Physical Vapor Deposition (PVD) MEMS Processing Equipment

2940 FC1 Liquid Flow Controller -- 2940-01-1004
from TSI Incorporated

Precision control of an external Piezo valve with full scale (TEOS equivalent) of 580 mg/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
2940 FC2 Liquid Flow Controller -- 2940-01-1001
from TSI Incorporated

Precision control of an external Piezo valve with full scale (TEOS equivalent) of 6.4 g/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
2940 FC3 Liquid Flow Controller -- 2940-01-1005
from TSI Incorporated

Precision control of an external Piezo valve with full scale (TEOS equivalent) of 6.4 g/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Auto-load 10 Nm Particle Deposition System 2300g3a - 10 Nm -- SKU: 2334
from TSI Incorporated

This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom 300 mm and 200 mm calibration standards. Robotic wafer handling... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
  • Type: Free Standing System
Deposition Calibration Standards
from TSI Incorporated

High-quality surface defect calibration standards improve overall performance of your inspection systems and reduce inconsistencies within your inspection tool fleet. MSP's calibration standards are leaders in the industry for consistent and repeatable particle size and count control.MSP provides... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm -- SKU: 2335
from TSI Incorporated

This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom wafer calibration standards. Manual loading allows a wide range... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
  • Type: Free Standing System
Particle Size Standards
from TSI Incorporated

Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in ultra-pure... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS; Semiconductors
Turbo-Vaporizer 2800 -- 2800
from TSI Incorporated

The 2800 Turbo-Vaporizer ™ can be operated at temperatures up to 300 ºC, making it a great commercial solution for high temperature applications.     This classic system is a great choice for stable long-run processes. Dimensions 300 mm x 203 mm x 203 mm (12 in. x 8 in. x 8... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2800PE -- 2800PE
from TSI Incorporated

The 2800PE Turbo-Vaporizer ™ is a great all around vaporizer and works well for most applications.  This model has the state-of-the art PE atomizer with on-board flow control and features a heat exchanger designed to be highly compatible with thermally sensitive liquids. Dimensions 296 mm... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Turbo-Vaporizer 2820 -- 2820
from TSI Incorporated

The 2820 Turbo-Vaporizer ™ is a classic system. This model is a great choice for easy to vaporize  precursors, and features wide internal channels to minimize clogging. Dimensions. 224 mm x 183 mm x 140 mm (8.8 in.  x 7.2 in.  x 5.5 in.). Fittings (on the unit) Carrier Gas Inlet... [See More]

  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
  • Applications: MEMS
Multi-purpose Vacuum Box Coating Systems -- UNIVEX 400
from Leybold USA Inc.

UNIVEX 400. The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates. In the vacuum chamber which is 420 mm wide, substrates respectively substrate holders up to an... [See More]

  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); DC Magnetron Sputtering (optional feature); Ion Beam Assisted Deposition (optional feature)
  • Applications: MEMS; Optical Coatings; Photovoltaic or solar cell; Semiconductors
  • Type: Batch; Free Standing System
  • Materials Processed: Metal; Polymer; Gallium Arsenide or Compound Semiconductors