Integral Process Controller MEMS Processing Equipment
from Plasma Etch, Inc.
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the... [See More]
- Features: Controller; Capacitive Parallel Plate Design
- Process: Plasma Etching and Cleaning
- Type: Laboratory or Benchtop
- Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
from Precision Surfacing Solutions
To complement our extensive range of Single and dual face lapping and polishing machines Lapmaster has introduced a new line of precision oscillating head polishing machines. Designated the LLCD series they are, primarily, Microprocessor controlled pad polishing machines specially designed for... [See More]
- Features: Controller; Automated loading or conveyor feeding (optional feature)
- Process: Polishing, Lapping, Planarizing
- Type: Batch; Continuous Web or Wire Coater; Inline or Semicontinuous
- Applications: Flat Panel Display; MEMS; Optical Coatings; Semiconductors; Magnetic storage
from Palomar Technologies, Inc
Overview. The SST 3150 is a high vacuum furnace that provides advanced packaging capabilities in vacuum levels as low as 10-7 Torr, and temperatures up to 500 °C (1000 °C optional). The clean-room compatible system may also be configured to allow for in situ separation of lid and package,... [See More]
- Features: Controller
- Process: Activating Getters, Sealing of Discrete MEMS Packages, and Brazing
- Type: Free Standing System
- Applications: MEMS