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Supplier: PTB Sales, Inc.
Description: The Maxtek MDC 360 is the current model and is able to control up to four single or multi-pocket sources, control and interface with up to four single, dual or multi-crystal sensors. It has up to 99 processes, 999 layer definitions and 32 complete material definitions, a list of material and system
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Supplier: PTB Sales, Inc.
Description: The Airco Temescal FDC-8000 Film Deposition Controller provides automatic control of single or multi-layer film deposition in either a production or development environment.
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Supplier: Fredericks Company - Televac
Description: Freeze drying and food packaging Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film deposition and coating processes Research and development Laboratories Leak detection Pharmaceutical product processes
- Number of Inputs: 2 inputs
- Number of Control Outputs: 4 outputs
- Control Signal: Analog Voltage, Switch / Relay Output
- Interface: Digital Front Panel
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Supplier: HORIBA Instruments, Inc.
Description: The RU-1000 plasma emission controller achieves excellent spatial distribution of deposition on substrates with large surface areas. Reactive sputtering is performed for film deposition on films and glass substrates used for touch panels. This method is employed to
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Supplier: Fredericks Company - Televac
Description: 10 V DC output Excellent customer support Designed and manufactured in the United States of America Applications Freeze drying and food packaging Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film deposition and coating processes Storage
- Number of Inputs: 1 inputs
- Number of Control Outputs: 1 outputs
- Control Signal: Analog Voltage, Switch / Relay Output
- Form Factor: Panel / Chassis Mount
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Supplier: Brooks Instrument
Description: Heat treating, cutting/welding and other thermal processes Solar/thin film physical vapor deposition (PVD) systems Analytical devices to measure and control reagent, calibration and sample gas flows
- Media Temperature Range: 41 to 122 F
- Operating Pressure: 150 psi
- Mass Flow Rate: 0.00013765 to 0.11012 lbs/min
- Operating Temperature: 41 to 122 F
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Supplier: Hiden Analytical
Description: The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process.
- Form Factor: Controller, Monitor / Instrument
- Measurements: Deposition Rate
- Mounting / Loading: In-situ / System Mounted
- Features: Other
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Supplier: Brooks Instrument
Description: in refurbished semiconductor process tools Reduce MFC inventory in six-inch/eight-inch semiconductor fabs MOCVD for LED and power device manufacturing Solar/thin film chemical vapor deposition (CVD) systems Analytical OEM equipment
- Mass Flow Rate: 0.000008259 to 0.8259 lbs/min
- Operating Pressure: 150 psi
- Media Temperature: 122 F
- Media Temperature Range: 122 F
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Supplier: Edwards Vacuum
Description: The FC-3800, our latest large-scale evaporator, enables rapid processing of 6 inch diameter wafers for lift off and/or step coverage applications. In each load, this load lock system can coat twenty-five 6 inch diameter wafers for lift off or thirty-six 6 inch wafers for step coverage. The 38 inch
- Maximum Part Diameter / Width: 152.39991770404444 mm
- High Vacuum Type: Cryogenic / Cryosorption
- Process: Evaporation - Electron Beam, Physical Vapor Deposition (PVD)
- Features: Gas Control Unit, Integral Process Controller, Metrology / Film Monitor
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Supplier: Brooks Instrument
Description: independent diagnostic/service port aids device installation, monitoring and troubleshooting Applications Semiconductor etch tools Thin-film chemical vapor deposition systems (CVD, MOCVD, PECVD, ALD) Physical vapor deposition (PVD) systems Epitaxial process systems
- Mass Flow Rate: 0.000008259 to 0.8259 lbs/min
- Operating Pressure: 500 psi
- Media Temperature: 122 F
- Media Temperature Range: 122 F
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Supplier: Hiden Analytical
Description: The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies.
- Form Factor: Controller, Monitor / Instrument
- Measurements: Deposition Rate
- Applications: Etching - Plasma / Wet, Optical Components
- Mounting / Loading: In-situ / System Mounted
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Supplier: Hiden Analytical
Description: The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia.
- Form Factor: Controller, Wafer Probing System
- Measurements: Deposition Rate
- Applications: Etching - Plasma / Wet
- Mounting / Loading: In-situ / System Mounted
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Supplier: Fredericks Company - Televac
Description: millibar) Digital interface One analog output per sensor Excellent customer support Designed and manufactured in the United States of America Applications Freeze drying and food packaging Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film deposition
- Number of Control Outputs: 8 outputs
- Control: Advanced / Nonlinear Control, Limit / Set Point Control, Linear Control
- Interface: Computer Programmable, Digital Front Panel
- Form Factor: Panel / Chassis Mount, Rack Mount
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Supplier: Fredericks Company - Televac
Description: process relays Analog 0 V to 5 V DC output Excellent customer support Design and manufactured in the United States of America Applications Freeze drying and food packaging Cryogenics Load-lock Semiconductor Heat treating and vacuum furnaces Thin film deposition and coating
- Vacuum Range: 0.0009999999989638293 to 19.999999999998693 torr
- Operating Temperature: 32 to 122 F
- Signal Output: Analog Voltage, Switch / Alarm
- Device Category: Controller, Instrument
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Supplier: Agilent Technologies - Vacuum Products
Description: optimum pumping solution for the vacuum coating industry. Application-specific pumping solution designed for thin film deposition Optimized to work with very high flows of argon Integrated pump and controller can be installed in any position for simple operation with a
- Ultimate Operating Vacuum: 0.00000000750283824473074 torr
- Pumping Speed: 4,025.872006249708 to 4,661.536007236504 CFM
- Operating Temperature: 41 to 95 F
- Configuration: Individual Vacuum Pump
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Supplier: Agilent Technologies - Vacuum Products
Description: design and its advanced electronic integrated solution make the Turbo-V 2K-G the optimum pumping solution for the vacuum coating industry. Application-specific pumping solution designed for thin film deposition Optimized to work with very high flows of argon Integrated pump and
- Ultimate Operating Vacuum: 0.00000000750283824473074 torr
- Pumping Speed: 2,966.432004605048 to 3,390.208005262912 CFM
- Operating Temperature: 41 to 95 F
- Configuration: Individual Vacuum Pump
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Supplier: Bronkhorst USA
Description: gas/liquid ratio Lower working temperature than conventional system Applications CVD (Chemical Vapour Deposition), e.g. for hardening, thin film coating or planarization processes Testing/calibration of analyzers with reference gas vapor concentrations Toxic gas effects on
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Supplier: Brooks Instrument
Description: configurations accommodates wide range of liquid properties Modular design enables easy modification from application to application Applications Functional coatings (e.g., TiN, SiC) Thin-film chemical vapor deposition systems (CVD, ALD) used in semiconductor, fiber optic and
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wavelength will shift approximately 2.5pm/°C. Lower values of temperature shift can be created on request by optimizing the design parameters. In summary, our computer-controlled method of thin-film deposition allows us to create multicavity filters with greater wavelength precision and (read more)
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In the electronics industry, resistors are fundamental components used to control current flow, divide voltages, and perform various other functions in circuits. Among the various types of resistors, thick-film and thin-film resistors are widely used due to their stability (read more)
Browse Industrial Ceramic Materials Datasheets for 3X Ceramic Parts Company Limited -
manufacturing tolerance and operating temperature. ULTRA Series thin-film optical interference filters and coatings are all hard-coated using an innovative plasma deposition process that allows us to achieve precision wavelength control, highly uniform coatings, and industry-leading performance. After (read more)
Browse Optical Filters Datasheets for Alluxa, Inc. -
fluorescence filter sets INNOVATIVE ENGINEERING Advanced plasma deposition. Precision wavelength control. New metrology techniques. Learn how our thin-film coating technology has enabled the routine production of (read more)
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SIRRUS™ plasma deposition process on equipment that was designed and built by our team. This allows us to reliably and repeatedly produce the same high-performance thin-film notch filters over several different coating runs, which translates to consistent performance across all of your systems (read more)
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consistency from an innovative thin-film coating process Alluxa thin-film optical interference filters and dielectric mirrors are all hard-coated using our SIRRUS™ plasma deposition process on equipment that was designed and built by our team. This allows us to reliably and repeatedly (read more)
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Browse our selection of optical filters and fluorescence filter sets INNOVATIVE ENGINEERING Advanced plasma deposition. Precision wavelength control. New metrology techniques. Learn how our thin-film (read more)
Browse Optical Filters Datasheets for Alluxa, Inc. -
INNOVATIVE ENGINEERING Advanced plasma deposition. Precision wavelength control. New metrology techniques. Learn how our thin-film coating technology has enabled the routine production of optical components with performance and prices that were previously impossible (read more)
Browse Optical Filters Datasheets for Alluxa, Inc. -
-independent measurement, where a nanometer-accurate thickness value is achieved even with moving objects. The large thickness measuring range allows the measurement of thin layers, flat glass and films. Since the white light interferometer works with an SLED in the near infrared range, thickness measurement of anti (read more)
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