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Supplier: PTB Sales, Inc.
Description: The Airco Temescal FDC-8000 Film Deposition Controller provides automatic control of single or multi-layer film deposition in either a production or development environment.
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Supplier: PTB Sales, Inc.
Description: The Maxtek MDC 360 is the current model and is able to control up to four single or multi-pocket sources, control and interface with up to four single, dual or multi-crystal sensors. It has up to 99 processes, 999 layer definitions and 32 complete material definitions, a list of material and system
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Supplier: Hiden Analytical
Description: The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies.
- Applications: Etching - Plasma / Wet, Optical Components
- Form Factor: Monitor / Instrument, Controller
- Measurement Capability: Deposition Rate
- Mounting / Loading: In-situ / System Mounted
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Supplier: Hiden Analytical
Description: The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia.
- Applications: Etching - Plasma / Wet, Other
- Form Factor: Controller, Wafer Probing System
- Measurement Capability: Deposition Rate
- Mounting / Loading: In-situ / System Mounted
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Supplier: Hiden Analytical
Description: The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process.
- Applications: Other
- Form Factor: Monitor / Instrument, Controller
- Measurement Capability: Deposition Rate
- Mounting / Loading: In-situ / System Mounted
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Supplier: Hiden Analytical
Description: The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes.
- Applications: Etching - Plasma / Wet, Optical Components
- Form Factor: Monitor / Instrument, Controller
- Measurement Capability: Deposition Rate, Endpoint Detection / Plasma Diagnostics
- Mounting / Loading: In-situ / System Mounted
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Supplier: Fredericks Company - Televac
Description: Excellent customer support Design and manufactured in the United States of America Applications Freeze drying and food packaging Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film
- Control Signal Output: Analog Voltage, Switch / Relay Output
- Control Technique: Limit / Set Point Control
- Controller Inputs: Other
- Form Factor: Panel / Chassis Mount, Rack Mount
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Supplier: Fredericks Company - Televac
Description: -lock Semiconductor Heat treating and vacuum furnaces Thin film deposition and coating processes Storage Pharmaceutical product processes
- Control Signal Output: Analog Voltage, Switch / Relay Output
- Form Factor: Panel / Chassis Mount
- Number of Control Outputs: 1 outputs
- Number of Inputs: 1 inputs
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Supplier: Fredericks Company - Televac
Description: Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film deposition and coating processes Pharmaceutical product processes
- Control Signal Output: Analog Voltage, Switch / Relay Output
- Control Technique: Limit / Set Point Control
- Form Factor: Panel / Chassis Mount
- Number of Control Outputs: 1 outputs
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Supplier: Advanced Energy Industries, Inc.
Description: A field-proven solution for any dual-magnetron sputtering application with additional capabilities facilitating advanced process innovation. Achieve higher deposition rates with a more stable process through advanced ARC management Tune your process with variable frequency
- Applications: Semiconductor Wafers, Other
- Form Factor: Controller
- Mounting / Loading: Floor Mounted / Stand-alone
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Supplier: HORIBA Instruments, Inc.
Description: developed according to customers’ needs. Features The RU-1000 plasma emission controller achieves excellent spatial distribution of deposition on substrates with large surface areas. Reactive sputtering is performed for film deposition on films and glass substrates
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Supplier: Advanced Energy Industries, Inc.
Description: initiative goals Increases pump lifetime by reducing particulates from deposition processes Provides fast matching, stable power delivery for precise process control Comprises one small-footprint package, easy to install in existing or new production locations
- Applications: Semiconductor Wafers, Etching - Plasma / Wet, Photolithography / Patterning
- Form Factor: Controller
- Mounting / Loading: Floor Mounted / Stand-alone
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Supplier: Brooks Instrument
Description: configuration; eliminates need for remote secondary electronics Variety of communication options makes it easy to align with user requirements Applications Heat treating, cutting/welding and other thermal processes Solar/thin film physical vapor deposition (PVD) systems
- Accuracy: 3 ±% FS
- Control Signal Output: Analog Voltage, Current Loop
- Number of Control Outputs: 1 outputs
- Number of Inputs: 1 inputs
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Supplier: Brooks Instrument
Description: configuration; eliminates need for remote secondary electronics Variety of communication options makes it easy to align with user requirements Applications Heat treating, cutting/welding and other thermal processes Solar/thin film physical vapor deposition (PVD) systems
- Mass Flow Rate: 1.38E-4 to 0.1101 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- Features: Controller Functions
- Interface Options: Serial / Digital
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Supplier: Brooks Instrument
Description: Cost efficient retrofit/upgrade of legacy MFCs in refurbished semiconductor process tools Reduce MFC inventory in six-inch/eight-inch semiconductor fabs MOCVD for LED and power device manufacturing Solar/thin film chemical vapor deposition (CVD) systems Analytical OEM equipment
- Mass Flow Rate: 8.26E-6 to 0.8259 lbs/min
- Electrical Output: Analog Current, Analog Voltage
- Features: Controller Functions
- Interface Options: Serial / Digital, Network / Fieldbus
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Supplier: Brooks Instrument
Description: diagnostic/service port aids device installation, monitoring and troubleshooting Applications Semiconductor etch tools Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD) Physical vapor deposition (PVD) systems Epitaxial process systems
- Mass Flow Rate: 8.26E-6 to 0.8259 lbs/min
- Electrical Output: Analog Voltage
- Features: Controller Functions
- Interface Options: Serial / Digital, Network / Fieldbus
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Supplier: Fredericks Company - Televac
Description: Freeze drying and food packaging Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film deposition and coating processes Research and development Laboratories Leak detection Pharmaceutical product processes
- Control Signal Output: Switch / Relay Output
- Control Technique: Limit / Set Point Control, Linear Control, Advanced / Nonlinear Control
- Form Factor: Panel / Chassis Mount, Rack Mount
- Number of Control Outputs: 8 outputs
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Supplier: Agilent Technologies - Vacuum Products
Description: -G the optimum pumping solution for the vacuum coating industry. Application-specific pumping solution designed for thin film deposition Optimized to work with very high flows of argon Integrated pump and controller can be installed in any position for simple
- Configuration: Individual Vacuum Pump
- High / Ultrahigh Vacuum Type: Turbomolecular
- Pumping Speed: 4026 to 4662 CFM
- Ultimate Operating Vacuum: 7.50E-9 torr
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Supplier: Agilent Technologies - Vacuum Products
Description: The high-throughput turbomolecular pump, the Turbo-V 2K-G, is a dedicated vacuum pumping system offering 1600L/s pumping speed. The Turbo-V 2K-G is designed for industrial use specifically as a turbo pump for thin film deposition equipment. Its pumping stages, and the entire
- Configuration: Individual Vacuum Pump
- High / Ultrahigh Vacuum Type: Turbomolecular
- Pumping Speed: 2966 to 3390 CFM
- Ultimate Operating Vacuum: 7.50E-9 torr
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Supplier: Bronkhorst USA
Description: water, solvents, liquid mixtures Very stable vapour flow Flexible selection of gas/liquid ratio Lower working temperature than conventional system Applications CVD (Chemical Vapour Deposition), e.g. for hardening, thin film coating or
- Application: Coating / Etching, Research and Development, Semiconductor Manufacturing, Other
- Heating / Power Source: Electric
- Operating Temperature: 20 to 200 C
- Operation: Production, Laboratory
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wavelength will shift approximately 2.5pm/°C. Lower values of temperature shift can be created on request by optimizing the design parameters. In summary, our computer-controlled method of thin-film deposition allows us to create multicavity filters with greater wavelength precision and (read more)
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manufacturing tolerance and operating temperature. ULTRA Series thin-film optical interference filters and coatings are all hard-coated using an innovative plasma deposition process that allows us to achieve precision wavelength control, highly uniform coatings, and industry-leading performance. After (read more)
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SIRRUS™ plasma deposition process on equipment that was designed and built by our team. This allows us to reliably and repeatedly produce the same high-performance thin-film notch filters over several different coating runs, which translates to consistent performance across all of your systems (read more)
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consistency from an innovative thin-film coating process Alluxa thin-film optical interference filters and dielectric mirrors are all hard-coated using our SIRRUS™ plasma deposition process on equipment that was designed and built by our team. This allows us to reliably and repeatedly (read more)
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Browse our selection of optical filters and fluorescence filter sets INNOVATIVE ENGINEERING Advanced plasma deposition. Precision wavelength control. New metrology techniques. Learn how our thin-film (read more)
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-independent measurement, where a nanometer-accurate thickness value is achieved even with moving objects. The large thickness measuring range allows the measurement of thin layers, flat glass and films. Since the white light interferometer works with an SLED in the near infrared range, thickness measurement of anti (read more)
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