TABLE OF CONTENTS Because a high quality process is possible, the surface modification and polymer deposition in low temperature plasma are very useful for the high technology industry. Most of such processes have been done at a low-pressure of a few torrs, and therefore it is difficult to apply plasma processing for large-scale objects, especially by continuous treatment. We previously reported that surface treatment and thin film deposition could be carried out with the atmospheric pressure glow plasma (APG) process. The APG process has been developed by M. Kogoma and coworkers since 1987 [1], [2]. This approach can reduce apparatus costs and can also be applied to high vapor pressure substances such as gum, powders and bio-materials [3], [4]. A stable glow discharge at atmospheric pressure requires: (i) The use of helium or argon for dilution of carrier gas; (ii) The insertion of a dielectric insulator between the electrodes in the discharge gap; (iii) The use of a high frequency, at least higher than IkHz. Normally the processing rate is dependent on the applied frequency because the discharge current should have one or two pulses per half cycle in low frequency APG discharge [2]. However, the temperature rise inside the discharge zone due to the increase of the discharge frequency restricts the maximum applied frequency.
In this article, we report the application of APG discharge to deposit mainly such organic polymers as C 2H 4,& (Et), C 2F 4 (TFE),...
