Products & Services
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Supplier: CoorsTek
Description: CoorsTek provides precision measurement components for clean, stable, and contaminant-free performance across temperature and application environments. Ceramic Components for Ion Implant Equipment From precision air bearing components and beams to ultra-flat vacuum chucks and
- Applications: Electronics / RF-Microwave, Other
- Material Type: Alumina / Aluminum Oxide, Carbide Materials, Silicon Carbide, Specialty Ceramic
- Shape / Form: Fabricated / Custom Shape
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Supplier: CoorsTek
Description: components for high-performance ion implant equipment. Recommended Materials for Ion Implant Processing PlasmaPure™ UC Ultra-Pure Alumina PureSiC® Ultra-Pure CVD Silicon Carbide StatSafe™ ESD-Safe Ceramics
- Applications: Electronics / RF-Microwave, Other
- Material Type: Alumina / Aluminum Oxide, Carbide Materials, Silicon Carbide, Specialty Ceramic
- Shape / Form: Fabricated / Custom Shape
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Supplier: JTEKT North America, Inc.
Description: resistant to corrosion and those coated with PTFE are adopted. Bearing for ion injection equipment Clean bearings that do not generate impurities by wear, etc. through lubrication in a vacuum are adopted in the vacuum chamber of the ion implantation equipment
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Supplier: Ushio America, Inc.
Description: burn prevention during ion implantation, neutralizing electrical charge, removing stress and low-k curing. Example of heat resistance improvement: After processing by UV hardening, resist does not dissolve even after exposure to 250 degrees C for 5 minutes. Without UV hardening, resist
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Supplier: CoorsTek
Description: CoorsTek ceramic interferometer reference mirrors incorporate low expansion engineered ceramics from the most precise geometries, surface characteristics, and dimensional stability available. Ceramic Components for Ion Implant Equipment From precision air bearing components and
- Mirror Materials: Other Mirror Material
- Mirror Types: Flat Mirror
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Supplier: HiTek Power Ltd.
Description: The Series OL1K range of single output high voltage power supplies meets the exacting requirements found in electron and ion beam systems, ion implantation and X-ray equipment. Designed using the latest power switching IGBTs to ensure efficient and reliable operation over
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Supplier: Edwards Vacuum
Description: for battery-free operation. The STPA2203C has been approved for use by major etch, ion implant and deposition equipment manufacturers in the semiconductor and magnetic media industries.
- Applications: General Purpose / Industrial, Chemical / Corrosive Gas, Semiconductor Manufacturing, Other
- Configuration: Individual Vacuum Pump
- High / Ultrahigh Vacuum Type: Turbomolecular
- Integral Backing Pump: Yes
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Supplier: HiTek Power Ltd.
Description: V Positive or negative polarity Digital or analogue meter options OEM version available IGBT switch mode technology Local or remote operation CE Marked for EU LV Directive 73/23/EEC Applications: Electron beam systems Ion implantation X-ray equipment General laboratory systems
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Supplier: HiTek Power Ltd.
Description: The Series OLS10K range of single output high voltage power supplies meets the exacting requirements found in electron and ion beam systems, ion implantation and X-ray equipment. There are 3 different input voltage variants available to order, the OLS10K (208VAC), the
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Supplier: Nilfisk Industrial Vacuums
Description: Designed for the unique cleaning requirements of the semiconductor industry, the Nilfisk SS Vapor Industrial Vacuum captures toxic gases such as arsine, phosphine, and chlorinated solvents released during the cleaning of process equipment such as molecular beam epitaxy chambers, ion
- Airflow: 87 SCFM
- Applications: Cleanroom, General Cleaning, Toxic Media
- Capacity: 3.25 gallons
- Features: HEPA / ULPA Filter
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Supplier: HiTek Power Ltd.
Description: Custom Options Available Applications: Electron beam systems Ion beam systems Ion implantation X-ray equipment
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Supplier: Fountyl Technologies Pte. Ltd.
Description: form of specific areas of wafer, so that it presents specific functions. And through a series of other complex and demanding processes to eventually turn the wafer into a complex integrated circuit structure. Electrostatic chuck and electrostatic chuck heater are widely used in semiconductor core
- Application: Wafer Chuck
- Chuck Geometry: Round
- Materials of Construction: Ceramic, Other
- Number of Jaws: None / NA
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Supplier: Advanced Energy Industries, Inc.
Description: The OL1K Series offers a range of 1 kW single-output, high voltage power supplies. Efficiently meet the demanding requirements found in ion implantation, X-ray equipment, and electron and ion beam systems. Max Output Voltage/Power: 60 kV/1 kW Ripple: < 1000 ppm (0.06 Vpp
- AC Input Voltage: 208 volts
- DC Output Current: 0.0160 to 1 amps
- DC Output Power: 1000 watts
- DC Output Voltage: 1000 to 60000 volts
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Supplier: ASTM International
Description: into smaller host sites produces a layer of compression on the surface which strengthens the glass. Techniques such as ion implantation, dealkalization, etch-strengthening, and glaze coatings are specifically excluded from this specification. 1.2 Classification of chemically
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Supplier: ASTM International
Description: into smaller host sites produces a layer of compression on the surface which strengthens the glass. Techniques such as ion implantation, dealkalization, etch-strengthening, and glaze coatings are specifically excluded from this specification. 1.2 Classification of chemically
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Supplier: NewAge Performance Products | NAPP
Description: .2600 for use with food contact surfaces Listed by the National Sanitation Foundation (NSF-51) for food equipment materials Odorless, tasteless, and inert Able to resist extreme temperature variation: -100°F to 400°F Reusable and will
- Inside Diameter: 0.3750 inch
- Outside Diameter: 0.6250 inch
- Product Form: Hose (including Duct)
- Temperature Range: -100 F
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Description: What are blue zirconia ceramic pins? The blue zirconia ceramic pin is a special color zirconia ceramic pin. Compared with traditional white zirconia ceramics, blue zirconia ceramics have a blue appearance by adding specific metal ions or dyes. Features of blue zirconia
- Material Type: Zirconia, Specialty Ceramic
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Challenge: Semiconductor manufacturing involves complex processes—including photolithography, etching, deposition, ion implantation, polishing, and cleaning—to produce functional chips, which are then packaged, tested, and (read more)
Browse Wastewater Treatment Equipment Datasheets for KINTEP NEW POWER -
reliable choice. BN Parts Used in Typical Equipment – Mass spectrometer ion sources – Ion implanters – Plasma etching systems – Electron beam evaporation sources – Hall effect thrusters (read more)
Browse Industrial Ceramic Materials Datasheets for Xiamen Innovacera Advanced Materials Co., Ltd. -
Wafer Manufacturing: Wafer stages for photolithography systems, etching chucks, electrostatic chucks for ion implantation equipment, and thin-film deposition systems (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
instability, high defect rates, and costly equipment adjustments in ion implantation, etching, and thin-film deposition processes. Our electrostatic chucks deliver high-density, durable, and customizable solutions that address (read more)
Browse Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
for semiconductors as an example, the precision ceramic structural components provided by coorstek cover a series of products, such as special components for photolithography machine, special components for plasma etching equipment, special components for pvd/cvd, special components for ion (read more)
Browse Silicon Carbide and Silicon Carbide Ceramics Datasheets for 3X Ceramic Parts Company Limited -
production in Tempax glass (borosilicate glass) - jet engine parts in CMC (Ceramic Matrix Composites) - components for ion implantation in molybdenum and tungsten, and other materials. You can find more samples here and please enjoy seeing our skills. (read more)
Browse CNC Machining Services Datasheets for Top Seiko Co., Ltd. -
Why Orthopedic Surgeons Prefer Ceramic Hip Joint Components? Choosing the right implant is key to long-term success in hip replacement surgery. That’s why ceramic hip components are increasingly becoming the preferred option among orthopedic surgeons. Excellent (read more)
Browse Zirconium Oxide and Zirconia Ceramics Datasheets for Suntech Applied Materials (Hefei) Co.,Ltd -
, to saving lives by providing critical components for oncology equipment. The electromagnet, or solenoid, provides flexibility in generating magnetic fields so they are desirable for klystron, TWT, ion implantation, chemical etching, chemical dispersion, MRI, plasma experiments, Helmholtz coils and (read more)
Browse Inductors, Coils, and Chokes Datasheets for Arnold Magnetic Technologies -
Fountyl manufactures electrostatic chucks (ESCs) for semiconductor wafer fabrication equipment, available in both Coulomb and Johnsen-Rahbek types. These ESCs are widely used in plasma etching, CVD, PVD, and ion implantation chambers, providing engineers with reliable wafer clamping and precise (read more)
Browse Wafer Chucks Datasheets for Fountyl Technologies Pte. Ltd. -
operational costs. Main Applications Semiconductors & Displays: Sputtering, Ion (read more)
Browse Cryogenic Pumps Datasheets for Cryo H&I Co.,Ltd.
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Ion Implantation and Synthesis of Materials
Ion Implantation and Synthesis of Materials. Presenting the physics and materials science of ion implantation and ion beam modification of materials, this book covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder.
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Pyrolytic Graphite for Ion Implantation
Pyrolytic graphite ion grids offer major benefits for ion implantation applications relative to alternative materials such as molybdenum and other graphite-based infiltrated material.
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Minteq Pyroid Pyrolytic Graphite for Semiconductor Ion Implantation
Ion implantation uses two or three closely spaced multiple-aperture electrodes to extract ions from a source and eject them in a collimated beam. The electrodes are called "grids" because they are perforated with a large number of small holes in a regular array.
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Extremely Pure Pyroid Pyrolytic Graphite for Semiconductor Ion Implantation
Pyrolytic graphite offers the lowest know material erosion rate for use in ion bombardment and plasma applications
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
extends reach with new West Coast design center Komatsu 2-kHz DUV excimer laser targets 0.13-micron : '921 quake' may be making Taiwan chip makers even tougher Emcore posts loss of $6.6 million despite strong revenue growth Eaton spends $12.3 million to expand ion-implant production capacity
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
of an Axcelis patent for radio-frequency linear accelerator technology used in high-energy ion implantation. Cadence is downgraded despite fourth-quarter bounce Claiming to have achieved its "best quarter ever, " Cadence Design Systems Inc. announced fourth-quarter revenue of $391 million last week
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EETimes.com | Electronics Industry News for EEs & Engineering Managers
multimedia IP services. Varian, Nissin settle implanter suit Varian Semiconductor Equipment Associates Inc. and Nissin Ion Equipment Co. Ltd. said that they have settled their patent litigation. TEL's results mixed in quarter, fiscal year Citing 300-mm orders and other factors, Japan 's Tokyo Electron Ltd
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Beating Patent Death
, exchanging the counter-ion, replacing an esterified group, device-drug combination products (through implants, inhalers, prefilled syringes), and drug-drug or drug-biologic combinations. These
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http://www.dtic.mil/cgi-bin/GetTRDoc?AD=ADA322852&Location=U2&doc=GetTRDoc.pdf
ISM Technologies in San Diego has perfected the ion source and provides both MEWA-based ion implantation equipment and metal ion implantation services worldwide.
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Sheet Resistance Low Dose Monitoring Using The Double Implant Technique
N.L. Turner, M.I. Current, T.C. Smith, D. Crane, "Effects of Planar Channeling Using Modern Ion Implantation Equipment ," ibid, vol.
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The Thesis Committee for Courtney Marie Fowler
Certifies that this is the approved version of the following thesis:
Ion Implant Virtual Metrology for Process M...
Ion Implant Equipment ........................................................................13 .
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Handbook of Thin-Film Technology
Freeman sources are particularly used in ion implantation equipment .
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Fabrication Engineering at the Micro- and Nanoscale
Finally, ion implantation equipment is expensive.
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Operations Improvement in a Semiconductor Capital Equipment
Manufacturing Plant: Resource Optimization, Labor Flexibility,
and Inventory Management
Varian designs and manufactures ion implantation equipment which is used in semiconductor chip fabrication.
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Formation Of Silicon On Insulator Structures By Ion Implantation
Ion Implantation Equipment and Techniques, Vermont U.S.A., July 1984.
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Resistivity Monitoring For Ion Beam Processes
Commercial ion implantation equipment suitable for volume manufacturing of integrated circuits has been available for the last fifteen years.