, thin-film measurement, and optical positioning. Laser processing: Applied in precision laser dicing, drilling, and scribing of fragile substrates. Advanced display... (read more)Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
Fountyl Technologies Pte. Ltd.
High-Precision SiC Chucks for Next-Gen Wafer Advanced semiconductor manufacturing demands exceptional dimensional stability and contamination control. To meet these rigorous requirements, these high-purity Silicon Carbide (SiC) chucks --including pin, ring-groove, and bump designs --are engineered to optimize wafer handling in next-generation lithography, etching, deposition, and metrology systems. Key Technical Advantages: Sub-Micron Flatness: Minimizes wafer distortion and guarantees absolute lithography and inspection accuracy... (read more)Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for Fountyl Technologies Pte. Ltd.
Conduct Research
3D printing and additive manufacturing are gaining traction in prototyping and industrial manufacturing of complex parts. Typical 3D printers can produce feature sizes down to a few 10 microns. Significantly higher resolution is available with two photon polymerization and a new laser lithography...
As semiconductor geometries continue to shrink, advances in microelectronics are driving the development of powerful, smart, and sophisticated devices....
We demonstrate a new method for creating synthetic tissue that has the potential to capture the three-dimensional (3D) complexity of a multi-cellular organism with submicron precision....
Desktop nanoprinter based on a novel, highly scalable, and versatile photolithographic technology and XYZ piezo-driven nanopositioning stage finds applications in photonics, meta-materials, electronics, soft robotics, and biomedicine....
lithography options Japan's Nikon Corp. here today (May 23) said it is evaluating its tool options amid Intel Corp.'s decision to drop 157-nm lithography from its roadmap. Teradyne appoints company exec as president Teradyne Inc. today announced that company executive Michael A. Bradley has been...
(3G) mobile communications equipment as part of a proposed patent-licensing scheme. ASML urges industry effort on 157-nm lithography ASM Lithography NV (ASML) has called for an industry-wide effort to extend the use of optical lithography to the manufacture of integrated circuits using light...
lithography appear equally applicable to next-generation extreme ultraviolet lithography, which could greatly increase the extendibility of the technology, according to Kurt Ronse, director of the advanced lithography program at nanoelectronics research center IMEC. Updated: Speculation simmers over...
...immersion plans The major lithography vendors will decide by year-end whether to commit to building immersion 193-nm scanners, representatives of ASML, Canon, and Nikon said here at the second International Sematech Immersion Lithography Workshop. Amkor's outlook improves amid growing demand...
...upon Nikon's lithography-tool patents. Nikon's complaint requests an investigation by the ITC into the alleged unlawful importation into the United States of stepper and scanner machines by ASML of the Netherlands. Commentary & analysis of week's chip news, Dec. 17-21 Zygo lowers forecast for quarter...
Via's executives, employee charged with IP theft Link by link, China crafts its electronics industry Mark Ding named president of Semi China While immersion lithography is grabbing the headlines these days, there is another promising technology emerging on the horizon--nano-imprint lithography...
More Information
Indicates content that may require registration and/or purchase.
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http://dspace.mit.edu/bitstream/handle/1721.1/32171/33979449-MIT.pdf?sequence=2
Figure 3.3 outlines the 1993 worldwide market shares ofall optical lithography equipment manufacturers .
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Excimer Laser Technology
The capital lithography equipment manufacturers ASML (Netherlands), Canon and Nikon (both Japan) are developing full-field EUV exposure tools that are scheduled for introduction in 2006.
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RoboCup 2014: Robot World Cup XVIII
ASML, a lithography equip- ment manufacturer founded an MSL team “ASML Robo Team” in 2013.
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EUV Lithography
The R&D necessary to successfully demonstrate EUVL was projected to be very expensive, much greater than any of the individual lithography equipment man- ufacturers could afford.
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http://dspace.mit.edu/bitstream/handle/1721.1/42626/37519910-MIT.pdf?sequence=2
For example, the existence of strong software related equipment industry in the US contributed the technological strength of design intensive products, which US semiconductor industry focuses, while strong lithography equipment manufacturers gives an advantage to Japanese semiconductor industry, who is focusing on …
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Calibration of lithography simulator by using subresolution patterns
The initial set of exposure process parameters necessary for accurate simulation is usually available from the lithography equipment manufacturer .
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Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography
Lithography equipment manufacturers were already familiar with stress-induced birefringence in calcium fluoride and they were prepared to compensate it with relatively complex lens designs.
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Pellicles designed for high-performance lithographic processes
Pellicle manufacturers, lithography equipment manufacturers , and endusers should continue to examine the effects of pellicles on the process so that the necessary design changes and production improvements can be made to meet the evolving needs of the industry.
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Excimer laser as a total light source solution for DUV microlithography
Thus, all lithography equipment manufacturers have now switched to the design & development of scanner technology.
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Dose metrology for DUV lithographic tools
Lithography equipment manufacturers are under constant pressure to provide in situ measurements that prevent wafer processing from slipping from the established parameters.
