Factory / Free Standing  MEMS Processing Equipment

High Vacuum MEMS Packaging Vacuum Furnace -- 3150
from Palomar Technologies, Inc

Overview. The SST 3150 is a high vacuum furnace that provides advanced packaging capabilities in vacuum levels as low as 10-7 Torr, and temperatures up to 500 °C (1000 °C optional). The clean-room compatible system may also be configured to allow for in situ separation of lid and package,... [See More]

  • Type: Free Standing System
  • Applications: MEMS
  • Process: Activating Getters, Sealing of Discrete MEMS Packages, and Brazing
  • Chamber Size: Thermal Work Zone: 25 in2 (160 cm2); Work Surface Height: 37 in (95 cm) adjustable
Auto-load 10 Nm Particle Deposition System 2300g3a - 10 Nm -- SKU: 2334
from TSI Incorporated

This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom 300 mm and 200 mm calibration standards. Robotic wafer handling... [See More]

  • Type: Free Standing System
  • Applications: MEMS; Semiconductors
  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm -- SKU: 2335
from TSI Incorporated

This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom wafer calibration standards. Manual loading allows a wide range... [See More]

  • Type: Free Standing System
  • Applications: MEMS; Semiconductors
  • Process: Chemical Vapor Deposition; Physical Vapor Deposition
Multi-purpose Vacuum Box Coating Systems -- UNIVEX 400
from Leybold USA Inc.

UNIVEX 400. The UNIVEX 400 is a compact coating system for laboratory tasks, respectively pilot production runs. Due to its chamber dimensions, it is ideal for coating of small to medium sized substrates. In the vacuum chamber which is 420 mm wide, substrates respectively substrate holders up to an... [See More]

  • Type: Batch; Free Standing System
  • Applications: MEMS; Optical Coatings; Photovoltaic or solar cell; Semiconductors
  • Process: Physical Vapor Deposition; Resistance Evaporation (optional feature); DC Magnetron Sputtering (optional feature); Ion Beam Assisted Deposition (optional feature)
  • Materials Processed: Metal; Polymer; Gallium Arsenide or Compound Semiconductors