Chemical Vapor Deposition (CVD) MEMS Processing Equipment

2940 FC1 Liquid Flow Controller -- 2940-01-1004
from TSI Incorporated

Precision control of an external Piezo valve with full scale (TEOS equivalent) of 580 mg/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
2940 FC2 Liquid Flow Controller -- 2940-01-1001
from TSI Incorporated

Precision control of an external Piezo valve with full scale (TEOS equivalent) of 6.4 g/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
2940 FC3 Liquid Flow Controller -- 2940-01-1005
from TSI Incorporated

Precision control of an external Piezo valve with full scale (TEOS equivalent) of 6.4 g/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Auto-load 10 Nm Particle Deposition System 2300g3a - 10 Nm -- SKU: 2334
from TSI Incorporated

This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom 300 mm and 200 mm calibration standards. Robotic wafer handling... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
  • Type: Free Standing System
Deposition Calibration Standards
from TSI Incorporated

High-quality surface defect calibration standards improve overall performance of your inspection systems and reduce inconsistencies within your inspection tool fleet. MSP's calibration standards are leaders in the industry for consistent and repeatable particle size and count control.MSP provides... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm -- SKU: 2335
from TSI Incorporated

This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom wafer calibration standards. Manual loading allows a wide range... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
  • Type: Free Standing System
Particle Size Standards
from TSI Incorporated

Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in ultra-pure... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
Turbo-Vaporizer 2800 -- 2800
from TSI Incorporated

The 2800 Turbo-Vaporizer ™ can be operated at temperatures up to 300 ºC, making it a great commercial solution for high temperature applications.     This classic system is a great choice for stable long-run processes. Dimensions 300 mm x 203 mm x 203 mm (12 in. x 8 in. x 8... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2800PE -- 2800PE
from TSI Incorporated

The 2800PE Turbo-Vaporizer ™ is a great all around vaporizer and works well for most applications.  This model has the state-of-the art PE atomizer with on-board flow control and features a heat exchanger designed to be highly compatible with thermally sensitive liquids. Dimensions 296 mm... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2820 -- 2820
from TSI Incorporated

The 2820 Turbo-Vaporizer ™ is a classic system. This model is a great choice for easy to vaporize  precursors, and features wide internal channels to minimize clogging. Dimensions. 224 mm x 183 mm x 140 mm (8.8 in.  x 7.2 in.  x 5.5 in.). Fittings (on the unit) Carrier Gas Inlet... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2821 -- 2821
from TSI Incorporated

The 2821 Turbo-Vaporizer ™ is our highest liquid flow rate unit.   This model features 3600W of heater power  and can be used to deliver  flow rates up to 6000g/hr (TEOS or equivalent). Dimensions. 417 mm x 140 mm x 183 mm (16.4 in. x 5.5 in. x 7.2 in.). Fittings (on the unit)... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2840PE -- 2840PE
from TSI Incorporated

The 2840PE Turbo-Vaporizer ™ is one of our smallest vaporizers and has the state-of-the art PE atomizer with on-board flow control.   This model has been optimized for low flow applications; featuring an ultra-fast response time making it a great choice for ALD applications. Dimensions. [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2860PE -- 2860PE
from TSI Incorporated

The 2860PE was designed as a drop-in replacement for poorly performing DLI valves.  This model has the state-of-the art PE atomizer with on-board flow control, delivering  superior vapor quality with significantly lower maintenance. Dimensions. 236 mm   x 81 mm x 89 mm (9.3 in. x 3.2... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
VPG-A3 Inline Filter -- 2920-01-5001
from TSI Incorporated

Filtration down to 1 nm and below. The VPG-A3 in-line filter is an ultra-high efficiency, ultra-low pressure drop filter designed for Vapor and Process Gas (VPG) filtration. Made from 100% 316SS, this filter is typically used downstream of a vaporizer under vacuum flow conditions to remove particles... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS