Plasma Etching / Cleaning MEMS Processing Equipment
from Plasma Etch, Inc.
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the... [See More]
- Process: Plasma Etching and Cleaning
- Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
- Type: Laboratory or Benchtop
- Materials Processed: Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
from Plasma Etch, Inc.
This system is made for smaller production facilities, R &D facilities and universities. The system features an implosion proof 6 ” w x 6 ” d x 4 ” h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode. Applications include medical devices, solar cells,... [See More]
- Process: Plasma Etching and Cleaning
- Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
- Type: Laboratory or Benchtop
- Materials Processed: Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
from Plasma Etch, Inc.
This system is made for smaller production facilities, R &D facilities and universities. The system features an implosion proof 8 ” w x 8 ” d x 4 ” h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode. Applications include medical devices, solar cells,... [See More]
- Process: Plasma Etching and Cleaning
- Applications: MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
- Type: Laboratory or Benchtop
- Materials Processed: Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals