Plasma Source Mass Spectrometry: Applications and Emerging Technologies
By Scott D. Tanner (eds)

Author Index

A

Abou-Shakra, F. R. 28, 112
Akiba, S. 105
Azim-Araghi, A. 66

B

Bains, S. 28
Bandura, D. R. 16, 43, 292
Baranov, V. I. 3, 16, 43
Becker, J. S. 54
Bettinelli, M. 240
Bleiner, D. 249
Bohme, D. K. 282
Boulyga, S. F. 54
Bourne, N. J. 127
Budd, P. 195
Burns, R. B. 74

C

Calvert, H. 82
Casey, N. 160
Chatterjee, D. 112
Chenery, C. 195
Coles, B. 351
Cooke, D. A. 127

D

Davidson, L. E. 112
Day, J. M. D. 209, 374
Der-Chuen, L. 338
Din, V. 351
Dowall, D. 307, 321

E

Ellam, R. 141, 231, 391
Encinar, J. R. 148
Evans, P. 185

F

Feldmann, J. 231
Fitz, W. 93
Freeman, H. N. 28

G

Garcia Alonso, J. I. 148, 271
Gault, A. G. 112, 127
Gounelle, M. 351
Gray, D. J. 74
Gunther, D. 249

H

Halliday, A. N. 338
Hann, S. 93
Hearn, R. 185
Heudi, O. 28

I

Irvine, G. J. 221

J

John, T. 82
Jones, D. 261

K

Kano, M. 105
Kollensperger, G. 93
Koyanagi, G. K. 282

L

Lavrov, V. V. 282
Lyon, T. D. B. 141
Lythgoe, P. R. 112, 127

M

Marchante-Gayon, J. M. 271
Marshall, P. S. 28
Mason, T. 351
McCurdy, E. 168
McGowan, T. 160
Mckeown, S. 28
Minoia, C. 240
Montgomery, J. 195
Mullane, E. 351

N

Nowell, G. M. 82, 307, 321, 362, 374

O

Ohtsuka, Y. 105
Olesik, J. W. 261
Ornatsky, O. I. 43
Ottley, C. J.
Copyright The Royal Society of Chemistry 2003 under license agreement with Books24x7
< Previous Excerpt Next Excerpt >
Purchase This Book

UNLIMITED FREE
ACCESS TO THE WORLD'S BEST IDEAS

SUBMIT
Already a GlobalSpec user? Log in.

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.

Customize Your GlobalSpec Experience

Category: Flip-Flops

Select Your Free Newsletters

Industry Newsletters

Select Your Free Product Alerts

Finish!
Privacy Policy

This is embarrasing...

An error occurred while processing the form. Please try again in a few minutes.