Physical Vapor Deposition (PVD) MEMS Processing Equipment
from TSI Incorporated
Precision control of an external Piezo valve with full scale (TEOS equivalent) of 580 mg/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
Precision control of an external Piezo valve with full scale (TEOS equivalent) of 6.4 g/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
Precision control of an external Piezo valve with full scale (TEOS equivalent) of 6.4 g/min. This thermal Liquid Flow Controller (LFC) is designed to work with the MSP ‘PE ’ series Turbo-Vaporizers. The 2940 LFC is comprised of a thermal sensor to sense the mass flow rate of the liquid... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom 300 mm and 200 mm calibration standards. Robotic wafer handling... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS; Semiconductors
- Type: Free Standing System
from TSI Incorporated
High-quality surface defect calibration standards improve overall performance of your inspection systems and reduce inconsistencies within your inspection tool fleet. MSP's calibration standards are leaders in the industry for consistent and repeatable particle size and count control.MSP provides... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS; Semiconductors
from TSI Incorporated
This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom wafer calibration standards. Manual loading allows a wide range... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS; Semiconductors
- Type: Free Standing System
from TSI Incorporated
Whether testing for particle size, count, or composition, it is imperative to use reliable particle suspensions to calibrate your surface scanning equipment or particle counters. A particle standard consists of a specific size range and number concentration of solid particles suspended in ultra-pure... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS; Semiconductors
from TSI Incorporated
The 2800 Turbo-Vaporizer ™ can be operated at temperatures up to 300 ºC, making it a great commercial solution for high temperature applications. This classic system is a great choice for stable long-run processes. Dimensions 300 mm x 203 mm x 203 mm (12 in. x 8 in. x 8... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
The 2800PE Turbo-Vaporizer ™ is a great all around vaporizer and works well for most applications. This model has the state-of-the art PE atomizer with on-board flow control and features a heat exchanger designed to be highly compatible with thermally sensitive liquids. Dimensions 296 mm... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
The 2820 Turbo-Vaporizer ™ is a classic system. This model is a great choice for easy to vaporize precursors, and features wide internal channels to minimize clogging. Dimensions. 224 mm x 183 mm x 140 mm (8.8 in. x 7.2 in. x 5.5 in.). Fittings (on the unit) Carrier Gas Inlet... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
The 2821 Turbo-Vaporizer ™ is our highest liquid flow rate unit. This model features 3600W of heater power and can be used to deliver flow rates up to 6000g/hr (TEOS or equivalent). Dimensions. 417 mm x 140 mm x 183 mm (16.4 in. x 5.5 in. x 7.2 in.). Fittings (on the unit)... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
The 2840PE Turbo-Vaporizer ™ is one of our smallest vaporizers and has the state-of-the art PE atomizer with on-board flow control. This model has been optimized for low flow applications; featuring an ultra-fast response time making it a great choice for ALD applications. Dimensions. [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
The 2860PE was designed as a drop-in replacement for poorly performing DLI valves. This model has the state-of-the art PE atomizer with on-board flow control, delivering superior vapor quality with significantly lower maintenance. Dimensions. 236 mm x 81 mm x 89 mm (9.3 in. x 3.2... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS
from TSI Incorporated
Filtration down to 1 nm and below. The VPG-A3 in-line filter is an ultra-high efficiency, ultra-low pressure drop filter designed for Vapor and Process Gas (VPG) filtration. Made from 100% 316SS, this filter is typically used downstream of a vaporizer under vacuum flow conditions to remove particles... [See More]
- Process: Chemical Vapor Deposition; Physical Vapor Deposition
- Applications: MEMS